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公开(公告)号：US20180107120A1
公开(公告)日：2018-04-19
申请号：US15573029
申请日：2016-05-30
Applicant: ASML Netherlands B.V.
Inventor： Lense Hendrik-Jan Maria SWAENEN , Johannes Jacobus Matheus BASELMANS , Bogathi Vishnu Vardhana REDDY , Patricius Aloysius Jacobus TINNEMANS , Beeri NATIV
IPC: G03F7/20
CPC classification number: G03F7/7055 , G03F7/20 , G03F7/70258 , G03F7/705 , G03F7/70525
Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of constraints.
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公开(公告)号：US20160116848A1
公开(公告)日：2016-04-28
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
Abstract translation: 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。
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公开(公告)号：US20160077445A1
公开(公告)日：2016-03-17
申请号：US14787451
申请日：2014-04-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey DEN BOEF , Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS
CPC classification number: G03F7/70141 , G01B11/272 , G03F9/7069 , G03F9/7088 , G03F9/7092
Abstract: An alignment sensor including an illumination source, such as a white light source, having an illumination grating operable to diffract higher order radiation at an angle dependent on wavelength; and illumination optics to deliver the diffracted radiation onto an alignment grating from at least two opposite directions. For every component wavelength incident on the alignment grating, and for each direction, the zeroth diffraction order of radiation incident from one of the two opposite directions overlaps a higher diffraction order of radiation incident from the other direction. This optically amplifies the higher diffraction orders with the overlapping zeroth orders.
Abstract translation: 一种对准传感器，包括诸如白光源的照明源，具有可操作以以取决于波长的角度衍射高阶辐射的照明光栅; 和照明光学器件，以将衍射辐射从至少两个相反的方向传送到对准光栅上。 对于入射在对准光栅上的每个分量波长，并且对于每个方向，从两个相反方向之一入射的辐射的零级衍射级与从另一方向入射的较高的辐射衍射级重叠。 这种光学放大了具有重叠零级的较高的衍射级。
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公开(公告)号：US20130301025A1
公开(公告)日：2013-11-14
申请号：US13940796
申请日：2013-07-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
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公开(公告)号：US20240027918A1
公开(公告)日：2024-01-25
申请号：US18004555
申请日：2021-05-27
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Kaustuve BHATTACHARYYA , Samee Ur REHMAN
CPC classification number: G03F7/70633 , G03F9/7046 , G03F9/7042
Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.
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Patent Agency Ranking
26.发明公开公开(公告)号：US20230273255A1
公开(公告)日：2023-08-31
申请号：US18143825
申请日：2023-05-05
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Patrick Warnaar , Vasco Tomas Tenner , Maurits Van Der Schaar
IPC: G01R31/265
CPC classification number: G01R31/2656
Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
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公开(公告)号：US20230141495A1
公开(公告)日：2023-05-11
申请号：US17916746
申请日：2021-03-10
Applicant: ASML Netherlands B.V.
Inventor： Hugo Augustinus Joseph CRAMER , Patricius Aloysius Jacobus TINNEMANS , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Jochem Sebastiaan WILDENBERG
IPC: G03F7/20
CPC classification number: G03F7/70525 , G03F7/70625 , G03F7/70633
Abstract: Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potential metrology locations. Each of said candidate acquisition configurations is evaluated in terms of an evaluation metric and a candidate acquisition configuration is selected based on said evaluation. The corresponding metrology locations for the selected acquisition configuration is added to the sampling scheme.
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28.发明申请公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20210063898A1
公开(公告)日：2021-03-04
申请号：US17098073
申请日：2020-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20200249576A1
公开(公告)日：2020-08-06
申请号：US16635584
申请日：2018-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Patrick WARNAAR , Patricius Aloysius Jacobus TINNEMANS , Grzegorz GRZELA , Everhardus Cornelis MOS , Wim Tjibbo TEL , Marinus JOCHEMSEN , Bart Peter Bert SEGERS , Frank STAALS
IPC: G03F7/20
Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.
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