公开(公告)号：US07999225B2

公开(公告)日：2011-08-16

申请号：US12472259

申请日：2009-05-26

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J40/00

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。结果，由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.也可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散光斑定位在狭缝上时，中心光束105从轴线偏转到被能量选择光阑停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

公开(公告)号：US20080290264A1

公开(公告)日：2008-11-27

申请号：US11591175

申请日：2006-11-01

Applicant: Alexander Henstra ,  Michael Ross Scheinfein

Inventor： Alexander Henstra ,  Michael Ross Scheinfein

IPC: G01D18/00 ,  G01N23/225

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

Abstract translation: 本发明描述了用于校正像在用于SEM或TEM的粒子透镜中的色像差的校正器。 为了降低对这种校正器的电源的稳定性要求，粒子束通过校正器的能量低于光束通过透镜的能量，以被校正。

公开(公告)号：US20060219935A1

公开(公告)日：2006-10-05

申请号：US11397480

申请日：2006-04-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J1/50 ,  H01J3/14 ,  H01J49/42

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention has at least the same aberration-correcting power, but, according to the invention, is embodied with six quadrupoles and three octupoles. By adding octupoles with a relatively weak excitation to a portion of the quadrupoles, correction of the anisotropic coma of the objective lens is also attained. By embodying all quadrupoles, or a portion thereof, to be electromagnetic, chromatic aberrations can also be corrected for.

Abstract translation: 用于TEM，STEM或SEM的四极八极畸变校正器。 用于校正目标的三阶和五阶像差的已知校正器具有八个四极和三个八极。 根据本发明的校正器具有至少相同的像差校正功率，但是根据本发明，具有六个四极和三个八极。 通过向四极的一部分添加具有相对弱激发的八极，还可以校正物镜的各向异性彗差。 通过将所有四极或其一部分体现为电磁，也可以校正色差。

公开(公告)号：US06218664B1

公开(公告)日：2001-04-17

申请号：US09216256

申请日：1998-12-18

Applicant: Jan M. Krans ,  Marcellinus P. C. M. Krijn ,  Alexander Henstra

Inventor： Jan M. Krans ,  Marcellinus P. C. M. Krijn ,  Alexander Henstra

IPC: H01J3726

CPC classification number: H01J37/28 ,  H01J2237/151 ,  H01J2237/2448

Abstract: The detector 6 for the secondary electrons in a SEM provided with an electrostatic objective 14, 16 is arranged ahead of the objective, thus enabling a high detection efficiency. According to the invention, the deflection of the beam is performed electrically and the deflection electrodes 10, 12 are arranged between the detector 6 and the last two electrodes 14, 16 of the objective. The beam deflection is realized by means of two oppositely directed electrical deflection fields in such a manner that the tilting point of the scanning motion is situated at the center 20 of the objective lens, thus avoiding additional lens defects and obstruction of the beam by the limited dimensions of the objective bore. This results in a large field of view, without loss of resolution. Furthermore, deflection by means of two oppositely directed fields has the effect that the paths 24 of the secondary electrons traveling to the detector 6 are shaped such that a larger part thereof reaches the detection material 6.

Abstract translation: 在具有静电物镜14,16的SEM中，用于二次电子的检测器6设置在物镜前方，因此能够实现高检测效率。 根据本发明，电子束的偏转被执行，并且偏转电极10,12被布置在物镜的检测器6和最后两个电极14,16之间。 光束偏转通过两个相反方向的电偏转场实现，使得扫描运动的倾斜点位于物镜的中心20处，从而避免了附加的透镜缺陷和受到限制的光束的阻碍 物镜孔尺寸。 这导致了很大的视野，而没有分辨率的损失。 此外，通过两个相反方向的场的偏转具有这样的效果，即行进到检测器6的二次电子的路径24成形为使得其较大部分到达检测材料6。

公开(公告)号：US06184975B2

公开(公告)日：2001-02-06

申请号：US09195887

申请日：1998-11-19

Applicant: Alexander Henstra ,  Marcellinus P. C. M. Krijn

Inventor： Alexander Henstra ,  Marcellinus P. C. M. Krijn

IPC: G01J100

CPC classification number: H01J37/153 ,  H01J2237/04924 ,  H01J2237/1534

Abstract: Electron-optical rotationally symmetrical lenses inevitably suffer from chromatic aberration which often determines the resolution limit at low acceleration voltages. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to improve the resolution nevertheless, it has already been proposed to correct the chromatic aberration by means of a corrector (28) provided with two correction elements (34, 40). Each correction element consists of a number of quadrupole fields. Using the known corrector, it has been found that the chromatic magnification error is inadmissibly high. In order to solve this problem, the correction elements in the corrector according to the invention are provided with at least five layers of electrodes (60-a, 60-b, 60-c, 60-d) which produce quadrupole fields. Because of the strong periodicity of the electron paths in the correcting quadrupole fields, the chromatic magnification error is limited sufficiently (or even reduced to zero) so as to allow the use of the corrector for practical purposes.

Abstract translation: 电子 - 光学旋转对称透镜不可避免地会遭受色差，其通常决定了在低加速度电压下的分辨率极限。 这种透镜缺陷不能通过旋转对称场的补偿来消除。 为了提高分辨率，已经提出通过具有两个校正元件（34,40）的校正器（28）来校正色像差。 每个校正元件由多个四极场组成。 使用已知的校正器，已经发现色度倍率误差是不允许的。 为了解决这个问题，根据本发明的校正器中的校正元件设置有产生四极场的至少五层电极（60-a，60-b，60-c，60-d）。 由于校正四极场中的电子路径的周期性强，所以色彩倍率误差受到充分限制（或甚至降至零），以便实际上可以使用校正器。

公开(公告)号：US5838011A

公开(公告)日：1998-11-17

申请号：US861345

申请日：1997-05-21

Applicant: Marcellinus P.C.M. Krijn ,  Alexander Henstra ,  Karel D. Van Den Mast

Inventor： Marcellinus P.C.M. Krijn ,  Alexander Henstra ,  Karel D. Van Den Mast

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: Particle-optical rotationally-symmetrical lenses inevitably exhibit spherical and chromatic aberration. These lens aberrations usually determine the limit of the resolution of the known particle-optical apparatus. Said lens aberrations cannot be eliminated by compensation by means of rotationally-symmetrical fields. In order to enhance the resolution of particle-optical apparatus nevertheless, it is proposed to reduce said lens aberrations by means of a "Wien-type" corrector. Such a configuration must satisfy very severe requirements as regards manufacturing precision, mechanical stability (inter alia with a view to thermal drift), alignment of the various elements relative to one another, and stability of the electric currents and voltages for the excitation of the electric and magnetic poles. Because the known correction device is composed of a number of separate components, it is extremely difficult to satisfy the requirements as regards manufacturing precision, mechanical stability and alignment simultaneously for all of these components. In the corrector in accordance with the invention said requirements in respect of mechanical stability and precision are satisfied in a simpler manner in that the pole faces determining hexapole fields are arranged adjacent one another without other particle-optical elements being arranged therebetween.

Abstract translation: 颗粒光学旋转对称透镜不可避免地呈现球面和色差。 这些透镜像差通常决定了已知粒子光学装置的分辨率的极限。 所述透镜像差不能通过旋转对称场的补偿来消除。 然而，为了提高粒子光学装置的分辨率，提出了通过“维恩型”校正器来减少所述透镜像差。 这种构造在制造精度，机械稳定性（特别是考虑到热漂移），各种元件相对于彼此的对准以及用于激发电气的电流和电压的稳定性方面必须满足非常严格的要求 和磁极。 由于已知的校正装置由多个单独的部件组成，因此对于所有这些部件的制造精度，机械稳定性和对准性的要求也是非常困难的。 在根据本发明的校正器中，关于机械稳定性和精度的所有要求以更简单的方式得到满足，因为确定六极场的极面彼此相邻地布置，而不在其间布置其它颗粒光学元件。