公开(公告)号：US08710452B2

公开(公告)日：2014-04-29

申请号：US13294067

申请日：2011-11-10

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/22

CPC classification number: H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/31713

Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Abstract translation: 具有集成能量滤波器的带电粒子滤波器，其中带电粒子发射器，聚焦电极和偏转电极绕直线布置。 在使用大多数能量过滤器具有高度弯曲的光轴的情况下，因此使用具有难以制造的形式的部件，根据本发明的源使用围绕直线光轴的电极。 带电粒子的束可以在能量选择狭缝处偏离显示出可观的能量分散的轴线，而不引入无法校正的彗差或像散，只要其中一些形成为120°/ 60°/ 120°/ 60° °。 这样的电极可以通过陶瓷的胶合或钎焊而彼此附接，然后可以通过例如火花腐蚀形成一系列高度同心的孔。

公开(公告)号：US20130062520A1

公开(公告)日：2013-03-14

申请号：US13446908

申请日：2012-04-13

Applicant: Alexander Henstra ,  Maarten Bischoff ,  Uwe Luecken ,  Peter Christiaan Tiemeijer

Inventor： Alexander Henstra ,  Maarten Bischoff ,  Uwe Luecken ,  Peter Christiaan Tiemeijer

IPC: H01J3/14 ,  H01J37/26

CPC classification number: H01J37/26 ,  H01J37/153 ,  H01J2237/1532

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion.Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.

Abstract translation: 带电粒子装置配备有位于物镜和检测器系统之间的第三标示器，结果为了减少线性失真产生了第三自由度。 此外，使用所述三个标记器的方法包括：激光所述第一标示器以在对所述样品进行成像时减少散光，激励所述第二标示器以在对所述衍射平面进行成像时减少散光，以及激励所述第三施放器以减少所述线性失真。

公开(公告)号：US20110114852A1

公开(公告)日：2011-05-19

申请号：US12949312

申请日：2010-11-18

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/28

Abstract: Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration Cs of the so-named objective lens. Inevitably other aberrations become the limiting aberration. For the hexapole type correctors, also known as Rose correctors, or variants thereof, six-fold axial astigmatism, also known as A5, and sixth-order three lobe aberration, also known as D6, introduced by the corrector, are known to become the limiting aberration. The invention shows that by adding a weak hexapole (126) in the cross-over between the hexapoles, a Rose like corrector or a Crewe like corrector free of A5 or D6 can be made, or, by adding both the weak hexapole and a dodecapole, a corrector that is free of both A5 and D6.

Abstract translation: 市售的高分辨率透射电子显微镜（HR-TEM）和扫描透射电子显微镜（HR-STEM）现在配备有用于校正所谓物镜的轴向球面像差的校正器。 其他像差不可避免地成为限制像差。 对于六极型校正器，也称为玫瑰校正器或其变型，已知由校正器引入的六重轴向像散（也称为A5）和六阶三瓣像差（也称为D6）成为 限制像差。 本发明表明，通过在六极体之间的交叉处添加弱六极（126），可以制成玫瑰样校正器或不含A5或D6的Crewe像校正子，或者通过加入弱六极和十二烷 ，一个没有A5和D6的校正器。

公开(公告)号：US08461525B2

公开(公告)日：2013-06-11

申请号：US13198640

申请日：2011-08-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J40/00

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

公开(公告)号：US20050178982A1

公开(公告)日：2005-08-18

申请号：US11058695

申请日：2005-02-15

Applicant: Alexander Henstra ,  Jaroslav Chmelik

Inventor： Alexander Henstra ,  Jaroslav Chmelik

IPC: G21K1/00 ,  G21K1/02 ,  H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26 ,  H01J3/26

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透镜6偏心地发送带电粒子13的光束来进行能量选择。其结果是，由透镜6形成的图像15中会发生能量分散。通过将该图像15投影到膜片7上， 可能只允许能谱范围的有限部分的粒子通过。 因此，通过的光束16将具有减小的能量扩展。 通过添加偏转单元10，该粒子束16可以朝向光轴2偏转。还可以选择使穿过透镜6的中部的光束12偏转并具有例如更大的电流朝向光学 轴。

公开(公告)号：US5986269A

公开(公告)日：1999-11-16

申请号：US932981

申请日：1997-09-18

Applicant: Marcellinus P. C. M. Krijn ,  Alexander Henstra ,  Karel D. van der Mast

Inventor： Marcellinus P. C. M. Krijn ,  Alexander Henstra ,  Karel D. van der Mast

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/145

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively low acceleration voltage (0.5 kV to 5 kV) of the particle beam. This lens fault cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution of the particle-optical apparatus nevertheless, it has already been proposed to mitigate said lens fault by means of a Wien type corrector. Such a known configuration is provided with a number of electrical and magnetic multipoles. In order to achieve easier adjustment of the various multipole fields, the pole faces (30-i) governing the multipole fields according to the invention have a specific length L=(2.pi..sup.2 n.sup.2)/(K.sub.obj.sup.2 C.sub.c,obj), in which K.sub.obj is the strength of the focusing lens to be corrected and C.sub.c,obj is the coefficient of chromatic aberration of this lens.

Abstract translation: 颗粒光学旋转对称透镜不可避免地具有色差。 这种镜片故障在粒子束的相对低的加速电压（0.5kV至5kV）下确定了已知的粒子光学装置的分辨率的极限。 这种透镜故障不能通过旋转对称场的补偿来消除。 然而，为了提高粒子光学装置的分辨率，已经提出通过维恩型校正器来减轻所述透镜故障。 这种已知的配置设置有多个电和磁多极。 为了实现各种多极场的更容易的调整，根据本发明的控制多极场的极面（30-i）具有特定长度L =（2πnn2）/（Kobj2Cc，obj），其中Kobj是 要校正的聚焦透镜的强度和Cc，obj是该透镜的色差系数。

公开(公告)号：US20120112090A1

公开(公告)日：2012-05-10

申请号：US13294067

申请日：2011-11-10

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/31713

Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Abstract translation: 具有集成能量滤波器的带电粒子滤波器，其中带电粒子发射器，聚焦电极和偏转电极绕直线布置。 在使用大多数能量过滤器具有高度弯曲的光轴的情况下，因此使用具有难以制造的形式的部件，根据本发明的源使用围绕直线光轴的电极。 带电粒子的束可以在能量选择狭缝处偏离显示出可观的能量分散的轴线，而不引入无法校正的彗差或像散，只要其中一些形成为120°/ 60°/ 120°/ 60° °。 这样的电极可以通过陶瓷的胶合或钎焊而彼此附接，然后可以通过例如火花腐蚀形成一系列高度同心的孔。

公开(公告)号：US20110284763A1

公开(公告)日：2011-11-24

申请号：US13198640

申请日：2011-08-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

公开(公告)号：US20100224592A1

公开(公告)日：2010-09-09

申请号：US12719619

申请日：2010-03-08

Applicant: MILOS TOTH ,  Richard J. Young ,  Alexander Henstra ,  Alan Frank de Jong ,  Johannes Jacobus Lambertus Mulders

Inventor： MILOS TOTH ,  Richard J. Young ,  Alexander Henstra ,  Alan Frank de Jong ,  Johannes Jacobus Lambertus Mulders

IPC: C23F1/00 ,  H01J37/10 ,  H01J37/147 ,  H01J37/305 ,  C23C16/44 ,  C23C14/22

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

Abstract translation: 电子束诱导的与前体气体的化学反应是通过吸附物去除控制来控制的。 可以通过控制束电流来控制吸附物消耗，优选地通过快速消隐光束，以及通过冷却衬底来控制。 光束优选具有低能量以减小相互作用体积。 通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。

公开(公告)号：US5578822A

公开(公告)日：1996-11-26

申请号：US419493

申请日：1995-04-10

Applicant: Karel D. Van Der Mast ,  Pieter Kruit ,  Kars Z. Troost ,  Alexander Henstra

Inventor： Karel D. Van Der Mast ,  Pieter Kruit ,  Kars Z. Troost ,  Alexander Henstra

IPC: H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J2237/04922 ,  H01J2237/2448

Abstract: The focusing device 8 for the primary beam in a scanning electron microscope (SEM) consists in known manner of a combination of a magnetic gap lens 34 and a monopole lens 38. The secondary electrons released from the specimen are detected in accordance with the invention by a detector whose deflection unit 52, or the actual detector 64, 66, is arranged in a field-free space between the gap lens and the monopole lens. This space is rendered field-free by a screening plate 44 arranged underneath the gap lens. In order to achieve a high detector efficiency and a large field of vision, the pole tip of the focusing device 8 is provided with an attraction electrode 42 whose potential is higher than that of the specimen.

Abstract translation: 用于扫描电子显微镜（SEM）中的一次束的聚焦装置8由已知的磁隙透镜34和单极透镜38的组合的方式组成。从样品释放的二次电子根据本发明由 其偏转单元52或实际检测器64,66布置在间隙透镜和单极透镜之间的无场隙空间中的检测器。 通过布置在间隙透镜下方的遮蔽板44使该空间无场地。 为了实现高检测效率和大视野，聚焦装置8的极尖设置有电位高于试样的吸引电极42。