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48 条记录 (耗时 0.035 秒)

    Substrate carrier and facility interface and apparatus including same
    22.
    发明授权
    Substrate carrier and facility interface and apparatus including same 有权
    基板载体和设备接口及其设备

    公开(公告)号：US07418982B2

    公开(公告)日：2008-09-02

    申请号：US11419914

    申请日：2006-05-23

    申请人： Chen-Hua Yu ,  Yi-Li Hsiao

    发明人： Chen-Hua Yu ,  Yi-Li Hsiao

    IPC分类号： B65B1/04

    CPC分类号： H01L21/67376 ,  H01L21/67393 ,  H01L21/67772

    摘要： A carrier comprises an enclosure, a cabinet and at least one substrate holder. The enclosure comprises a door. The cabinet is coupled to the carrier. The cabinet comprises at least one valve and contains at least one reduction fluid. The substrate holder is disposed within the enclosure to support at least one substrate.

    摘要翻译： 载体包括外壳，机壳和至少一个基板保持器。 外壳包括一个门。 机柜耦合到载体。 所述柜包括至少一个阀并且包含至少一个还原流体。 衬底保持器设置在外壳内以支撑至少一个衬底。

    Apparatus for storing substrates
    23.
    发明授权
    Apparatus for storing substrates 有权
    用于存储基板的装置

    公开(公告)号：US08109407B2

    公开(公告)日：2012-02-07

    申请号：US11755508

    申请日：2007-05-30

    申请人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Jui-Pin Hung ,  Ming-Shih Yeh

    发明人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Jui-Pin Hung ,  Ming-Shih Yeh

    IPC分类号： B65D45/28 ,  B65D53/06

    CPC分类号： H01L21/67373 ,  H01L21/67376 ,  H01L21/67389

    摘要： An apparatus includes an enclosure and a door configured to seal the enclosure. The door includes a plate. A rotational apparatus is disposed over the plate. At least one first member with a first arm extends from a first rib of the first member. At least one second member with a second arm extends from a second rib of the second member. The first and second arms are connected to the rotational apparatus. At least one corner member has a first edge. The first edge has a shape corresponding to a shape of a corner of the frame. The corner member is connected to a first end of the third arm. A second end of the third arm is connected to the rotational apparatus. A sealing material is disposed along a first longitudinal side of the first rib and a second longitudinal side of the second rib.

    摘要翻译： 一种装置包括外壳和构造成密封外壳的门。 门包括一个板。 旋转装置设置在板上。 具有第一臂的至少一个第一构件从第一构件的第一肋延伸。 具有第二臂的至少一个第二构件从第二构件的第二肋延伸。 第一和第二臂连接到旋转装置。 至少一个角部件具有第一边缘。 第一边缘具有与框架的角部的形状对应的形状。 角部件连接到第三臂的第一端。 第三臂的第二端连接到旋转装置。 密封材料沿着第一肋的第一纵向侧面和第二肋的第二纵向侧面设置。

    SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME
    24.
    发明申请
    SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME 有权
    底板承载器，端口装置和设备接口以及包括其中的设备

    公开(公告)号：US20080298933A1

    公开(公告)日：2008-12-04

    申请号：US11754789

    申请日：2007-05-29

    申请人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Fu-Kang Tien ,  Jui-Pin Hung

    发明人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Fu-Kang Tien ,  Jui-Pin Hung

    IPC分类号： H01L21/00

    CPC分类号： H01L21/67017 ,  H01L21/67393 ,  H01L21/67772

    摘要： An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.

    摘要翻译： 一种装置包括第一外壳，第一门，至少一个第一阀，至少一个入口扩散器和至少一个基板支架。 第一个外壳具有第一个开口。 第一个门被配置为密封第一个开口。 第一阀联接到第一外壳。 入口扩散器联接到第一阀并且被配置为提供具有基本上高于围绕第一外壳的环境的温度的温度的第一气体。 设置在第一外壳内的每个衬底保持器支撑至少一个衬底。

    ADJUSTABLE ANODE ASSEMBLY FOR A SUBSTRATE WET PROCESSING APPARATUS
    25.
    发明申请
    ADJUSTABLE ANODE ASSEMBLY FOR A SUBSTRATE WET PROCESSING APPARATUS 有权
    可调式阳极装置用于基板湿处理装置

    公开(公告)号：US20080121526A1

    公开(公告)日：2008-05-29

    申请号：US11563515

    申请日：2006-11-27

    申请人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Lawrance Sheu

    发明人： Yi-Li Hsiao ,  Chen-Hua Yu ,  Jean Wang ,  Lawrance Sheu

    IPC分类号： C25D5/04 ,  C25D17/10 ,  C25D17/00

    CPC分类号： C25D17/12 ,  C25D7/123 ,  C25D17/001

    摘要： An adjustable anode assembly for a wet processing apparatus to allow selective tuning of the electrical field density distribution within a wet process chemical of the apparatus, which in turn allows the process specification or specifications to be selectively varied across the process surface of a wafer when processed by the apparatus. The adjustable anode assembly includes an anode which may be divided into several plates, at least one of which is capable of being moved from a first plane to at least a second plane.

    摘要翻译： 一种用于湿处理设备的可调节阳极组件，用于允许选择性地调节设备的湿法化学品中的电场密度分布，这又允许在处理过程中跨过晶片的工艺表面选择性地改变工艺规格或规格 通过该装置。 可调节阳极组件包括阳极，该阳极可分为多个板，其中至少一个能够从第一平面移动到至少第二平面。

    METHOD AND SYSTEM FOR YIELD AND PRODUCTIVITY IMPROVEMENTS IN SEMICONDUCTOR PROCESSING
    26.
    发明申请
    METHOD AND SYSTEM FOR YIELD AND PRODUCTIVITY IMPROVEMENTS IN SEMICONDUCTOR PROCESSING 失效
    半导体加工中的生产率和生产率改进方法与系统

    公开(公告)号：US20080064127A1

    公开(公告)日：2008-03-13

    申请号：US11559781

    申请日：2006-11-14

    申请人： Chen-Hua Yu ,  Lawrance Sheu ,  Yi-Li Hsiao ,  Francis Ko

    发明人： Chen-Hua Yu ,  Lawrance Sheu ,  Yi-Li Hsiao ,  Francis Ko

    IPC分类号： H01L21/66

    CPC分类号： H01L22/14 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A semiconductor processing method includes processing a first substrate while detecting at least one first processing parameter value in a first apparatus. The first processing parameter is analyzed, thereby yielding at least one first predicted parameter value. The first predicted parameter value is compared with a first pre-defined parameter value, thereby yielding at least one first comparison result. A first recipe is applied corresponding to the first comparison result for processing a second substrate in the first apparatus.

    摘要翻译： 半导体处理方法包括在检测第一装置中的至少一个第一处理参数值的同时处理第一基板。 分析第一处理参数，从而产生至少一个第一预测参数值。 将第一预测参数值与第一预定义参数值进行比较，从而产生至少一个第一比较结果。 对应于用于处理第一装置中的第二基板的第一比较结果应用第一配方。

    SUBSTRATE CARRIER AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME
    27.
    发明申请
    SUBSTRATE CARRIER AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME 有权
    基板载体和设备接口以及包括其中的设备

    公开(公告)号：US20070269293A1

    公开(公告)日：2007-11-22

    申请号：US11419914

    申请日：2006-05-23

    申请人： Chen-Hua Yu ,  Yi-Li Hsiao

    发明人： Chen-Hua Yu ,  Yi-Li Hsiao

    IPC分类号： H01L21/677

    CPC分类号： H01L21/67376 ,  H01L21/67393 ,  H01L21/67772

    摘要： A carrier comprises an enclosure, a cabinet and at least one substrate holder. The enclosure comprises a door. The cabinet is coupled to the carrier. The cabinet comprises at least one valve and contains at least one reduction fluid. The substrate holder is disposed within the enclosure to support at least one substrate.

    摘要翻译： 载体包括外壳，机壳和至少一个基板保持器。 外壳包括一个门。 机柜耦合到载体。 所述柜包括至少一个阀并且包含至少一个还原流体。 衬底保持器设置在外壳内以支撑至少一个衬底。

    PROCESS APPARATUSES
    28.
    发明申请
    PROCESS APPARATUSES 有权
    过程设备

    公开(公告)号：US20070267461A1

    公开(公告)日：2007-11-22

    申请号：US11419933

    申请日：2006-05-23

    申请人： Chen-Hua Yu ,  Minghsing Tsai ,  Yi-Li Hsiao

    发明人： Chen-Hua Yu ,  Minghsing Tsai ,  Yi-Li Hsiao

    IPC分类号： A47J36/02

    CPC分类号： H01L21/67196 ,  H01L21/67017 ,  H01L21/76849 ,  H01L21/76883

    摘要： An apparatus includes an enclosure, at least one process chamber, a robot and at least one valve. The enclosure has a gas therein and at least one door configured to cover an opening into the enclosure. The gas includes at least one reduction gas. The robot is disposed within the enclosure and configured to transfer a substrate between the door and the process chamber. The valve is coupled to the enclosure.

    摘要翻译： 一种装置包括外壳，至少一个处理室，机​​器人和至少一个阀。 外壳中具有气体，并且至少一个门构造成覆盖到外壳中的开口。 气体包括至少一种还原气体。 机器人设置在外壳内并且构造成在门和处理室之间传送基板。 阀连接到外壳。