Abstract:
An object of the present invention is to provide a transfer film and a photosensitive composition, with which a film having excellent low moisture permeability and excellent scratch resistance can be formed. The transfer film of the present invention is a transfer film including a temporary support and a photosensitive layer, in which the photosensitive layer contains a polymer A and a compound β, the polymer A has a repeating unit (a) having a carboxy group linked to a main chain by a linking group having 1 or more carbon atoms, and the compound β has a structure b0 which reduces an amount of the carboxy group included in the polymer A by exposure.
Abstract:
Provided are a photosensitive composition including a polymer having a polymerizable functional group in a side chain and an ammonium compound including an ammonium cation and a carboxylate anion; a transfer film; a cured film; a laminate; a touch panel; a method for producing a polymer; and a method for producing a photosensitive composition.
Abstract:
A manufacturing method of a lubricant composition includes mixing a composite ester A that contains polyester obtained by condensing trihydric or more polyhydric alcohol a1, a divalent or more polyvalent carboxylic acid a2, and at least one selected from monohydric alcohol a3 or a monovalent carboxylic acid a4, with a compound B having a hydroxyl number of greater than 50 mgKOH/g. A lubricant composition contains the composite ester A and the compound B.
Abstract:
A nonaqueous electrolyte solution including a nonaqueous solvent; an electrolyte; and a combustion inhibitor, in which the combustion inhibitor contains a phosphazene compound, and specific conditions are defined by boiling points of a combustion inhibitor, a boiling point of a solvent, and the like.
Abstract:
A non-aqueous liquid electrolyte for a secondary battery, containing: a compound represented by formula (I); an electrolyte; and an organic solvent, in which the non-aqueous liquid electrolyte has a viscosity of 20 mPa·s at 25° C. or less, wherein Ra, Re and Rf each represent an organic group, and Re and Rf may be bonded with each other to form a ring; Xa represents a substituent represented by formula (a) or (b); Rb and Rc each represent a hydrogen atom or a substituent; and Rd represents a hydrogen atom or an organic group.
Abstract:
A nozzle ejects a functional liquid having a viscosity of not less than 5 millipascal·second and not more than 20 millipascal·second, onto a substrate. The functional liquid inside a pressure chamber connected to the nozzle is pressurized. A drive voltage having a pull waveform element which causes the pressure chamber to expand from a steady state and a push waveform element which causes the expanded pressure chamber to contract, is generated with a relationship between a slope γ1 representing voltage change per unit time in the pull waveform element, the viscosity η of the functional liquid, a resonance period Tc of the head, and a slope γ2 representing voltage change per unit time in the push waveform element satisfying (2/Tc)≦γ1≦(η/10) and γ2≦γ1.
Abstract:
Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.
Abstract:
Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms) (Equation 1)
Abstract:
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;