公开(公告)号：US11500286B2

公开(公告)日：2022-11-15

申请号：US16197542

申请日：2018-11-21

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna ,  Kazumasa Morozumi ,  Takashi Aridomi ,  Soji Ishizaka

IPC: G03F7/033 ,  C08F2/44 ,  C08F2/48 ,  G03F7/105 ,  G06F3/044 ,  G03F7/004

Abstract: Provided are a photosensitive resin composition including: a binder; a polymerizable monomer; a polymerization initiator; a pigment; and a solvent, in which the polymerizable monomer includes a difunctional polymerizable monomer having a molecular weight equal to or smaller than 500, and a content of the difunctional polymerizable monomer having a molecular weight equal to or smaller than 500 is equal to or greater than 50% by mass with respect to a total mass of the polymerizable monomer, a transfer film, a decorative pattern, and a touch panel.

公开(公告)号：US10795515B2

公开(公告)日：2020-10-06

申请号：US15928360

申请日：2018-03-22

Applicant: FUJIFILM Corporation

Inventor： Takashi Aridomi ,  Shinichi Kanna

IPC: G06F3/044 ,  B32B27/00 ,  B32B9/04 ,  B32B27/08 ,  B32B27/30 ,  B32B27/36

Abstract: A transfer film including a temporary support and a photosensitive transparent resin layer located on the temporary support, in which the photosensitive transparent resin layer includes (A) a binder polymer, (B) a photopolymerizable compound having an ethylenic unsaturated group, (C) a photopolymerization initiator, and (D) a rosin compound can be used to form electrode protective films for electrostatic capacitance-type input devices which have a low moisture permeability and are excellent in terms of heat and moisture resistance after the supply of saline water; an electrode protective film for an electrostatic capacitance-type input device; a laminate; a method for manufacturing the laminate; and an electrostatic capacitance-type input device.

公开(公告)号：US10471689B2

公开(公告)日：2019-11-12

申请号：US14721126

申请日：2015-05-26

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna ,  Hideaki Ito

IPC: B32B27/08 ,  B32B27/00 ,  B32B27/20 ,  B32B27/30 ,  B32B37/14 ,  B32B37/24 ,  B32B37/26 ,  B32B38/10 ,  B32B7/02 ,  B32B37/00 ,  B32B37/02 ,  B32B38/00 ,  G06F3/044 ,  G06F3/041 ,  B32B3/10

Abstract: A transfer film has a temporary support, a first curable transparent resin layer, a second curable transparent resin layer which is disposed adjacent to the first curable transparent resin layer in this order. The refractive index of the second curable transparent resin layer is higher than the refractive index of the first curable transparent resin layer and equal to or greater than 1.6.

公开(公告)号：US10192651B2

公开(公告)日：2019-01-29

申请号：US15347780

申请日：2016-11-10

Applicant: FUJIFILM CORPORATION

Inventor： Shinichi Kanna

IPC: C09D131/04 ,  H01B3/30 ,  C09D129/04 ,  C09D133/08 ,  C09D133/12 ,  C09D175/14 ,  G06F3/044 ,  H05K3/00 ,  H05K3/46 ,  C08G18/67 ,  C08G18/80 ,  C08L33/06 ,  C09D4/06

Abstract: A transfer material and a method of manufacturing the same, the transfer material including, in this order, a temporary support body, a first resin layer, and a second resin layer, the first resin layer not being water soluble, the second resin layer including a water soluble polymer, the second resin layer including a compound that has a heteroaromatic ring including a nitrogen atom as a ring member, and a content of the compound that has a heteroaromatic ring including a nitrogen atom as a ring member in the second resin layer being 3.0% by mass or greater with respect to a total solid content of the second resin layer. A laminated body including a substrate; an electrode pattern that is positioned above the substrate and that includes a metal in at least part of the electrode pattern; a second resin layer positioned above the electrode pattern; and a first resin layer positioned above the second resin layer, the second resin layer including a compound that has a heteroaromatic ring including a nitrogen atom as a ring member.

公开(公告)号：US09632639B2

公开(公告)日：2017-04-25

申请号：US14585298

申请日：2014-12-30

Applicant: FUJIFILM CORPORATION

Inventor： Shinichi Kanna ,  Ryuji Saneto

IPC: G06F3/044 ,  B32B3/10 ,  G06F3/041 ,  G06F3/0354

CPC classification number: G06F3/044 ,  G06F3/03547 ,  G06F3/0412 ,  G06F2203/04111 ,  G06F2203/04112

Abstract: Provided is a transparent laminate which does not have a problem in which a transparent electrode pattern is visually recognized, a capacitance type input device having the transparent laminate, and an image display device provided with the capacitance type input device as a constituent element. The transparent laminate of the invention includes a region where a transparent substrate, a first transparent film having a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film having a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm are laminated in this order in a plane.

公开(公告)号：US09541831B2

公开(公告)日：2017-01-10

申请号：US14638471

申请日：2015-03-04

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/004

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

Abstract translation: 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。

公开(公告)号：US09465298B2

公开(公告)日：2016-10-11

申请号：US14973097

申请日：2015-12-17

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Shinichi Kanna

IPC: G03F7/32 ,  G03F7/30 ,  G03F7/20 ,  G03F7/039 ,  G03F7/40

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2024 ,  G03F7/30 ,  G03F7/32 ,  G03F7/40 ,  Y10T428/24802

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.

公开(公告)号：US09250530B2

公开(公告)日：2016-02-02

申请号：US14549164

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Shinichi Kanna

IPC: G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  G03F7/039 ,  G03F7/40

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.

公开(公告)号：US09116426B2

公开(公告)日：2015-08-25

申请号：US13746698

申请日：2013-01-22

Applicant: FUJIFILM Corporation

Inventor： Kyohei Arayama ,  Hiroaki Idei ,  Shinichi Kanna ,  Kenta Ushijima ,  Akiyoshi Goto

IPC: G02B5/00 ,  G03F7/004 ,  G03F7/00 ,  C07D207/34 ,  C07F1/00 ,  C07F3/00 ,  C07F9/00 ,  C07F15/06 ,  C09B57/10 ,  G02B5/22

CPC classification number: G03F7/0007 ,  C07D207/34 ,  C07F1/005 ,  C07F3/003 ,  C07F9/005 ,  C07F15/065 ,  C09B57/10 ,  C09B67/0033 ,  C09B67/0034 ,  C09B69/105 ,  G02B5/223

Abstract: The invention provides a dye compound having a partial structure represented by the following formula (5): wherein in formula (5), Dye represents a dye structure; G1 represents NR or an oxygen atom; G2 represents a monovalent substituent group having an −Es′ value as a steric parameter of 1.5 or more; p represents an integer from 1 to 8; when p is 2 or greater, the two or more structures represented by p may be the same or different from each other; and R represents a hydrogen atom or a monovalent substituent group.

Abstract translation: 本发明提供具有由下式（5）表示的部分结构的染料化合物：其中在式（5）中，染料代表染料结构; G1表示NR或氧原子; G2表示作为空间参数的-E'值为1.5以上的一价取代基; p表示1〜8的整数， 当p为2以上时，由p表示的两个以上的结构可以相同也可以不同， R表示氢原子或一价取代基。