摘要:
An electron beam, which can transmit through part of a specimen and can reach a portion that is not exposed to the electron beam, is irradiated, and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A three-dimensional model is assumed, the three-dimensional model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified three-dimensional model.
摘要:
When an image display unit displays a magnified image of an object being examined, a measuring unit automatically computes the dimensions of the image at the preset position. A tolerance range setting unit has been supplied with an upper and a lower limit value according to which it can judge the dimensions of the object at the preset position to be normal, whereas a comparison-decision unit decides that the dimensions thus computed are held between the upper and lower limit values. When the measured result is found outside the range of upper to lower limit values, the right-or-wrong decision data is stored in a memory and is redisplayed in the form of an image by the image display unit at proper timing.
摘要:
In a scanning electron microscope with such a structure that a retarding static field for an electron beam is produced between an objective lens and a sample, when the following three conditions can be satisfied, a switch for applying a superimposed voltage is closed to apply the superimposed voltage to the sample. In the first condition, a switch for applying an acceleration voltage is closed and the acceleration voltage 5 is applied. In the second condition, both of a valve and a valve are opened which are provided between a cathode and the sample. In the third condition, when the sample is mounted on a sample stage by a sample replacing mechanism 57, a valve through which the sample passes is closed. The sample stage is electrically connected via a discharge resistor to a sample holder, and when the switch is opened, electric charges charged on the sample are discharged through the sample holder and the sample stage. As a result, when the sample is mounted/released onto/from the sample stage, the application of the voltage to the sample is automatically interrupted.
摘要:
Provided between an optical axis of a primary electron beam directed to a specimen and a secondary electron detector for detecting secondary electrons emitted from the specimen is a shielding electrode which has a transparency for secondary electrons and has a shielding effect for an attracting electric field produced by the secondary electron detector. An opposed electrode is provided at a position facing the shielding electrode with the optical path of the electron beam disposed therebetween. Applied across the shielding electrode and the opposed electrode is a voltage which produces a deflecting electric field along the electron beam path in the vicinity of the secondary electron detector. The deflecting electric field deflects the secondary electrons to the shielding electrode side so that they pass therethrough before they are captured by the secondary electron detector. Optical axis correction coils are provided for generating a magnetic field to correct any bending effect on the trajectory of the primary electron beam by the deflecting electric field.
摘要:
An SEM can inspect a groove or hole in the surface of a specimen by irradiating the specimen with a high energy electron beam. The SEM is used in the manufacturing process of a semiconductor device to observe the configuration of the bottom of a deep hole.
摘要:
Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.
摘要:
An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要:
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要:
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要:
Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.