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21.发明申请公开(公告)号：US20090002670A1
公开(公告)日：2009-01-01
申请号：US12221045
申请日：2008-07-30
申请人： Frank Melzer , Markus Weiss , Guenther Dengel , Volker Stein
发明人： Frank Melzer , Markus Weiss , Guenther Dengel , Volker Stein
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G02B7/005 , G02B7/1827 , G03F7/70258
摘要： The invention relates to an apparatus for the manipulation and/or adjustment of an optical element with respect to a structure, the optical element being connected to the structure by means of a number of setting members, and the setting members having as active adjusting elements screw elements or piezoceramic elements, which in each case produce an active force along one degree of freedom and by means of which the optical element is connected to the structure in such a way that it can be set in up to six degrees of freedom.
摘要翻译： 本发明涉及一种用于相对于结构操作和/或调节光学元件的装置，所述光学元件借助于多个固定构件连接到所述结构，并且所述固定构件具有作为主动调节元件的螺钉 元件或压电陶瓷元件，其在每种情况下沿着一个自由度产生主动力，并且通过该元件或光学元件将光学元件连接到结构，使得其可以被设置为高达六个自由度。
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22.发明申请Lighting system, particularly for use in extreme ultraviolet (euv) lithography 失效照明系统，特别适用于极紫外（euv）光刻公开(公告)号：US20050174650A1
公开(公告)日：2005-08-11
申请号：US10512100
申请日：2003-04-04
申请人： Frank Melzer , Wolfgang Singer
发明人： Frank Melzer , Wolfgang Singer
IPC分类号： G02B17/00 , G02B26/08 , G03F7/20 , H01L21/027 , G02B27/10
CPC分类号： G03F7/70075 , G02B26/0816 , G03F7/70141 , G03F7/702
摘要： A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≦193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements of the second optical element can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements of the first optical element to the second screen elements of the second optical element by displacing and/or tilting the first and second screen elements.
摘要翻译： 一种特别用于极紫外（EUV）光刻的照明系统，包括用于制造波长<= 193nm的半导体元件的投影透镜，其具有光源，物平面，出射光瞳，具有第一光学元件的第一光学元件 用于产生光通道的屏幕元件，以及具有第二屏元件的第二光学元件。 第二光学元件的屏幕元件被分配给由第一光学元件的第一屏幕元件之一形成的每个光通道。 第一光学元件和第二光学元件的屏幕元件可以被配置或布置成使得它们为每个光通道产生从光源到物平面的连续光束路线。 可以调节第一光学元件的第一屏元件的角度以便改变倾斜。 第二光学元件的第二屏幕元件的位置和/或角度可以彼此独立地且独立地进行调整，以便实现第一光学元件的第一屏幕元件与第二光学元件的第二屏幕元件的另一分配 元件通过移位和/或倾斜第一和第二屏元件。
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23.发明授权公开(公告)号：US07580207B2
公开(公告)日：2009-08-25
申请号：US11383012
申请日：2006-05-12
申请人： Frank Melzer
发明人： Frank Melzer
CPC分类号： G02B7/023 , G03F7/70825 , G03F7/70966
摘要： An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.
摘要翻译： 光学装置包括具有至少一个光学表面和第一光轴的光学部件，安装有所述光学部件的插座，布置成施加近似平行于光学部件的光轴的力的第一操纵器，用于改变 光学部件，具有在部件中引起应力双折射的强度的力。
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24.发明申请公开(公告)号：US20060279856A1
公开(公告)日：2006-12-14
申请号：US11383012
申请日：2006-05-12
申请人： Frank Melzer
发明人： Frank Melzer
IPC分类号： G02B7/02
CPC分类号： G02B7/023 , G03F7/70825 , G03F7/70966
摘要： An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.
摘要翻译： 光学装置包括具有至少一个光学表面和第一光轴的光学部件，安装有所述光学部件的插座，布置成施加近似平行于光学部件的光轴的力的第一操纵器，用于改变 光学部件，具有在部件中引起应力双折射的强度的力。
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公开(公告)号：US20060222044A1
公开(公告)日：2006-10-05
申请号：US11343471
申请日：2006-01-31
申请人： Frank Melzer , Axel Scholz
发明人： Frank Melzer , Axel Scholz
IPC分类号： G01N25/00
CPC分类号： G01J1/4257 , G01J2005/0077 , G03F7/70075 , G03F7/7085
摘要： The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.
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公开(公告)号：US06897599B2
公开(公告)日：2005-05-24
申请号：US10075797
申请日：2002-02-12
CPC分类号： G03F7/70991 , F16F15/005 , F16F15/02 , G03F7/709
摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.
摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。
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公开(公告)号：US20090135395A1
公开(公告)日：2009-05-28
申请号：US12337262
申请日：2008-12-17
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
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公开(公告)号：US07034998B2
公开(公告)日：2006-04-25
申请号：US09888214
申请日：2001-06-21
申请人： Frank Melzer , Ulrich Bingel
发明人： Frank Melzer , Ulrich Bingel
CPC分类号： G03F7/70825 , B23K26/0643 , B23K28/006 , C25D1/00 , C25D5/022 , G02B5/09 , G03F7/702 , Y10S359/90
摘要： In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements (9) are positioned on the basic body (8, 14) and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure (11) and the optical elements (9) are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure (14) as the basic body.
摘要翻译： 在将多个光学元件（9）连接到基体（8）的方法中，特别是用于制造小面镜（1），例如用于EUV照明系统的束混合和场成像的方法中，各个光学元件 （9）定位在基体（8,14）上，并且随后通过电流加工工艺相互连接。 或者，多个光学元件在辅助结构（11）上对准，随后使光学元件（9）在其后侧上以电流方式长大，形成作为基体的支撑结构（14）。
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公开(公告)号：US06844994B2
公开(公告)日：2005-01-18
申请号：US09956715
申请日：2001-09-19
申请人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
发明人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
IPC分类号： G02B26/00 , G02B5/10 , G02B13/24 , G02B26/06 , G02B26/08 , G02B27/00 , G02B27/18 , G03F7/20 , H01L21/027 , G02B7/02
CPC分类号： G03F7/70258 , G02B26/06 , G02B27/0068
摘要： In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.
摘要翻译： 在用于成像装置中的光学元件的特定变形的系统中，特别是在具有用于微光刻的投影透镜的投影曝光机中，为了消除图像误差或主动调节，压电元件作为致动器 形式的薄板，薄膜或层到要变形的表面或整合到它们中。 结合具有传感器的自适应伺服回路，通过作为致动器的压电元件的受控激活，力和/或力矩被施加在光学元件上用于其特定变形。
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公开(公告)号：US06700715B2
公开(公告)日：2004-03-02
申请号：US10016704
申请日：2001-12-11
申请人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
发明人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
IPC分类号： G02B702
CPC分类号： G03F7/709 , F16F15/005 , F16F15/02 , G02B27/646
摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.
摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。
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