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19 条记录 (耗时 0.022 秒)

    Method of connecting a multiplicity of optical elements to a basic body
    1.
    发明授权
    Method of connecting a multiplicity of optical elements to a basic body 失效
    将多个光学元件连接到基体的方法

    公开(公告)号：US07034998B2

    公开(公告)日：2006-04-25

    申请号：US09888214

    申请日：2001-06-21

    申请人： Frank Melzer ,  Ulrich Bingel

    发明人： Frank Melzer ,  Ulrich Bingel

    IPC分类号： G02B5/08 ,  G02B7/182

    CPC分类号： G03F7/70825 ,  B23K26/0643 ,  B23K28/006 ,  C25D1/00 ,  C25D5/022 ,  G02B5/09 ,  G03F7/702 ,  Y10S359/90

    摘要： In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements (9) are positioned on the basic body (8, 14) and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure (11) and the optical elements (9) are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure (14) as the basic body.

    摘要翻译： 在将多个光学元件（9）连接到基体（8）的方法中，特别是用于制造小面镜（1），例如用于EUV照明系统的束混合和场成像的方法中，各个光学元件 （9）定位在基体（8,14）上，并且随后通过电流加工工艺相互连接。 或者，多个光学元件在辅助结构（11）上对准，随后使光学元件（9）在其后侧上以电流方式长大，形成作为基体的支撑结构（14）。

    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
    5.
    发明申请
    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
    光学元件曝光过程

    公开(公告)号：US20080225247A1

    公开(公告)日：2008-09-18

    申请号：US12046186

    申请日：2008-03-11

    申请人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03B27/54 ,  G03B27/52 ,  G02B23/16

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 公开了一种包括第一光学元件模块和密封装置的光学元件单元。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和 第二个空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。

    EUV microlithography illumination optical system and EUV attenuator for same
    6.
    发明授权
    EUV microlithography illumination optical system and EUV attenuator for same 有权
    EUV微光刻照明光学系统和EUV衰减器相同

    公开(公告)号：US09482959B2

    公开(公告)日：2016-11-01

    申请号：US13223458

    申请日：2011-09-01

    申请人： Nicolas Schmidts ,  Joachim Hartjes ,  Ulrich Bingel ,  Boaz Pnini-Mittler

    发明人： Nicolas Schmidts ,  Joachim Hartjes ,  Ulrich Bingel ,  Boaz Pnini-Mittler

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/702 ,  G03F7/70083 ,  G03F7/701 ,  G03F7/70191

    摘要： An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.

    摘要翻译： 用于EUV微光刻的照明光学系统用于将来自辐射源的照明光束引导到物场。 至少一个EUV反射镜具有用于形成照明光束的具有非平面镜面的反射面。 EUV镜具有至少一个安置在其前面的EUV衰减器。 面向EUV反射镜的反射面的衰减器面具有衰减器形貌，其被设计为补充镜面形貌，使得衰减器面的至少部分以与反射面成一定间隔的距离布置。 结果是照明光学系统，其中可以在尽可能少的不需要的辐射损失的物场上校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。