摘要:
Defect detection for post-manufacturing analysis of an integrated circuit die is enhanced via a method and system that use IR thermography to detect defects in circuitry within the die. According to an example embodiment of the present invention, substrate is removed from an integrated circuit die and a target region is exposed. A portion of the target region is heated with an infrared (IR) laser beam, and the die is imaged using IR thermography. The image is compared with a reference image, and damage to the integrated circuit is detected therefrom.
摘要:
Post-manufacturing analysis of a semiconductor device is enhanced via a method and system that use a light emitting diode (LED) formed in a semiconductor die during its manufacture. According to an example embodiment of the present invention, a LED is formed within a semiconductor die having a circuit side opposite a back side. A conductor is formed that extends from the LED to the back side of the die, and is coupled to a terminal formed on the back side. The LED is activated via the terminal and used to align the die for analysis. By forming a LED within the semiconductor die during its manufacture, post manufacturing analysis is enhanced by the alignment capabilities provided by the readily activated LED.
摘要:
A substrate removal approach involves sensing acoustic energy in a semiconductor device as a function of substrate thickness in the device as substrate is being removed. According to an example embodiment of the present invention, a semiconductor chip having substrate at a back side that is opposite circuitry at a circuit side is analyzed. Some or all of the substrate in the back side of the semiconductor chip is removed, and a thinned region having a bottom area is formed. A laser is directed to the bottom area, and a thermal parameter characterizing target circuitry in the device is detected in response to the laser. The detected parameter is used and an indication of the remaining substrate thickness between the bottom area and the circuitry is determined. In response to the indicated thickness, the substrate removal process is controlled, making possible effective control of the substrate removal process.
摘要:
Semiconductor analysis is improved via the use of fiber optic communications. According to an example embodiment of the present invention, a stimulation device is adapted to stimulate an integrated circuit die, and the die generates a response to the stimulation. An optical signal generator, either incorporated into the die or coupled to the die, detects the response, converts the response to an optical signal and transmits the optical signal. The optical signal is received at a testing arrangement adapted to analyze the die therefrom. The optical signal is used to analyze the die, improving signal quality and the ability to perform high-speed analysis of the die.
摘要:
Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.
摘要:
Analysis of a flip-chip type IC die having SOI structure is enhanced via analysis and repair of the die that make possible analysis that would typically result in the die being in a state of disrepair. According to an example embodiment of the present invention, a focused ion beam (FIB) is directed at a back side of a flip-chip die having a circuitry in a circuit side opposite a back side, wherein the circuitry including silicon on insulator (SOI) structure. The FIB is used to remove a selected portion of substrate including a portion of the insulator of the SOI structure from the die. The removed substrate exposes an insulator region in the die, and a signal is coupled from circuitry in the die via the exposed insulator region and used to analyze the die. Material is deposited in the exposed region and the selected portion of the die that had been removed is reconstructed. The reconstruction takes place before, during or after the signal is coupled, depending upon the die being analyzed and the type of analysis being performed. In this manner, access for analyzing the die is improved via the ability to couple a signal through the insulator and to repair a portion of the die that has been altered for analysis. Analysis that would otherwise be destructive can be performed and the ability of the die to function after analysis can be maintained.
摘要:
The invention is directed to a system and method for analyzing an integrated circuit having silicon on insulator (SOI) structure. According to one example embodiment of the present invention, an optical beam arrangement is adapted to direct a modulated beam at a selected portion of the integrated circuit. The beam is sufficiently modulated to inhibit optical beam intrusion on the structure and operation of the integrated circuit. A reflected optical waveform response is obtained from the SOI selected portion. The inhibition of optical beam intrusion enhances the ability to analyze integrated circuits using an optical beam, making possible the use of analysis methods that otherwise would be difficult or even impossible to use.
摘要:
The present invention is directed analysis of a flip-chip integrated circuit die having SOI structure that improves the ability to image and analyze selected portions of circuitry in the die. According to an example embodiment of the present invention, a lens is formed in a back side of a flip-chip die and over the insulator portion of SOI structure in the die. Light is directed at the lens and the lens is used to focus the light to target circuitry in the die. A reflection from the circuitry is detected and used to analyze the die, such as by imaging the circuitry in the die and identifying defects therein. The lens formed in the die enhances the ability to focus light to selected circuitry in the die and improves the ability to analyze dies having SOI structure through the insulator.
摘要:
Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within die from the back side without breaching the thin insulator layer of the SOI structure. According to an example embodiment, a portion of substrate is removed from the back side of a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side. Electrical connection is made to a portion of the circuitry within the die via a capacitive coupling arrangement. The electrical connection is used to obtain an electrical measurement correlated with circuitry logic states of the die that is used for analysis.
摘要:
According to one aspect of the disclosure, the present invention provides methods and arrangements for testing a flip chip SOI semiconductor device after the back side of the chip has been thinned to expose a selected region in the substrate. For some chips, thinning removes substrate material useful for drawing heat away from the internal circuitry when the circuitry is running at high speeds. To compensate for this material loss, a special test fixture having a passive, corrosion-resistant heat-dissipating device is arranged to draw heat from the device.