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    Illuminating arrangement for a projection microlithographic exposure apparatus
    21.
    发明授权
    Illuminating arrangement for a projection microlithographic exposure apparatus 失效
    投影微光刻曝光装置的照明装置

    公开(公告)号：US5572287A

    公开(公告)日：1996-11-05

    申请号：US355177

    申请日：1994-12-08

    申请人： Johannes Wangler ,  Gerhard Ittner

    发明人： Johannes Wangler ,  Gerhard Ittner

    IPC分类号： G02B19/00 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  G02B19/06

    CPC分类号： G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70583

    摘要： The invention is directed to an illuminating arrangement for selectively providing a projection microlithographic exposure apparatus with various types of illumination including conventional illumination having an adjustable coherence factor (.sigma.), illumination via an annular aperture and symmetrically inclined illumination from two or four directions. The illuminating arrangement includes a light source for emitting light; a first light collecting device for collecting a first portion of the light in a first spatial angle region of the emitted light; a first shaping device for receiving and shaping the first portion of the light into a first shaped flux of light; a second light collecting device for collecting a second portion of the light in a second spatial angle region of the emitted light; a second shaping device for receiving and shaping the second portion of the light into a second shaped flux of light; an objective defining a pupillary plane and a reticle plane downstream of the pupillary plane; and, an imaging device for imaging images of the first and second shaped fluxes of light into sectors of the pupillary plane. The objective transmits the fluxes of light to the reticle plane and the illuminating arrangement also includes a first displacing device for operating on the first shaped flux of light so as to radially and azimuthally displace the image of the first shaped flux of light in the pupillary plane and a second displacing device for operating on the second shaped flux of light so as to radially and azimuthally displace the image of the second shaped flux of light in the pupillary plane.

    摘要翻译： 本发明涉及用于选择性地提供具有各种类型照明的投影微光刻曝光设备的照明装置，包括具有可调节相干因子（sigma）的常规照明，经由环形孔的照明和来自两个或四个方向的对称倾斜照明。 照明装置包括用于发光的光源; 第一光收集装置，用于在发射的光的第一空间角度区域中收集光的第一部分; 第一成形装置，用于接收和成形第一部分光成为第一形状的光通量; 第二聚光装置，用于在发射的光的第二空间角度区域中收集第二部分的光; 第二成形装置，用于将第二部分的光接收和成形为第二形状的光束; 定义瞳孔平面和在瞳孔平面下游的光罩平面的物镜; 以及用于将第一和第二形状光束的图像成像到瞳孔平面的扇区中的成像装置。 目标将光通量传递到光罩平面，并且照明装置还包括用于在第一形状光束上操作的第一移位装置，以便径向地和方位角地置换瞳孔平面中的第一形状光通量的图像 以及第二移位装置，用于对所述第二形状光束进行操作，以便径向地和方位角地置换所述瞳孔平面中的所述第二形状光束的图像。

    OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE
    23.
    发明申请
    OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE 审中-公开
    用于产生用于处理基板的光束的光学系统

    公开(公告)号：US20120154895A1

    公开(公告)日：2012-06-21

    申请号：US13352703

    申请日：2012-01-18

    申请人： Holger Muenz ,  Wolfgang Merkel ,  Damian Fiolka ,  Johannes Wangler

    发明人： Holger Muenz ,  Wolfgang Merkel ,  Damian Fiolka ,  Johannes Wangler

    IPC分类号： G02F1/11

    CPC分类号： G02B19/0014 ,  B23K26/0006 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0676 ,  B23K26/352 ,  B23K2101/40 ,  B23K2103/56 ,  G02B19/0052 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0961 ,  G02B27/0972

    摘要： An optical system for generating a light beam for treating a substrate in a substrate plane is disclosed. The light beam has a beam length in a first dimension perpendicular to the propagation direction of the light beam and a beam width in a second dimension perpendicular to the first dimension and also perpendicular to the light propagation direction.The optical system includes a mixing optical arrangement which divides the light beam in at least one of the first and second dimensions into a plurality of light paths incident in the substrate plane in a manner superimposed on one another. At least one coherence-influencing optical arrangement is present in the beam path of the light beam and acts on the light beam to at least reduce the degree of coherence of light for at least one light path distance of one light path from at least one other light path.

    摘要翻译： 公开了一种用于产生用于处理衬底平面中的衬底的光束的光学系统。 光束具有垂直于光束的传播方向的第一维中的光束长度和垂直于第一维度并且也垂直于光传播方向的第二维度中的光束宽度。 光学系统包括混合光学装置，其将第一和第二维度中的至少一个中的光束以彼此叠加的方式入射到基板平面中的多个光路分离。 至少一个相干影响的光学布置存在于光束的光束路径中并且作用在光束上以至少减少光的相干程度，用于至少一个光路与至少一个其它光路的光路距离 光路。

    ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS
    26.
    发明申请
    ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS 审中-公开
    用于投影微结构的照明光学及相关方法

    公开(公告)号：US20090262324A1

    公开(公告)日：2009-10-22

    申请号：US12464730

    申请日：2009-05-12

    申请人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

    发明人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

    IPC分类号： G03B27/80

    CPC分类号： G03F7/7085 ,  G03F7/70116

    摘要： A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical assembly (21, 23 to 26) which converts the light intensity distribution defined by the light distribution device (12a) in a first plane (19) of the illumination optics (5) into an illumination angle distribution in the reticle plane (6). Downstream of an output coupling device (17), which is arranged in the light path between the light deflection array (12) and the reticle plane (6), a space and time resolving detection device (30) is exposed to outcoupled illumination light (31) in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution in the first plane (19). The detection device (30) allows the influence of separate elements or groups of separate elements on the light intensity distribution in the first plane (19) to be determined, particularly by varying said separate elements or groups of separate elements over time. The result is an illumination optics in which the function of the light deflection array is performed during normal operation.

    摘要翻译： 微光刻投影曝光装置（1）包括具有用于照亮标线板平面（6）中的照明场的照明光学器件（5）的照明系统（4）。 照明光学器件（5）还包括配光装置（12a），其包括分离元件的光偏转阵列（12）和光学组件（21,23至26），该光学组件（21,23至26）将由光分配装置 （5）的第一平面（19）中的光线（12a）成为所述掩模版平面（6）中的照明角度分布。 布置在光偏转阵列（12）和光罩平面（6）之间的光路中的输出耦合装置（17）的下游，空间和时间分辨检测装置（30）暴露于外耦合照明光 31），使得检测装置（30）检测对应于第一平面（19）中的光强度分布的光强度分布。 检测装置（30）允许确定分离的元件或单独元件组对第一平面（19）中的光强度分布的影响，特别是通过随时间改变所述单独元件或单独元件组。 结果是在正常操作期间执行光偏转阵列的功能的照明光学器件。

    Illumination System of a Microlithographic Exposure Apparatus
    30.
    发明申请
    Illumination System of a Microlithographic Exposure Apparatus 有权
    微光刻曝光设备的照明系统

    公开(公告)号：US20080212327A1

    公开(公告)日：2008-09-04

    申请号：US11660754

    申请日：2005-08-23

    申请人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

    发明人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

    IPC分类号： F21V7/00

    CPC分类号： G03F7/70108 ,  G03F7/70183

    摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

    摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。