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公开(公告)号：US06774376B2
公开(公告)日：2004-08-10
申请号：US10157941
申请日：2002-05-29
IPC分类号： H01J3720
CPC分类号： H01L21/687
摘要： A wafer holder assembly includes first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite distal retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges from the wafer during the ion implantation process. The assembly can further include additional graphite retaining members for maintaining the structural integrity of the assembly during the extreme conditions associated with SIMOX wafer processing without the need for potentially wafer-contaminating adhesives and conventional fasteners. The wafer-contacting pins at the distal end of the arms can be formed from silicon. The silicon pins can be coated with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface. The pins can have a limited profile to minimize the amount of pin material proximate the wafer for reducing the likelihood of electrical arcing from the wafer to the pin.
摘要翻译： 晶片保持器组件包括第一和第二主要结构构件，第一和第二晶片保持臂从该结构构件延伸。 第一臂通过石墨远端保持构件固定到主要结构构件。 第二臂通过石墨偏压构件枢转地偏置到晶片保持位置。 这种布置提供了从晶片到组件的导电路径，用于在离子注入过程期间抑制来自晶片的放电。 组件还可以包括附加的石墨保持构件，用于在与SIMOX晶片加工相关的极端条件下维持组件的结构完整性，而不需要潜在的晶片污染粘合剂和常规紧固件。 在臂的远端处的晶片接触销可以由硅形成。 硅引脚可以涂覆氮化钛以增强与晶片的电接触并提供耐磨表面。 引脚可以具有有限的轮廓以最小化靠近晶片的引脚材料的量，以减少从晶片到引脚的电弧的可能性。
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公开(公告)号：US06433342B1
公开(公告)日：2002-08-13
申请号：US09377028
申请日：1999-08-18
IPC分类号： G21K510
CPC分类号： H01L21/687
摘要： A wafer holder assembly includes first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite distal retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges from the wafer during the ion implantation process. The assembly can further include additional graphite retaining members for maintaining the structural integrity of the assembly during the extreme conditions associated with SIMOX wafer processing without the need for potentially wafer-contaminating adhesives and conventional fasteners. The wafer-contacting pins at the distal end of the arms can be formed from silicon. The silicon pins can be coated with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface. The pins can have a limited profile to minimize the amount of pin material proximate the wafer for reducing the likelihood of electrical arcing from the wafer to the pin.
摘要翻译： 晶片保持器组件包括第一和第二主要结构构件，第一和第二晶片保持臂从该结构构件延伸。 第一臂通过石墨远端保持构件固定到主要结构构件。 第二臂通过石墨偏压构件枢转地偏置到晶片保持位置。 这种布置提供了从晶片到组件的导电路径，用于在离子注入过程期间抑制来自晶片的放电。 组件还可以包括附加的石墨保持构件，用于在与SIMOX晶片加工相关的极端条件下维持组件的结构完整性，而不需要潜在的晶片污染粘合剂和常规紧固件。 在臂的远端处的晶片接触销可以由硅形成。 硅引脚可以涂覆氮化钛以增强与晶片的电接触并提供耐磨表面。 引脚可以具有有限的轮廓以最小化靠近晶片的引脚材料的量，以减少从晶片到引脚的电弧的可能性。
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23.发明授权Apparatus for capturing and removing contaminant particles from an interior region of an ion implanter 失效用于从离子注入机的内部区域捕获和去除污染物颗粒的装置
公开(公告)号：US5656092A
公开(公告)日：1997-08-12
申请号：US574242
申请日：1995-12-18
申请人： Julian G. Blake , Robert Becker , David Chipman , Mary Jones , Lyudmila Menn , Frank Sinclair , Dale K. Stone
发明人： Julian G. Blake , Robert Becker , David Chipman , Mary Jones , Lyudmila Menn , Frank Sinclair , Dale K. Stone
IPC分类号： C23C14/48 , H01J37/16 , H01J37/18 , H01J37/30 , H01J37/317 , H01L21/265 , C23C16/00
CPC分类号： H01J37/3002 , H01J37/3171 , H01J2237/022
摘要： A method of capturing and removing contaminant particles moving within an evacuated interior region of an ion beam implanter is disclosed. The steps of the method include: providing a particle collector having a surface to which contaminant particles readily adhere; securing the particle collector to the implanter such that particle adhering surface is in fluid communication to the contaminant particles moving within the interior region; and removing the particle collector from the implanter after a predetermined period of time. An ion implanter in combination with a particle collector for trapping and removing contaminant particles moving in an evacuated interior region of the implanter traversed by an ion beam is also disclosed, the particle collector including a surface to which the contaminant particles readily adhere and securement means for releasably securing the particle collector to the implanter such that the particle adhering surface is in fluid communication with the evacuated interior region of the implanter.
摘要翻译： 公开了一种捕获和去除在离子束注入机的抽空的内部区域内移动的污染物颗粒的方法。 该方法的步骤包括：提供具有易于粘附污染物颗粒的表面的颗粒收集器; 将颗粒收集器固定到注入机，使得颗粒粘附表面与在内部区域内移动的污染物颗粒流体连通; 并且在预定时间段之后从所述注入机移除所述颗粒收集器。 还公开了一种与用于捕获和去除在离子束穿过的注入器的抽空的内部区域中移动的污染物颗粒的离子注入机，该颗粒收集器包括污染物颗粒易于粘附的表面和固定装置 将颗粒收集器可释放地固定到注入机，使得颗粒粘附表面与注入机的抽空的内部区域流体连通。
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24.发明授权Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses 失效用于从离子束中和和植入装置中原位去除污染物的方法和装置
公开(公告)号：US5633506A
公开(公告)日：1997-05-27
申请号：US519708
申请日：1995-08-28
申请人： Julian G. Blake
发明人： Julian G. Blake
IPC分类号： C23C14/00 , C23C14/48 , H01J27/02 , H01J37/08 , H01J37/30 , H01J37/317 , H01L21/265 , H01J37/36
CPC分类号： H01J37/3002 , H01J2237/0041 , H01J2237/022 , H01J2237/31701
摘要： Method and apparatus are provided for removal of contaminant material adhered to interior surfaces of an ion beam neutralization apparatus and ion implantation apparatus of an ion beam implanter. Contaminant material is removed from the neutralization apparatus and the implantation apparatus using a plasma glow discharge. The contaminant material is also removed from the neutralization apparatus by expanding the ion beam.
摘要翻译： 提供了用于去除附着到离子束中和装置的内表面和离子束注入机的离子注入装置的污染物质的方法和装置。 从中和装置和使用等离子体辉光放电的植入装置除去污染物质。 污染物质也通过扩大离子束从中和装置中除去。
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公开(公告)号：US20120175342A1
公开(公告)日：2012-07-12
申请号：US13342762
申请日：2012-01-03
CPC分类号： G11B5/855
摘要： A novel, technique: for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing hit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on it second portion of the catalysis layer adjacent to the first portion of the catalysis layer.
摘要翻译： 公开了一种新颖的技术：用于制造位图案的介质。 在一个特定的示例性实施例中，该技术可以被实现为用于制造命中图案媒体的方法。 该技术可以被实现为一种方法，包括：在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。
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公开(公告)号：US08153466B2
公开(公告)日：2012-04-10
申请号：US12689605
申请日：2010-01-19
申请人： Russell J. Low , Julian G. Blake , Frank Sinclair
发明人： Russell J. Low , Julian G. Blake , Frank Sinclair
IPC分类号： H01L21/00
CPC分类号： H01L31/18 , C23C14/042 , C23C14/48
摘要： A method of fabricating a workpiece is disclosed. A material defining apertures is applied to a workpiece. A species is introduced to the workpiece through the apertures and the material is removed. For example, the material may be evaporated, may form a volatile product with a gas, or may dissolve when exposed to a solvent. The species may be introduced using, for example, ion implantation or gaseous diffusion.
摘要翻译： 公开了一种制造工件的方法。 将定义孔的材料施加到工件上。 通过孔将物质引入工件，并且去除材料。 例如，该材料可能被蒸发，可能与气体形成挥发性产物，或者当暴露于溶剂时可能会溶解。 可以使用例如离子注入或气体扩散来引入物种。
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公开(公告)号：US20120064373A1
公开(公告)日：2012-03-15
申请号：US13228426
申请日：2011-09-08
申请人： Frank SINCLAIR , Julian G. Blake
发明人： Frank SINCLAIR , Julian G. Blake
CPC分类号： G11B5/855
摘要： A technique for manufacturing hit pattern media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The method may comprise forming an intermediate layer comprising a modified region and a first region adjacent to one another, where the modified region and the first region may have at least one different property; depositing magnetic species on the first region of the intermediate layer to form an active region; and depositing non-ferromagnetic species on the modified region of the intermediate layer to form a separator.
摘要翻译： 公开了一种制造命中图形介质的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于制造钻头图案介质的方法。 该方法可以包括形成包括相邻的修饰区域和第一区域的中间层，其中改质区域和第一区域可具有至少一个不同的性质; 在所述中间层的第一区域上沉积磁性物质以形成活性区域; 并将非铁磁物质沉积在中间层的改性区上以形成隔膜。
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公开(公告)号：US20110036990A1
公开(公告)日：2011-02-17
申请号：US12540225
申请日：2009-08-12
CPC分类号： H01J37/20 , H01J37/32412 , H01J2237/2007 , H01J2237/31701 , H01L21/6833 , H01L21/6875
摘要： An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided.
摘要翻译： 用于控制电荷累积的浮雕压板包括电介质层，在电介质层的表面上的多个压花以支撑工件，第一多个多个压花中的每一个具有导电部分以接触工件的后侧，当 工件处于夹紧位置，以及将第一多个压花的导电部分电耦合到地的导体。 还提供了具有这种压花压板的离子注入机。
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公开(公告)号：US20100050686A1
公开(公告)日：2010-03-04
申请号：US12487119
申请日：2009-06-18
CPC分类号： C30B11/003 , C01B33/037 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/406 , C30B29/60
摘要： An apparatus to purify a melt is disclosed. A first portion of a melt in a chamber is frozen in a first direction. A fraction of the first portion is melted in the first direction. A second portion of the melt remains frozen. The melt flows from the chamber and the second portion is removed from the chamber. The freezing concentrates solutes in the melt and second portion. The second portion may be a slug with a high solute concentration. This system may be incorporated into a sheet forming apparatus with other components such as, for example, pumps, filters, or particle traps.
摘要翻译： 公开了一种净化熔体的设备。 室中的熔体的第一部分在第一方向上被冷冻。 第一部分的一部分在第一方向熔化。 熔体的第二部分保持冷冻。 熔体从腔室流出，第二部分从腔室中移出。 冷冻浓缩物溶解在熔体和第二部分中。 第二部分可以是高溶质浓度的塞子。 该系统可以结合到具有其它部件例如泵，过滤器或颗粒捕集器的片材成形设备中。
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公开(公告)号：US20090122458A1
公开(公告)日：2009-05-14
申请号：US12269394
申请日：2008-11-12
IPC分类号： H01L21/683
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.
摘要翻译： 静电卡盘包括具有多个突起以支撑工件的层，其中该层的至少一部分具有第一多个多个突起。 第一多个突起间隔几何形成六边形图案。 第一多个突起可以与相邻的突起间隔开相等的距离，并且等距离可以是距离一个突起的中心到另一个突起的中心的约4.0毫米。 本公开减少了沿着每个突起的边缘常规存在的峰值机械应力水平。 降低这种机械应力水平有助于减少支撑的工件的背面损坏，这又可以减少由这种损坏引起的不想要的颗粒的产生。
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