公开(公告)号：US20190037676A1

公开(公告)日：2019-01-31

申请号：US16036660

申请日：2018-07-16

Applicant: KLA-Tencor Corporation

Inventor： Oleg Khodykin ,  Ilya Bezel

IPC: H05G2/00 ,  G21K5/04 ,  G21K1/06

Abstract: A system for generating broadband radiation is disclosed. The system includes a target material source configured to deliver one or more of a liquid or solid state target material to a plasma-forming region of a chamber. The system further includes a pump source configured to generate pump radiation to excite the target material in the plasma forming region of the chamber to generate broadband radiation. The system is further configured to transmit at least a portion of the broadband radiation generated in the plasma-forming region of the chamber out of the chamber through a windowless aperture.

公开(公告)号：US10101664B2

公开(公告)日：2018-10-16

申请号：US14739305

申请日：2015-06-15

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin ,  Michael P. Kanouff

IPC: H05G2/00 ,  G03F7/20

Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

公开(公告)号：US09989758B2

公开(公告)日：2018-06-05

申请号：US14247082

申请日：2014-04-07

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Oleg Khodykin

IPC: G01F23/00 ,  G02B27/00 ,  H05G2/00 ,  G03F7/20

CPC classification number: G02B27/0006 ,  G01N2223/204 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: The present disclosure is directed to a system for protecting a reflective optic and/or any other surface in a plasma-based illumination system from debris by actively flowing gas against the debris flow direction. According to various embodiments, a vacuum chamber is configured to contain a target material, wherein a laser or discharge produced plasma is generated in response to an excitation of the target material. One or more outlets within the chamber are configured to receive gas flowing from a fluidically coupled gas source and further configured to actively flow the gas towards a source of debris and away from the reflective optic or any other protected surface at a controlled flow rate.

公开(公告)号：US09544984B2

公开(公告)日：2017-01-10

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese ,  Rudy F. Garcia ,  Brian Ahr

IPC: G01J1/42 ,  H05G2/00 ,  G01J1/16 ,  G01N21/956 ,  G03F7/20

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US09295147B2

公开(公告)日：2016-03-22

申请号：US14180107

申请日：2014-02-13

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel Christopher Wack

IPC: H05G2/00 ,  G03F1/22 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027

CPC classification number: H05G2/006 ,  G03F1/22 ,  G03F1/84 ,  G03F7/20 ,  G03F7/70033 ,  H01L21/027 ,  H05G2/008 ,  Y10T137/206

Abstract: An apparatus for generating extreme ultra-violet (EUV) light, including a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber, a target material generator arranged to deliver a series of droplets of a target material to the target spot by modulating a flow velocity of a supply of the target material through a nozzle tip and thereby inducing a formation process of the series of droplets which series of droplets from the nozzle tip are expelled through a triple point chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when a droplet of the series of drople of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.

Abstract translation: 一种用于产生极紫外（EUV）光的装置，包括布置成产生激光脉冲的驱动激光器，真空室，一组聚焦光学元件，其被布置成将由驱动激光产生的激光脉冲聚焦到该激光脉冲内的目标点上 真空室，目标材料发生器，其布置成通过调节目标材料的供应通过喷嘴尖端的流速而将目标材料的一系列液滴输送到目标点，从而引起一系列液滴的形成过程， 来自喷嘴尖端的一系列液滴通过三点室排出，并且一组收集器光学器件被布置成将当目标材料的一系列喷雾的液滴暴露于激光脉冲时产生的一定数量的EUV光 目标点到中间焦点。

公开(公告)号：US11317500B2

公开(公告)日：2022-04-26

申请号：US16112762

申请日：2018-08-26

Applicant: KLA—Tencor Corporation

Inventor： Oleg Khodykin

IPC: H05G2/00 ,  G01N23/20008 ,  G01N23/201

Abstract: Methods and systems for x-ray based semiconductor metrology utilizing a clean, hard X-ray illumination source are described herein. More specifically, a laser produced plasma light source generates high brightness, hard x-ray illumination having energy in a range of 25,000 to 30,000 electron volts. To achieve high brightness, a highly focused, very short duration laser beam is focused onto a dense Xenon target in a liquid or solid state. The interaction of the focused laser pulse with the high density Xenon target ignites a plasma. Radiation from the plasma is collected by collection optics and is directed to a specimen under measurement. The resulting plasma emission is relatively clean because of the use of a non-metallic target material. The plasma chamber is filled with Xenon gas to further protect optical elements from contamination. In some embodiments, evaporated Xenon from the plasma chamber is recycled back to the Xenon target generator.

公开(公告)号：US10959318B2

公开(公告)日：2021-03-23

申请号：US15867633

申请日：2018-01-10

Applicant: KLA-Tencor Corporation

Inventor： Oleg Khodykin ,  Alexander Bykanov

IPC: G01N23/201 ,  G01N23/207 ,  H05G2/00

Abstract: Methods and systems for x-ray based semiconductor metrology utilizing a broadband, soft X-ray illumination source are described herein. A laser produced plasma (LPP) light source generates high brightness, broadband, soft x-ray illumination. The LPP light source directs a highly focused, short duration laser source to a non-metallic droplet target in a liquid or solid state. In one example, a droplet generator dispenses a sequence of nominally 50 micron droplets of feed material at a rate between 50 and 400 kilohertz. In one aspect, the duration of each pulse of excitation light is less than one nanosecond. In some embodiments, the duration of each pulse of excitation light is less than 0.5 nanoseconds. In some embodiments, the LPP light source includes a gas separation system that separates unspent feed material from other gases in the plasma chamber and provides the separated feed material back to the droplet generator.

公开(公告)号：US10034362B2

公开(公告)日：2018-07-24

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00 ,  G03F7/20

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

公开(公告)号：US10021773B2

公开(公告)日：2018-07-10

申请号：US15265515

申请日：2016-09-14

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US09420678B2

公开(公告)日：2016-08-16

申请号：US14497506

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin

IPC: H05G2/00 ,  G21K5/04 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916

Abstract: A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.

Abstract translation: 一种用于在EUV光源中产生排除缓冲气体流的系统，包括真空室，光路，等离子体产生区域，至少一个屏蔽件，至少一个安装在所述至少一个屏蔽件中的通孔，至少 一个缓冲气体喷射器，布置在所述至少一个通孔内，以将缓冲气体基本上朝向等离子体产生区域注入到光路中，以防止目标材料流入光路;以及真空泵，其布置成移除缓冲器 气体和来自真空室的目标材料。