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公开(公告)号：US20180323038A1
公开(公告)日：2018-11-08
申请号：US16024602
申请日：2018-06-29
CPC分类号： H01J37/32091 , B44C1/22 , H01J37/32165 , H01J37/32935 , H03L5/00 , H05H1/24 , H05H2001/4682
摘要： Methods and apparatus for processing a substrate in a multi-frequency plasma processing chamber are disclosed. The base RF signal pulses between a high power level and a low power level. Each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined power level and a second predefined power level as the base RF signal pulses. Alternatively or additionally, each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined RF frequency and a second predefined RF frequency as the base RF signal pulses. Techniques are disclosed for ascertaining in advance of production time the first and second predefined power levels and/or the first and second predefined RF frequencies for the non-base RF signals.
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公开(公告)号：US20180294140A1
公开(公告)日：2018-10-11
申请号：US16000348
申请日：2018-06-05
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32174 , H01J37/32183 , H01J37/3244 , H01J37/3255 , H01J2237/327 , H03K3/01 , H03L7/00 , H03L7/06 , H05H2001/4682
摘要： A method for achieving sub-pulsing during a state is described. The method includes receiving a clock signal from a clock source, the clock signal having two states and generating a pulsed signal from the clock signal. The pulsed signal has sub-states within one of the states. The sub-states alternate with respect to each other at a frequency greater than a frequency of the states. The method includes providing the pulsed signal to control power of a radio frequency (RF) signal that is generated by an RF generator. The power is controlled to be synchronous with the pulsed signal.
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公开(公告)号：US09960015B2
公开(公告)日：2018-05-01
申请号：US15448880
申请日：2017-03-03
CPC分类号： H01J37/32165 , H01J37/32082 , H01J37/32146 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H01J37/32981 , H01J37/3299
摘要： Systems and methods for impedance-based adjustment of power and frequency are described. A system includes a plasma chamber for containing plasma. The plasma chamber includes an electrode. The system includes a driver and amplifier coupled to the plasma chamber for providing a radio frequency (RF) signal to the electrode. The driver and amplifier is coupled to the plasma chamber via a transmission line. The system further includes a selector coupled to the driver and amplifier, a first auto frequency control (AFC) coupled to the selector, and a second AFC coupled to the selector. The selector is configured to select the first AFC or the second AFC based on values of current and voltage sensed on the transmission line.
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公开(公告)号：US20180033596A1
公开(公告)日：2018-02-01
申请号：US15726235
申请日：2017-10-05
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32174 , H01J37/32183 , H01J37/3244 , H01J37/3255 , H01J2237/327 , H03K3/01 , H03L7/00 , H03L7/06 , H05H2001/4682
摘要： A method for achieving sub-pulsing during a state is described. The method includes receiving a clock signal from a clock source, the clock signal having two states and generating a pulsed signal from the clock signal. The pulsed signal has sub-states within one of the states. The sub-states alternate with respect to each other at a frequency greater than a frequency of the states. The method includes providing the pulsed signal to control power of a radio frequency (RF) signal that is generated by an RF generator. The power is controlled to be synchronous with the pulsed signal.
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公开(公告)号：US20170330732A1
公开(公告)日：2017-11-16
申请号：US15665091
申请日：2017-07-31
IPC分类号： H01J37/32 , H03J7/00 , H01J37/244 , H05H1/46
CPC分类号： H01J37/32183 , H01J37/244 , H01J37/32082 , H01J37/32137 , H01J37/32146 , H01J37/32155 , H01J37/32174 , H03J7/00 , H05H1/46 , H05H2001/4682
摘要： Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.
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公开(公告)号：US09720022B2
公开(公告)日：2017-08-01
申请号：US14716797
申请日：2015-05-19
CPC分类号： G01R27/02 , H01J37/32183 , H01J37/32926 , H01J37/32935
摘要： Systems and methods for generating and using characteristics of an impedance matching model with different impedance matching networks are described impedances and/or power efficiencies are measured using a network analyzer or a sensor. The impedances and/or power efficiencies are used to determine the characteristics. With use of different impedance matching networks, the values of the characteristics are changed to achieve same or similar results across different plasma tools for a variety of conditions.
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公开(公告)号：US20170194130A1
公开(公告)日：2017-07-06
申请号：US15463875
申请日：2017-03-20
发明人： Bradford J. Lyndaker , John C. Valcore, JR. , Seyed Jafar Jafarian-Tehrani , Zhigang Chen , Alexei Marakhtanov
CPC分类号： H01J37/32926 , G05B17/02 , H01J37/32082 , H01J37/32183 , H01J37/32935 , H01J37/3299 , H01J2237/334 , H03H7/40 , H05H1/46
摘要： A method for achieving an etch rate is described. The method includes receiving a calculated variable associated with processing a work piece in a plasma chamber. The method further includes propagating the calculated variable through a model to generate a value of the calculated variable at an output of the model, identifying a calculated processing rate associated with the value, and identifying based on the calculated processing rate a pre-determined processing rate. The method also includes identifying a pre-determined variable to be achieved at the output based on the pre-determined processing rate and identifying a characteristics associated with a real and imaginary portions of the pre-determined variable. The method includes controlling variable circuit components to achieve the characteristics to further achieve the pre-determined variable.
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公开(公告)号：US20170117869A1
公开(公告)日：2017-04-27
申请号：US14923329
申请日：2015-10-26
发明人： Karl Leeser , Sunil Kapoor , Bradford J. Lyndaker
CPC分类号： H03H7/38 , H01J37/32183
摘要： A matching module includes an input terminal connected to an input node, a variable load capacitor, and a plurality of RF signal delivery branches. The input terminal is connected to receive RF signals from one or more RF generators. The load capacitor is connected between the input node and a reference ground potential. Each of the plurality of RF signal delivery branches has a respective ingress terminal connected to the input node and a respective egress terminal connected to a respective one of a plurality of output terminals. Each of the plurality of output terminals of the matching module is connected to deliver RF signals to a different one of a plurality of plasma processing stations/chambers. Each of the plurality of RF signal delivery branches includes a corresponding inductor and a corresponding variable tuning capacitor electrically connected in a serial manner between its ingress terminal and its egress terminal.
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公开(公告)号：US11798784B2
公开(公告)日：2023-10-24
申请号：US16024602
申请日：2018-06-29
CPC分类号： H01J37/32091 , B44C1/22 , H01J37/32165 , H01J37/32935 , H03L5/00 , H05H2242/26
摘要： Methods and apparatus for processing a substrate in a multi-frequency plasma processing chamber are disclosed. The base RF signal pulses between a high power level and a low power level. Each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined power level and a second predefined power level as the base RF signal pulses. Alternatively or additionally, each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined RF frequency and a second predefined RF frequency as the base RF signal pulses. Techniques are disclosed for ascertaining in advance of production time the first and second predefined power levels and/or the first and second predefined RF frequencies for the non-base RF signals.
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30.发明公开公开(公告)号：US20230253185A1
公开(公告)日：2023-08-10
申请号：US18012962
申请日：2021-11-09
CPC分类号： H01J37/32183 , H03H7/38 , H01J37/32091 , H01J37/321 , H01J2237/24564 , H01J2237/3345
摘要： An RF signal supply system for plasma generation includes an RF signal generator, an impedance matching system, and a control module. The RF signal generator includes a control system. The impedance matching system has an input connected to an output of the RF signal generator, an output connected to a plasma processing system, a gamma control capacitor, and a frequency control capacitor. The control module is connected in data communication with each of the RF signal generator and the impedance matching system. The control module is programmed to transmit control signals to the impedance matching system based on corresponding data received from the control system of the RF signal generator, where the control signals direct control of the gamma control capacitor and the frequency control capacitor. The control module is also programmed to transmit data received from the impedance matching system to the control system of the RF signal generator.
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