公开(公告)号：US09013684B2

公开(公告)日：2015-04-21

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G02B26/08 ,  G01M11/00 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US08928859B2

公开(公告)日：2015-01-06

申请号：US13564419

申请日：2012-08-01

申请人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

发明人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

IPC分类号： G03B27/72 ,  G02B27/28 ,  G03F7/20 ,  G02B3/00

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B5/1876 ,  G02B27/283 ,  G02B27/285 ,  G02B27/286 ,  G03F7/70566

摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.

摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括消偏振器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地引起偏振光对去偏振器的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去偏振器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列下游的光瞳面中发生的残留极化分布产生的贡献具有最大极化度 不超过5％。

公开(公告)号：US20130176546A1

公开(公告)日：2013-07-11

申请号：US13784027

申请日：2013-03-04

申请人： Michael Layh ,  Damian Fiolka

发明人： Michael Layh ,  Damian Fiolka

IPC分类号： F21V9/10 ,  G03F7/20

CPC分类号： F21V9/40 ,  G03F7/70083 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70833 ,  G03F7/70891

摘要： An illumination optical unit illuminates an object field using radiation with a first wavelength. The illumination optical unit includes a filter element for suppressing radiation with a second wavelength. The filter element includes at least one component with an obscuring action. As a result of the obscuring action, during operation of the illumination optical unit there is at least one region of reduced intensity of radiation with the first wavelength on a first optical element, arranged downstream of the filter element in the light direction, of the illumination optical unit. The filter element can assume a multiplicity of positions, which lead to different regions of reduced intensity. For each point on an optical used surface of the first optical element, there is at least one position such that the point does not lie in a region of reduced intensity.

摘要翻译： 照明光学单元使用具有第一波长的辐射来照亮物体场。 照明光学单元包括用于抑制具有第二波长的辐射的滤光元件。 过滤元件包括具有模糊动作的至少一个部件。 作为遮蔽动作的结果，在照明光学单元的操作期间，存在至少一个区域，其中第一波长的辐射强度在第一光学元件上沿着光线方向布置在滤光元件的下游 光学单元。 滤波器元件可以呈现多个位置，这导致不同的强度降低的区域。 对于第一光学元件的光学使用表面上的每个点，存在至少一个位置，使得该点不位于强度降低的区域中。

公开(公告)号：US08320043B2

公开(公告)日：2012-11-27

申请号：US12205572

申请日：2008-09-05

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  F21V9/14 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element including an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 包括光学活性晶体材料的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US20120293786A1

公开(公告)日：2012-11-22

申请号：US13564419

申请日：2012-08-01

申请人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

发明人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B5/1876 ,  G02B27/283 ,  G02B27/285 ,  G02B27/286 ,  G03F7/70566

摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.

摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。

公开(公告)号：US20120281198A1

公开(公告)日：2012-11-08

申请号：US13553005

申请日：2012-07-19

申请人： Manfred Maul ,  Damian Fiolka

发明人： Manfred Maul ,  Damian Fiolka

IPC分类号： G03B27/72

CPC分类号： G02B26/008 ,  G01J1/0488 ,  G02B27/0933 ,  G02B27/0994 ,  G03F7/70091 ,  G03F7/70191

摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.

摘要翻译： 本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面 具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是 在致动装置的帮助下带入照明光束。

公开(公告)号：US20120154895A1

公开(公告)日：2012-06-21

申请号：US13352703

申请日：2012-01-18

申请人： Holger Muenz ,  Wolfgang Merkel ,  Damian Fiolka ,  Johannes Wangler

发明人： Holger Muenz ,  Wolfgang Merkel ,  Damian Fiolka ,  Johannes Wangler

IPC分类号： G02F1/11

CPC分类号： G02B19/0014 ,  B23K26/0006 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0676 ,  B23K26/352 ,  B23K2101/40 ,  B23K2103/56 ,  G02B19/0052 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0961 ,  G02B27/0972

摘要： An optical system for generating a light beam for treating a substrate in a substrate plane is disclosed. The light beam has a beam length in a first dimension perpendicular to the propagation direction of the light beam and a beam width in a second dimension perpendicular to the first dimension and also perpendicular to the light propagation direction.The optical system includes a mixing optical arrangement which divides the light beam in at least one of the first and second dimensions into a plurality of light paths incident in the substrate plane in a manner superimposed on one another. At least one coherence-influencing optical arrangement is present in the beam path of the light beam and acts on the light beam to at least reduce the degree of coherence of light for at least one light path distance of one light path from at least one other light path.

摘要翻译： 公开了一种用于产生用于处理衬底平面中的衬底的光束的光学系统。 光束具有垂直于光束的传播方向的第一维中的光束长度和垂直于第一维度并且也垂直于光传播方向的第二维度中的光束宽度。 光学系统包括混合光学装置，其将第一和第二维度中的至少一个中的光束以彼此叠加的方式入射到基板平面中的多个光路分离。 至少一个相干影响的光学布置存在于光束的光束路径中并且作用在光束上以至少减少光的相干程度，用于至少一个光路与至少一个其它光路的光路距离 光路。

公开(公告)号：US08035803B2

公开(公告)日：2011-10-11

申请号：US11850255

申请日：2007-09-05

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03B27/54 ,  G03F7/70058 ,  G03F7/70566

摘要： In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure apparatus with light of a desired polarization distribution. The illumination system includes a first polarization-influencing optical element and a second polarization-influencing optical element. During operation the first polarization-influencing optical element converts a first polarization distribution produced by a light source unit into a second polarization distribution which is different from the first polarization distribution. The second polarization-influencing optical element converts the second polarization distribution into a third polarization distribution corresponding to the desired polarization distribution, the second polarization-influencing optical element causing an effective rotation of the preferred polarization direction through 90° over its optically effective surface.

摘要翻译： 通常，在一个方面，本发明的特征在于用于微光刻投影曝光装置的照明系统，其被配置为使得在操作期间，照明系统用所需偏振分布的光照亮微光刻投影曝光装置的光罩平面。 照明系统包括第一偏振影响光学元件和第二偏振影响光学元件。 在操作期间，第一偏振影响光学元件将由光源单元产生的第一偏振分布转换成与第一偏振分布不同的第二偏振分布。 第二偏振影响光学元件将第二偏振分布转换为对应于期望的偏振分布的第三偏振分布，第二偏振影响光学元件在其光学有效表面上使优选偏振方向有效旋转90°。

公开(公告)号：US07916391B2

公开(公告)日：2011-03-29

申请号：US11569001

申请日：2005-03-04

申请人： Michael Albert ,  Damian Fiolka

发明人： Michael Albert ,  Damian Fiolka

IPC分类号： G02B27/28

CPC分类号： G03F7/70566 ,  G02B1/02 ,  G02B1/06 ,  G02B1/08 ,  G02B5/3025 ,  G02B27/286

摘要： A polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system are provided. A polarization pattern assembly for use in an illuminator having a pupil includes a frame (110) and at least one polarization pane (102, 102a, 102b) coupled to the frame (110), the polarization pane (102, 102a, 102b) changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern is obtained across the pupil of the illuminator, and wherein the polarization pane (102, 102a, 102b) includes an optically active material.

摘要翻译： 提供了一种用于照明器的偏振图案组件和用于在光刻系统的照明器的光瞳中提供至少一个偏振图案的装置。 用于具有瞳孔的照明器中的偏振图案组件包括框架（110）和耦合到框架（110）的至少一个偏振窗格（102,102,102b），偏振窗格（102,102,102b）改变 通过其中的光的偏振方向，由此在照明器的光瞳上获得至少一个偏振图案，并且其中偏光板（102,102,102b）包括光学活性材料。

公开(公告)号：US20100277708A1

公开(公告)日：2010-11-04

申请号：US12836436

申请日：2010-07-14

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03B27/72

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.