利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

60 条记录 (耗时 0.03 秒)

    COLLECTOR FOR AN ILLUMINATION SYSTEM
    21.
    发明申请
    COLLECTOR FOR AN ILLUMINATION SYSTEM 有权
    收集器用于照明系统

    公开(公告)号：US20080018876A1

    公开(公告)日：2008-01-24

    申请号：US11781010

    申请日：2007-07-20

    申请人： Ralf Stuetzle ,  Udo Dinger

    发明人： Ralf Stuetzle ,  Udo Dinger

    IPC分类号： G03B27/54 ,  G02B19/00

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B2207/123 ,  G03F7/70166

    摘要： Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of manufacturing microelectronic components with such projection exposure apparatuses, and related systems, components and methods are disclosed.

    摘要翻译： 公开了具有彼此布置的具有镜壳的收集器，配备有这种收集器的照明系统，配备有这种照明系统的投影曝光装置，具有这种投影曝光装置的微电子部件的制造方法以及相关系统，部件和方法。

    Method of manufacturing an optical element
    23.
    发明授权
    Method of manufacturing an optical element 有权
    制造光学元件的方法

    公开(公告)号：US07118449B1

    公开(公告)日：2006-10-10

    申请号：US10943952

    申请日：2004-09-20

    申请人： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

    发明人： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

    IPC分类号： B24B49/00 ,  B24B51/00 ,  B24B1/00

    CPC分类号： B24B13/06 ,  B24B51/00

    摘要： A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.

    摘要翻译： 一种制造具有靠近基板周边延伸的光学表面的光学元件的方法包括：提供具有延伸超过光学表面的周边的主表面的基板，并且还在主体的区域中执行光学表面的抛光 表面延伸超出光学表面。 此后，去除承载延伸超过光学表面的表面的一部分的基板的材料。

    Bundle-guiding optical collector for collecting the emission of a radiation source
    24.
    发明授权
    Bundle-guiding optical collector for collecting the emission of a radiation source 有权
    用于收集辐射源的发射的束引导光收发器

    公开(公告)号：US08934085B2

    公开(公告)日：2015-01-13

    申请号：US12726081

    申请日：2010-03-17

    申请人： Udo Dinger ,  Christopher Weth

    发明人： Udo Dinger ,  Christopher Weth

    IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B5/08 ,  G02B5/09

    CPC分类号： G03F7/70175 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70083 ,  G03F7/70116 ,  G03F7/702 ,  G21K2201/064

    摘要： A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.

    摘要翻译： 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。

    Optical element with multiple primary light sources
    26.
    发明授权
    Optical element with multiple primary light sources 有权
    具有多个主光源的光学元件

    公开(公告)号：US08253927B2

    公开(公告)日：2012-08-28

    申请号：US12470092

    申请日：2009-05-21

    申请人： Udo Dinger

    发明人： Udo Dinger

    IPC分类号： G03B27/54

    CPC分类号： G03B27/54 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/7005 ,  G03F7/702 ,  G03F7/70391

    摘要： The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.

    摘要翻译： 本公开涉及照明系统，例如用于微光刻的照明系统。 照明系统可以包括具有多个主要光源的光学元件。 照明系统可以照射具有场轮廓的场平面中的场。 照明系统可以被配置为使得每个主光源照亮场平面中的小于由场轮廓包围的区域的尺寸的区域。

    FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
    28.
    发明申请
    FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
    用于微型计算机投影曝光装置的FACET MIRROR

    公开(公告)号：US20110001947A1

    公开(公告)日：2011-01-06

    申请号：US12848603

    申请日：2010-08-02

    申请人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

    发明人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

    IPC分类号： G03F7/20 ,  G02B7/185 ,  G03B27/54 ,  G03B27/70

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/06 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/0927 ,  G03F7/70075 ,  G03F7/70116

    摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

    摘要翻译： 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。

    Reflecting device for electromagnetic waves
    29.
    发明授权
    Reflecting device for electromagnetic waves 失效
    电磁波反射装置

    公开(公告)号：US07077533B2

    公开(公告)日：2006-07-18

    申请号：US10477772

    申请日：2002-05-28

    申请人： Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

    发明人： Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

    IPC分类号： G02B5/08

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/2008 ,  G03F7/70958 ,  G21K1/06

    摘要： A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

    摘要翻译： 装置用于反射电磁波，特别是在小于200nm的长度范围内。 它具有由至少近乎消失的热膨胀的材料制成的反射镜载体，并且至少一个反射层施加在所述反射镜载体上。 由在反射镜载体和反射层之间装配光束处理方法之后形成为使得其表面粗糙度不显着增加的材料制成的中间层。