Abstract:
A cleaning robot includes a main body and a drive unit to move the main body. The drive unit includes a plurality of motors to generate driving force; a plurality of wheels connected to one of the plurality of motors and rotating by driving force received from the one of the plurality of motors; and a driving frame to support the plurality of wheels, receive driving force from another motor among the plurality of motors, and rotate for changing positions of the plurality of wheels.
Abstract:
A semiconductor device and a fabricating method thereof are provided. The semiconductor device includes a substrate, a first nanowire spaced apart from a first region of the substrate, a first gate electrode surrounding a periphery of the first nanowire, a second nanowire spaced apart from a second region of the substrate and extending in a first direction and having a first width in a second direction intersecting the first direction, a supporting pattern contacting the second nanowire and positioned under the second nanowire, and a second gate electrode extending in the second direction and surrounding the second nanowire and the supporting pattern.
Abstract:
Disclosed is a robot cleaner capable of reducing the material cost thereof by use of fewer motors, and performing wet cleaning while travelling in all directions and rubbing the floor surface, the robot cleaner includes a plurality of motors generating driving forces, a plurality of pad assemblies configured to rotate by receiving a driving force from one of the plurality of motors, and provided in a tilted manner so that a bottom surface of each of the plurality of pad assemblies has an uneven frictional force with respect to a floor surface, and a tilt gear unit configured to simultaneously vary tilting directions of the plurality of pad assemblies by receiving a driving force from another one of the plurality of motors, wherein the robot clean can travel in all directions depending on a tilting direction and a rotational direction of each of the plurality of pad assemblies.
Abstract:
A cleaning robot includes a main body, a moving assembly to move the main body, a cleaning tool provided at a bottom part of the main body to collect foreign substances on a floor, an imager to collect images around the main body and a controller to recognize motion of a hand by performing image processing of the collected images, identify a control command corresponding to the motion of the hand, plan a moving direction and a moving distance of the main body as movement information based on the control command, and control operations of the moving assembly and the cleaning tool based on the planned movement information. Since the user directly controls movement of the cleaning robot, it is possible to improve interactivity between human and cleaning robot, reduce the user's labor and increase convenience.
Abstract:
A cleaning robot having improved traveling performance and a method of controlling the same. The cleaning robot detects a stuck state such as a ‘jammed state’, ‘lifted state’, or ‘object-caught state’ by using a motion instruction or sensor information and quickly escapes from the stuck state caused in various traveling conditions by using a wheel structure capable of changing a total height of the cleaning robot. In addition, a degree of risk and type of the stuck state is predicted before the cleaning robot is in the stuck state so that the cleaning robot may deal with the stuck state in advance. The cleaning robot may escape from the stuck state via rapidly deceleration or quick stopping in accordance with the predicted degree of risk of the stuck state, and the cleaning robot may efficiently deal with the stuck state by using information to select an escaping method suitable for the type of the stuck state.
Abstract:
An illuminator, a scanner module and an apparatus are provided. The scanner module includes an illuminator that includes a light source, a light guide extending in a main scanning direction to change a direction of the light from the light source, a guide holder recessed with a light guide mounting portion in which the light guide is mounted, and at least one supporting protrusion protruding from an entrance of the light guide mounting portion into the light guide mounting portion to support the light guide received in the light guide mounting portion. As the light guide is supported by the supporting protrusion formed at the entrance of the light guide mounting portion, it is possible to reduce deformation of the light guide and/or to prevent the light guide from being falling out of the light guide mounting portion when subjected to, e.g., a shock.
Abstract:
A pad changer capable of automatically replacing a pad used to wipe out dust on a floor, a cleaner and a cleaner system having the pad changer are provided. The pad changer to replace a pad mounted to a cleaner includes a replacement unit. The replacement unit includes a separation cartridge to separate the pad from the cleaner and receive the separated pad therein, and a mounting cartridge to receive a pad therein and mount the pad to the cleaner.
Abstract:
Disclosed are a packing buffer having enhanced manufacture efficiency, high strength, and eco-friendly properties and a manufacturing method thereof. The packing buffer includes reinforcement sheet provided at the exterior of the packing buffer for increase in strength of the packing buffer. Injection molding of the packing buffer is implemented in a state in which the reinforcement sheet is inserted in a mold.
Abstract:
Disclosed herein are a cleaning robot and a method of controlling the same. The cleaning robot according to one embodiment includes a modular in which one or more modules configured to support different functions are integrated, and a controller configured to control the overall operation of the cleaning robot.
Abstract:
A semiconductor device includes a substrate having a first region and a second region; a first nanowire in the first region in a direction perpendicular to an upper surface of the substrate; a second nanowire in the second region in a direction perpendicular to the upper surface of the substrate and having a height less than that of the first nanowire; first source/drain regions at top portion and bottom portion of the first nanowire; second source/drain regions at top portion and bottom portion of the second nanowire; a first gate electrode surrounding the first nanowire between the first source/drain regions; and a second gate electrode surrounding the second nanowire between the second source/drain regions.