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91 条记录 (耗时 0.028 秒)

    Swiveling work machine
    25.
    发明授权
    Swiveling work machine 有权
    回转作业机

    公开(公告)号：US07500532B2

    公开(公告)日：2009-03-10

    申请号：US11225873

    申请日：2005-09-13

    申请人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    发明人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    IPC分类号： B62D33/02

    CPC分类号： E02F9/0816 ,  E02F9/121

    摘要： A swivel work machine includes a traveling unit, a swivel base plate supported on the traveling unit to be pivotable about a vertical swivel axis, the swivel base plate having a first lateral side and a second lateral side provided across said vertical axis, a pair of upper and lower support brackets disposed at a front end of the swivel base plate with an offset toward the first lateral side and adapted for supporting an implement, a pair of left and right vertical ribs extending rearward from the support brackets and fixed to the swivel base plate and a cabin mounted on the swivel base plate. The cabin is disposed with an offset toward the second lateral side relative to the support brackets, a bottom of the cabin being disposed downwardly of the upper support bracket. The vertical rib disposed on the side of the second lateral side extends, from its front portion to its intermediate portion, parallel with a side face of the cabin on the side of the first lateral side.

    摘要翻译： 旋转作业机包括行进单元，支撑在行进单元上的旋转底板，可绕垂直旋转轴线转动，旋转基板具有横跨所述垂直轴设置的第一横向侧和第二横向侧，一对 上部和下部支撑架设置在旋转基板的前端，偏移朝向第一侧面并适于支撑工具，一对左右垂直肋条从支撑托架向后延伸并固定到旋转底座 板和安装在旋转底板上的舱室。 机舱相对于支撑托架设置成朝向第二侧面的偏移，舱的底部设置在上支撑支架的下方。 设置在第二侧面侧的纵肋从其前部延伸到其中间部分，与第一侧面侧的车厢侧面平行。

    Swiveling work machine
    26.
    发明授权
    Swiveling work machine 有权
    回转作业机

    公开(公告)号：US07416219B2

    公开(公告)日：2008-08-26

    申请号：US11225811

    申请日：2005-09-13

    申请人： Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Takanori Matsumoto ,  Kenzo Koga

    发明人： Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Takanori Matsumoto ,  Kenzo Koga

    IPC分类号： B60P3/22

    CPC分类号： E02F9/0883 ,  E02F3/325 ,  E02F9/0875 ,  E02F9/121 ,  E02F9/2271 ,  E02F9/2275

    摘要： A swiveling work machine includes a swivel deck mounted to be pivotable about a vertical axis and a side cover for covering one lateral side on the swivel deck, an accommodating space capable of accommodating a work machine accessory being provided inside the lateral cover. The accommodating space accommodates, as the implement accessory, a work oil tank, a fuel tank and a control valve unit. The work oil tank is disposed at a fore-and-aft intermediate portion on one lateral side on the swivel deck. The fuel tank is disposed forwardly of the work oil tank with forming a gap relative thereto. The control valve unit is disposed upwardly of the fuel tank and longitudinally along the fore/aft direction.

    摘要翻译： 旋转作业机器包括安装成能够围绕垂直轴线枢转的旋转台​​面和用于覆盖旋转台面上的一个侧面的侧盖，容纳空间，其能够容纳设置在侧盖内侧的作业机器附件。 容纳空间作为工具附件容纳工作油箱，燃料箱和控制阀单元。 工作油箱设置在旋转板上的一个侧面上的前后中间部分。 燃料箱配置在工作油箱的前方，形成与其相对的间隙。 控制阀单元设置在燃料箱的上方并且沿着前/后方向纵向设置。

    Swiveling work machine
    27.
    发明申请
    Swiveling work machine 有权

    公开(公告)号：US20060108171A1

    公开(公告)日：2006-05-25

    申请号：US11225873

    申请日：2005-09-13

    申请人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    发明人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    IPC分类号： B62D33/06 ,  B62D33/063

    CPC分类号： E02F9/0816 ,  E02F9/121

    摘要： A swivel work machine includes a traveling unit, a swivel base plate supported on the traveling unit to be pivotable about a vertical swivel axis, the swivel base plate having a first lateral side and a second lateral side provided across said vertical axis, a pair of upper and lower support brackets disposed at a front end of the swivel base plate with an offset toward the first lateral side and adapted for supporting an implement, a pair of left and right vertical ribs extending rearward from the support brackets and fixed to the swivel base plate and a cabin mounted on the swivel base plate. The cabin is disposed with an offset toward the second lateral side relative to the support brackets, a bottom of the cabin being disposed downwardly of the upper support bracket. The vertical rib disposed on the side of the second lateral side extends, from its front portion to its intermediate portion, parallel with a side face of the cabin on the side of the first lateral side.

    Method for forming film by plasma
    29.
    发明授权
    Method for forming film by plasma 失效
    用等离子体形成薄膜的方法

    公开(公告)号：US06770332B2

    公开(公告)日：2004-08-03

    申请号：US09573412

    申请日：2000-05-18

    申请人： Risa Nakase ,  Takeshi Aoki ,  Akira Suzuki ,  Yoshihiro Kato

    发明人： Risa Nakase ,  Takeshi Aoki ,  Akira Suzuki ,  Yoshihiro Kato

    IPC分类号： H05H146

    CPC分类号： H01L21/0212 ,  C23C16/26 ,  C23C16/30 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801

    摘要： In a case where a CF film is used as an interlayer dielectric file for a semiconductor device, when a wiring of tungsten is formed, the CF film is heated to a temperature of, e g., about 400 to 450° C. At this time, F containing gases are emitted from the CF film, so that there are various disadvantages due to the corrosion of the wiring and the decrease of film thickness. In order to prevent this, it is required to enhance thermostability. A compound gas of C and F, e.g., C4F8 gas, a hydrocarbon gas, e.g., C2H4 gas, and CO gas are used as thin film deposition gases. These gases are activated to deposit a CF film on a semiconductor wafer 10 at a process temperature of 400° C. using active species thereof. Since the number of diamond-like bonds are greater than the number of graphite-like bonds by the addition of CO gas, the bonds are strengthened and difficult to be cut even at a high temperature, so that thermostability is enhanced.

    摘要翻译： 在将CF膜用作半导体器件的层间电介质文件的情况下，当形成钨的布线时，将CF膜加热至例如约400〜450℃的温度。在此 时间，从CF膜发射含F气体，由于布线的腐蚀和膜厚度的降低，存在各种缺点。 为了防止这种情况，需要提高热稳定性。使用C和F的复合气体，例如C 4 F 8气体，烃气体例如C 2 H 4气体和CO气体作为薄膜沉积气体。 这些气体被激活，以使其活性物质在400℃的处理温度下在半导体晶片10上沉积CF膜。 由于通过添加CO气体，类金刚石键的数量大于石墨状键的数量，所以即使在高温下也会使键强化，难以切断，从而提高热稳定性。