摘要:
A therapeutic and prophylactic agent for peptic ulcers which contains as an active ingredient a compound of the general formula (I): ##STR1## wherein R.sub.1 represents hydrogen or .dbd.O; R.sub.2 represents hydrogen or --OR.sub.5 ; R.sub.3 represents hydrogen or --OR.sub.5 ; R.sub.4 represents --OR.sub.7 in the case of the absence of double bond; R.sub.5, R.sub.6 and R.sub.7 each represents hydrogen or an organic residue;X represents group (A);.dbd.C.dbd.CH--COR.sub.8 (A)or group (B): ##STR2## wherein R.sub.8 represents alkyl, and R.sub.9 and R.sub.10 each represents hydrogen or an organic residue; with the proviso that when X represents group (A), then R.sub.1 and R.sub.3 both represent hydrogen, R.sub.2 represents --OR.sub.5, R.sub.4 represents OR.sub.7 and the bond between the carbon atom to which X is attached and the carbon atom to which R.sub.4 is attached is a single bond, and when X represents group (B), then R.sub.1 represents .dbd.O, R.sub.2 represents hydrogen, R.sub.3 represents --OR.sub.6 and the bond between the carbon atom to which X is attached and the carbon atom to which R.sub.4 is attached is a double bond, or a pharmaceutically acceptable salt thereof, or a compound of the general formula (II): ##STR3## wherein R.sub.11 represents hydrogen or an organic residue, and R.sub.12, R.sub.13 and R.sub.14 each represents an organic residue, or and a pharmaceutically acceptable salt thereof. The compounds of the general formulae (I) and (II) can be derived from compounds contained in a hot water extract of cinnamon.
摘要:
Problems with previously known aqueous acidic rinsing solutions for aluminum after shaping while using surface lubricants are avoided by use of a solution which contains water and (A) orthophosphoric acid in an amount to give a stoichiometric equivalent of 3.0 to 50 g/L as PO.sub.4.sup.-3, (B) an aluminum ion sequestrant component in an amount of 0.01 to 10.0 g/L; and (C) 20 to 170 ppm of ferric ion. The ferric ions act to inhibit corrosion of the stainless steel process equipment. Preferably the solution also contains 0.1 to 1.0 g/L of H.sub.2 O.sub.2, NO.sub.2.sup.-1 ions, or a mixture thereof to reoxidize ferrous ions formed by reduction of ferric ions during use of the solution and thus maintain the concentration of ferric ions above 20 ppm at all times. The solution may also contain surfactant and up to 10 g/L of dissolved aluminum ions.
摘要:
A supply and return air plenum unit for duct air-conditioning systems includes a return air inlet and a supply air outlet defined in a case in vertical juxtaposition, the supply air outlet having an opening located at a front lower corner of the case. A blow-off grill is disposed in the opening of the supply air outlet and is angularly moved by an actuator for varying the direction of supply air within a range between the horizontal and the vertical.
摘要:
There is disclosed a light-sensitive silver halide color photographic material having a silver halide emulsion layer containing at least one layer of a negative working silver halide on a support, comprising the negative working silver halide comprises at least 80 mole % of silver chloride, and being color sensitized with at least one kind of sensitizing dyes having the local maximum value of spectral sensitivity in the wavelength region from 445 nm to 490 nm and at least one kind of sensitizing dyes having the local maximum value of spectral sensitivity in the wavelength region from 420 nm to less than 445 nm.The photographic material according to this invention exhibits excellent color reproducibility and quick process suitability.
摘要:
Polyolefin resin composition having an excellent resistance to blushing on impact, excellent gloss, high impact resistance and high stiffness, which comprises a specific ethylene/propylene block copolymer (A) consisting essentially of first and second segments of an ethylene/propylene copolymer having each a specific ethylene content and a copolymer of ethylene (B) selected from a specific polyethylene and a specific copolymer of ethylene and an .alpha.-olefin having 3 or more carbon atoms. The resin composition is useful for the production of molded products having excellent properties.
摘要:
A photopolymerizable composition comprising (a) a chlorinated polyolefin, (b) a monomer having at least one ethylenically unsaturated bond capable of addition polymerization and (c) a photopolymerization initiator.
摘要:
A photopolymerizable composition having improved thermal stability comprising (a) a polymerizable ethylenically unsaturated monomer, (b) an initiator represented by the general formula (I): ##STR1## wherein Z represents the non-metallic atoms necessary to complete a nitrogen-containing heterocyclic nucleus; R.sup.1 represents an unsubstituted or substituted alkyl group; and R.sup.2 represents an unsubstituted or substituted alkyl group, an unsubstituted or substituted aryl group, or a thienyl group; and (c) a chlorinated polyolefin as a binder and additionally containing (d) about 1 to about 30% by weight of an epoxy compound.
摘要:
The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.
摘要:
The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.
摘要:
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a pattern with a minimal line edge roughness.