公开(公告)号：US08288743B2

公开(公告)日：2012-10-16

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： B01D59/44

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US08173984B2

公开(公告)日：2012-05-08

申请号：US12382964

申请日：2009-03-27

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

公开(公告)号：US08698112B2

公开(公告)日：2014-04-15

申请号：US13396289

申请日：2012-02-14

申请人： Takayuki Yabu ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

发明人： Takayuki Yabu ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC分类号： H01J35/20

CPC分类号： H05G2/006 ,  G03F7/70033 ,  H05G2/008

摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.

摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

公开(公告)号：US08492738B2

公开(公告)日：2013-07-23

申请号：US13465108

申请日：2012-05-07

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： H01J1/50

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20110261844A1

公开(公告)日：2011-10-27

申请号：US13176483

申请日：2011-07-05

申请人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

公开(公告)号：US07923705B2

公开(公告)日：2011-04-12

申请号：US12385835

申请日：2009-04-21

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： G21G4/00

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70883 ,  H05G2/008

摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到 目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

公开(公告)号：US20140203194A1

公开(公告)日：2014-07-24

申请号：US14241023

申请日：2012-09-05

申请人： Hitoshi Nagano ,  Yasunori Wada ,  Tatsuya Yanagida ,  Osamu Wakabayashi

发明人： Hitoshi Nagano ,  Yasunori Wada ,  Tatsuya Yanagida ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70041 ,  G21K1/062 ,  H01L21/0275 ,  H01S3/005 ,  H01S3/10038 ,  H01S3/1075 ,  H01S3/115 ,  H01S3/1305 ,  H01S3/1643 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4087 ,  H05G2/005

摘要： A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

摘要翻译： 一种用于产生极紫外光的系统，其中室内的目标材料被照射成等离子体的激光束，包括被配置为输出第一激光束的第一激光装置，被配置为输出基座的第二激光装置 和第二激光束，以及连接到第一和第二激光装置并被配置为使第一激光束首先输出的控制器，控制器在第一激光束之后输出，并且第二激光束的能量高于 在基座之后输出的基座。

公开(公告)号：US08901522B2

公开(公告)日：2014-12-02

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G21K5/00 ,  G03F7/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US20130134326A1

公开(公告)日：2013-05-30

申请号：US13595312

申请日：2012-08-27

申请人： Takayuki Yabu ,  Youichi Sasaki ,  Yulaka Shiraishi ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Takayuki Yabu ,  Youichi Sasaki ,  Yulaka Shiraishi ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G21K5/02 ,  B65B63/08

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

摘要： A target collection device may include a collection container having an opening through which a target material is collected into the collection container, and a temperature adjuster configured to adjust a temperature of the collection container to a temperature that is equal to or higher than a melting point of the target material. The target collection device may be part of an extreme ultraviolet light generation apparatus. Methods of target collection are also provided.

摘要翻译： 目标收集装置可以包括具有开口的收集容器，目标材料通过该开口被收集到收集容器中;温度调节器，被配置为将收集容器的温度调节到等于或高于熔点的温度 的目标材料。 目标收集装置可以是极紫外光发生装置的一部分。 还提供目标收集方法。

公开(公告)号：US07903700B2

公开(公告)日：2011-03-08

申请号：US11631463

申请日：2005-07-07

申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/2366 ,  H01S3/134 ,  H01S3/225

摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

摘要翻译： 通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E95）。 为了使测得的光谱纯度范围（E95）在目标光谱纯度范围（E950）的允许范围E950±dE95内，从通过振荡激光装置（100）开始放电的时间到放电为止的放电时间 由放大激光装置（300）开始的光谱纯度范围（E95）被控制为稳定。