CONNECTOR FOR IMPLEMENTING MULTI-FACETED INTERCONNECTION AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20220068825A1

    公开(公告)日:2022-03-03

    申请号:US17463736

    申请日:2021-09-01

    Abstract: A connector for implementing multi-faceted interconnection according to an embodiment of the present disclosure includes a first dielectric layer between a first circuit layer and a second circuit layer, a first copper pillar layer connecting the first circuit layer and the second circuit layer in the first dielectric layer, a second dielectric layer on the first circuit layer, a third circuit layer on the second dielectric layer, and a vertical second copper pillar layer connected to the third circuit layer, wherein an opening is formed in the second dielectric layer to expose the first circuit layer, and the second copper pillar layer exposes side faces facing side end faces of the first dielectric layer and the second dielectric layer.

    PACKAGE SUBSTRATE AND MANUFACTURING METHOD THEREFOR

    公开(公告)号:US20240178088A1

    公开(公告)日:2024-05-30

    申请号:US18377379

    申请日:2023-10-06

    CPC classification number: H01L23/3121 H01L21/56 H01L23/49822

    Abstract: A package substrate includes a first dielectric layer, a first line layer provided on the first dielectric layer, the first line layer including a dam, a second dielectric layer provided on the first dielectric layer and covering the first line layer, a component embedded in the second dielectric layer and surrounded by the dam, and a third dielectric layer provided on the second dielectric layer and covering the component. By providing the dam, it can ensure a good bonding force between dielectric layers by using the dam to effectively avoid an offset problem of the components when the same is embedded in the second dielectric layer as well as omitting a step of baking roughening.

    SUBSTRATE EMBEDDED WITH INTEGRATED INDUCTOR AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230361058A1

    公开(公告)日:2023-11-09

    申请号:US18175527

    申请日:2023-02-27

    CPC classification number: H01L23/645 H01L23/49822 H01L21/4857

    Abstract: A manufacturing method for a substrate embedded with integrated inductor includes: providing a bearing plate; manufacturing a first conduction copper column on the bearing plate; arranging a first dielectric layer on the bearing plate which covers the first conduction copper column; opening the first dielectric layer to form a first opening; filling a magnetic material at the first opening; grinding the first dielectric layer so that surfaces of the first conduction copper column and the magnetic material are flush with a surface of the first dielectric layer; removing the bearing plate, etching a metal layer on the surface of the first dielectric layer to form a package substrate; arranging a first circuit layer and a solder mask layer on an upper surface and a lower surface of the package substrate; and forming a window in the solder mask layer corresponding to the first circuit layer.

    CONNECTOR FOR IMPLEMENTING MULTI-FACETED INTERCONNECTION

    公开(公告)号:US20230275023A1

    公开(公告)日:2023-08-31

    申请号:US18143170

    申请日:2023-05-04

    CPC classification number: H01L23/53228 H01L23/5386 H01L24/14

    Abstract: In a method of manufacturing a connector, a first copper pillar layer and a sacrificial copper pillar layer are formed on a temporary bearing plate coated with copper, an etch stop layer is applied on the sacrificial copper pillar layer and electroplated to form a second copper pillar layer, insulating materials is laminated to form a first dielectric layer, a first circuit layer is formed on the first dielectric layer, a second copper pillar layer and a sacrificial copper pillar layer are extended on the first circuit layer, and a sacrificial copper layer is formed on the first circuit layer, insulating material is laminated on the first circuit layer to form a second dielectric layer, the temporary bearing plate is removed, a second and third circuit layers are simultaneously formed on the first and second dielectric layers, and the sacrificial copper layer and the sacrificial copper pillar layer are etched.

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