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405 条记录 (耗时 0.023 秒)

    Relocatable corrosion control facility
    21.
    发明授权
    Relocatable corrosion control facility 有权

    公开(公告)号：US09708827B1

    公开(公告)日：2017-07-18

    申请号：US15378114

    申请日：2016-12-14

    申请人： Peter E. Gill ,  Peter E. Gill, III

    发明人： Peter E. Gill ,  Peter E. Gill, III

    IPC分类号： E04H1/00 ,  E04H3/00 ,  E04H5/00 ,  E04H6/00 ,  E04H9/00 ,  E04H14/00 ,  E04H5/02 ,  E04F11/02 ,  E04H6/44 ,  B64F5/30 ,  B64F5/40

    CPC分类号： E04H5/02 ,  B64F5/30 ,  B64F5/40

    摘要： A relocatable corrosion control facility preferably includes a red zone, a yellow zone and a green zone. The red zone is a work area. The work area preferably includes at least one combination paint and sanding booth, an eye wash, a compressor, an air tank, a storage enclosure and a hazardous storage. The yellow zone is an undressing area. The undressing area preferably includes at least two air showers; a respirator and personal protective equipment locker room (RPPE); and at least one dirty locker room. The technician removes equipment in the RPPE locker room and exits into a dirty locker room. The dirty locker room includes dirty clothes storage, showers and sinks. An exit of each dirty locker room leads into a green zone. The green zone is a staging area. The staging area includes at least one clean locker room, at least one office and a lobby.

    PRE-POPULATED CONTAINERIZED MODULE OF SUBASSEMBLY AND COMPONENTS FROM WHICH TO CONSTRUCT LARGE-SCALE INDUSTRIAL FACILITIES
    22.
    发明申请
    PRE-POPULATED CONTAINERIZED MODULE OF SUBASSEMBLY AND COMPONENTS FROM WHICH TO CONSTRUCT LARGE-SCALE INDUSTRIAL FACILITIES 审中-公开

    公开(公告)号：US20170199505A1

    公开(公告)日：2017-07-13

    申请号：US14992482

    申请日：2016-01-11

    申请人： MODULAR EYES INC.

    发明人： ROSS HARPER

    IPC分类号： G05B19/18

    CPC分类号： E04H5/02 ,  E04H2001/1283

    摘要： This invention is aimed at enhancing manufacturing and fabrication of componentry for large scale industrial or processing facilities (for example) by tailoring prefabrication of modules suitable for both: a) shipment and logistics advantages enjoyed by container transport and transshipment systems; and b) convenient and safe, efficient assembly to working end-state on-site. In particular, this is aimed at providing pre-populated subassemblies as modules with multi-modal container-like characteristics for shipping, transshipping and inventorying, but which are pre-built to a large extent to include pre-positioned and connected wiring, piping, tubing, valves, electrical and signal conduits, control systems, flooring and lighting, equipment such as pumps and motors, filters, process vessels, heaters and the like; each such pre-populated module can be attached to one or more other modules, or to a larger industrial facility, to quickly and with maximum exactness and efficiency, and safely develop and build-out the industrial facility.

    Processing Facility for Manufacturing Integrated Circuits from Semiconductor Wafers as well as Perforated Panel for a Processing Facility
    26.
    发明申请
    Processing Facility for Manufacturing Integrated Circuits from Semiconductor Wafers as well as Perforated Panel for a Processing Facility 审中-公开
    用于制造半导体晶片的集成电路的处理设备以及用于处理设备的穿孔面板

    公开(公告)号：US20170073978A1

    公开(公告)日：2017-03-16

    申请号：US15264655

    申请日：2016-09-14

    申请人： M+W Group GmbH

    发明人： Hartmut Schneider ,  Freyja Eberle ,  Steffen Köhler ,  Peter Csatary ,  Herbert Blaschitz

    IPC分类号： E04F15/02 ,  E04H5/02

    CPC分类号： E04F15/02177 ,  E04B5/43 ,  E04B5/48 ,  E04F2290/02 ,  E04H5/02 ,  G03F7/702 ,  G03F7/708 ,  G03F7/70991 ,  H01L21/67225

    摘要： A processing facility for manufacturing integrated circuits on semiconductor wafers is provided with at least one radiation generator that generates an EUV (extreme ultraviolet) radiation that is supplied to at least one lithography machine, housed in a factory building, for exposure of the semiconductor wafers. The radiation generator is housed in a building or a building section separate from the factory building. At least one beam guide extends from the building or the building section to the factory building, wherein the EUV radiation is supplied from the building or the building section through the at least one beam guide to the factory building. At least one supply line branches off at an obtuse angle from the at least one beam guide inside the factory building, wherein at least a portion of the EUV radiation is supplied through the at least one supply line to the lithography machine.

    摘要翻译： 一种用于在半导体晶片上制造集成电路的处理设备设置有至少一个辐射发生器，该辐射发生器产生供给至少一个光刻机的EUV（极紫外）辐射，该光刻机容纳在工厂建筑物中，用于暴露半导体晶片。 辐射发生器安装在与工厂大楼分开的建筑物或建筑物中。 至少一个梁导向件从建筑物或建筑部分延伸到工厂建筑物，其中EUV辐射从建筑物或建筑部分通过至少一个梁导向器供应到工厂建筑物。 至少一个供应线与工厂建筑物内的至少一个梁导向件以钝角分支，其中EUV辐射的至少一部分通过至少一个供应管线供应到光刻机。

    Data Centre
    27.
    发明申请
    Data Centre 有权
    数据中心

    公开(公告)号：US20170064872A1

    公开(公告)日：2017-03-02

    申请号：US15352892

    申请日：2016-11-16

    申请人： Bripco BVBA

    发明人： Paul Rogers

    IPC分类号： H05K7/20 ,  E04H5/02 ,  H05K7/14

    CPC分类号： H05K7/20745 ,  E04H5/02 ,  E04H2005/005 ,  F24F7/04 ,  F25D23/12 ,  G06F1/20 ,  H05K7/1497 ,  H05K7/20 ,  H05K7/20136 ,  H05K7/20145 ,  H05K7/20181 ,  H05K7/20554 ,  H05K7/20754

    摘要： A data centre (100) includes at least one rack room (in for example module 140) having a floor and a plurality of rack storage areas on the floor, each rack storage area being arranged to accommodate a plurality of racks (143) in which a plurality of rack-mountable electronic components may be housed, one or more controllable air circulation systems (in for example module 122), one or more cold aisles (144) in the rack room, each cold aisle being adjacent to a rack storage area, and one or more hot aisles (145) in the rack room, each hot aisle being adjacent to a rack storage area. There may be a large air duct, in the form of a personnel corridor (123), for transporting, under the control of the one or more air circulation systems, cooling air, above the floor, to the one or more cold aisles. The air supply corridor/duct (123) may have a height greater than 1.5 m above the floor and a cross-sectional area of at least 2 m2 and a maximum dimension in the plane of the cross-section of less than 3 m.

    摘要翻译： 数据中心（100）包括至少一个机架室（例如模块140），其具有底板和在地板上的多个机架存储区域，每个机架存储区域被布置成容纳多个机架（143），其中 可以容纳多个可机架安装的电子部件，一个或多个可控空气循环系统（例如模块122），机架室中的一个或多个冷通道（144），每个冷通道邻近机架存储区域 ，以及在机架室中的一个或多个热通道（145），每个热通道邻近机架存储区域。 可以有人造走廊（123）形式的大风道，用于在一个或多个空气循环系统的控制下，将在地板上方的冷却空气运送到一个或多个冷通道。 空气供应走廊/管道（123）可以具有高于地板上方1.5米的高度，并且截面面积至少为2平方米，横截面的最大尺寸小于3米。

    Recovery boiler plant of a chemical pulp mill
    28.
    发明授权
    Recovery boiler plant of a chemical pulp mill 有权
    化学纸浆厂的回收锅炉厂

    公开(公告)号：US09562323B2

    公开(公告)日：2017-02-07

    申请号：US14400821

    申请日：2013-05-16

    申请人： ANDRITZ OY

    发明人： Ari Heinola ,  Veli Riikonen

    IPC分类号： D21C11/12 ,  E04H5/02 ,  B01J19/00 ,  B01J19/24

    CPC分类号： D21C11/122 ,  D21C11/12 ,  E04H5/02

    摘要： A recovery boiler plant of a chemical pulp mill including: a boiler including a lower region with an outlet to discharge smelt; a dissolving tank proximate to the outlet and configured to receive smelt; a smelt spout coupled to the outlet and including a chute extending from the outlet to a position at or over an inlet to the dissolving tank; and a shielding room including walls, a ceiling and a floor, wherein one of the walls includes a wall of the boiler, and the shielding room encloses a volume adjacent the boiler and above the dissolving tank, wherein the enclosed volume includes and the smelt spout and a working area in front of the smelt spout.

    摘要翻译： 一种化学纸浆厂的回收锅炉设备，包括：锅炉，包括具有排出熔体的出口的下部区域; 位于出口附近的溶解槽并且构造成接收熔融物; 熔融喷嘴，其联接到出口并且包括从出口延伸到溶解槽的入口处或上方的位置的斜槽; 以及包括墙壁，天花板和地板的屏蔽室，其中一个壁包括锅炉的壁，并且屏蔽室围绕与锅炉相邻并且在溶解槽之上的体积，其中封闭容积包括熔体喷口 和在熔炼口前面的一个工作区域。

    PUMP SHELTER
    29.
    发明申请
    PUMP SHELTER 审中-公开

    公开(公告)号：US20170022992A1

    公开(公告)日：2017-01-26

    申请号：US15124263

    申请日：2015-03-09

    申请人： Daniel Jutras

    发明人： Daniel Jutras

    IPC分类号： F04D13/02 ,  A62C27/00 ,  F04D29/58 ,  F04D29/62 ,  B62D63/06 ,  F04D29/42 ,  E04H5/02 ,  F16M1/00 ,  F16M3/00 ,  A62C25/00 ,  F04D29/22

    CPC分类号： F04D13/02 ,  A62C25/00 ,  A62C27/00 ,  B62D63/062 ,  E04H5/02 ,  F04B17/06 ,  F04D29/22 ,  F04D29/4293 ,  F04D29/5893 ,  F04D29/628 ,  F04D29/669 ,  F16M1/00 ,  F16M3/00

    摘要： A pump shelter including a housing, the housing having insulating structures for insulating an interior of the housing from external elements. A pump system is positioned within the housing and operable for pumping a fluid. A heating system is also positioned within the housing for heating the interior of the housing. A lighting system provides lighting for the interior of the housing. A power supply system provides power to at least one of the pump system, the heating system and the lighting system. Hose elements are removably connectable to the pump system. The pump shelter is readily and quickly available for rapid deployment in a fire or flooding scenario under various climate conditions.

    摘要翻译： 一种包括壳体的泵罩，所述壳体具有用于将所述壳体的内部与外部元件绝缘的绝缘结构。 泵系统定位在壳体内并可操作用于泵送流体。 加热系统也定位在壳体内以加热壳体的内部。 照明系统为房屋内部提供照明。 电源系统为泵系统，加热系统和照明系统中的至少一个提供电力。 软管元件可拆卸地连接到泵系统。 在各种气候条件下，在防火或淹水情况下，泵架可以方便快捷地用于快速部署。

    Efficient layout and design of production facility
    30.
    发明授权
    Efficient layout and design of production facility 有权
    生产设施的高效布局和设计

    公开(公告)号：US09493961B2

    公开(公告)日：2016-11-15

    申请号：US12982858

    申请日：2010-12-30

    申请人： Wei Chak Joseph Lam

    发明人： Wei Chak Joseph Lam

    IPC分类号： E04H5/02 ,  E04B1/00

    CPC分类号： E04H5/02 ,  E04B2001/0053 ,  Y02P80/40 ,  Y02P90/14 ,  Y02P90/18 ,  Y02P90/22 ,  Y02P90/265 ,  Y10T29/49

    摘要： An improved layout for a manufacturing facility is disclosed. The layout includes a production area which includes a hub which is at least partially surrounded by a manufacturing area. The manufacturing area comprises production stages used in the manufacturing process. The hub, having direct line-of-sight to the production stages, can easily monitor the manufacturing process.

    摘要翻译： 公开了一种用于制造设备的改进的布局。 布局包括生产区域，其包括至少部分地被制造区域包围的轮毂。 制造区域包括制造过程中使用的生产阶段。 在生产阶段直接观察的轮毂可以轻松监控制造过程。