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    MICROWAVE PLASMA APPARATUS AND METHODS FOR PROCESSING MATERIALS USING AN INTERIOR LINER
    21.
    发明公开
    MICROWAVE PLASMA APPARATUS AND METHODS FOR PROCESSING MATERIALS USING AN INTERIOR LINER 审中-公开

    公开(公告)号：US20230377848A1

    公开(公告)日：2023-11-23

    申请号：US18320655

    申请日：2023-05-19

    Applicant: 6K Inc.

    Inventor： Richard K. Holman ,  Saurabh Ullal

    IPC: H01J37/32

    CPC classification number: H01J37/3244 ,  H01J37/32201 ,  H01J2237/0268 ,  H01J37/32495

    Abstract: The embodiments disclosed herein are directed to systems, methods, and devices for processing a material using a microwave plasma apparatus with an interior liner. In some embodiments, the liner comprises a reduction resistant material layer in direct contact with a hydrogen-containing plasma of a plasma processing apparatus. In some embodiments, the liner may comprise a sleeve disposed between a plasma and one or more concentric tubes of a plasma processing apparatus. In some embodiments, the liner may comprise a coating of material applied to the one or more concentric tubes. In some embodiments, the liner may comprise a flexible ceramic material, such as a ceramic ribbon that is coiled or wrapped in a helix shape spiraling around the interior of the one or more concentric tubes.

    Removable liners for charged particle beam systems
    24.
    发明授权
    Removable liners for charged particle beam systems 失效
    用于带电粒子束系统的可拆卸衬套

    公开(公告)号：US07897939B2

    公开(公告)日：2011-03-01

    申请号：US12167271

    申请日：2008-07-03

    Applicant: Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone, Jr. ,  James Spiros Nakos

    Inventor： Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone, Jr. ,  James Spiros Nakos

    IPC: G21K5/00

    CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268

    Abstract: A method of improving the performance of charged beam apparatus. The method including: providing the apparatus, the apparatus comprising: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; and a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and positioning one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.

    Abstract translation: 一种提高带电束装置性能的方法。 该方法包括：提供该装置，该装置包括：具有内表面的腔室; 用于抽空室的泵口; 腔室内的衬底保持器; 以及室内的带电粒子束，由源产生的带电束和带电粒子束撞击衬底; 并且将一个或多个衬垫定位成与腔室的内表面的一个或多个不同区域接触，衬垫防止由带电束和衬底的相互作用产生的材料涂覆在腔室的内表面的一个或多个不同区域 房间。

    CARBON TUBE FOR ELECTRON BEAM APPLICATION
    25.
    发明申请
    CARBON TUBE FOR ELECTRON BEAM APPLICATION 有权
    用于电子束应用的碳管

    公开(公告)号：US20080218054A1

    公开(公告)日：2008-09-11

    申请号：US11683596

    申请日：2007-03-08

    Applicant: Lonn E. Moore ,  Rajinder S. Dhaliwal ,  Maris A. Sturans

    Inventor： Lonn E. Moore ,  Rajinder S. Dhaliwal ,  Maris A. Sturans

    IPC: H01J29/70

    CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0268 ,  H01J2237/16

    Abstract: Embodiments of the present invention provide an apparatus employing an electron beam to expose the structure of a micro device and produce an image of the structure. The apparatus includes an electron gun producing the electron beam; an electron beam column having one or more segments that shape, focus and/or deflect the electron beams; and one or more center tubes along the electron beam column that provides a high vacuum environment for and guiding the electron beam to a target object coated with an electron sensitive resist. At least one of the center tubes is a carbon tube made of solid carbon material.

    Abstract translation: 本发明的实施例提供一种使用电子束来暴露微器件的结构并产生该结构的图像的装置。 该装置包括产生电子束的电子枪; 具有一个或多个使电子束成形，聚焦和/或偏转的段的电子束柱; 以及沿着电子束柱的一个或多个中心管，其提供高真空环境并将电子束引导到涂覆有电子敏感抗蚀剂的目标物体。 至少一个中心管是由固体碳材料制成的碳管。

    Charged particle beam apparatus
    26.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20060076489A1

    公开(公告)日：2006-04-13

    申请号：US11196399

    申请日：2005-08-04

    Applicant: Takashi Ohshima ,  Mitsugu Sato ,  Soichi Katagiri

    Inventor： Takashi Ohshima ,  Mitsugu Sato ,  Soichi Katagiri

    IPC: G21K7/00

    CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/0268 ,  H01J2237/04756 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/188 ,  H01J2237/24465 ,  H01J2237/2611 ,  H01J2237/31749

    Abstract: A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.

    Abstract translation: 使用静电透镜作为主聚焦元件以获得超小型高灵敏度高分辨率SEM的带电粒子束装置，用于电子束的漂移管位于电子源和样品之间的列内，并且 用于二次电子的检测器位于漂移管内。 这解决了与提供二次电子检测器相关的问题，这种二次电子检测器迄今已成为制造超小型高分辨率SEM柱的瓶颈。

    Scanning electron microscope
    27.
    发明授权
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US5376792A

    公开(公告)日：1994-12-27

    申请号：US52654

    申请日：1993-04-26

    Applicant: Frederick H. Schamber ,  Raymond E. Turocy

    Inventor： Frederick H. Schamber ,  Raymond E. Turocy

    IPC: H01J37/28 ,  H01J37/26

    CPC classification number: H01J37/28 ,  H01J2237/0268 ,  H01J2237/061 ,  H01J2237/06308

    Abstract: An improved scanning electron microscope is disclosed which includes a compact, replaceable electron beam emitter assembly and concentric liner tubes. The concentric liner tubes extend through a central portion of electromagnetic lenses for forming an evacuated path for the electron beam. An outer sealing jacket is provided for forming a vacuum seal with the column assembly sufficient to maintain a vacuum within the outer sealing jacket. A conductive inner liner tube positioned within the outer sealing jacket is adapted to have the electron beam pass therethrough. The inner liner tube provides supports for spray baffles and/or beam shaping orifices. The improved electron beam emitter assembly within the gun assembly includes a filament clamped between a front plate and a back plate by clamping screws. The clamping screws additionally hold an adjustable grid against the front plate.

    Abstract translation: 公开了一种改进的扫描电子显微镜，其包括紧凑的，可更换的电子束发射器组件和同心衬管。 同心衬管延伸穿过电磁透镜的中心部分，以形成用于电子束的真空路径。 提供外密封套，用于与柱组件形成真空密封，足以在外密封套内保持真空。 位于外部密封套内的导电内衬管适于使电子束通过。 内衬管提供喷雾挡板和/或束形成孔的支撑。 枪组件内的改进的电子束发射器组件包括通过夹紧螺钉夹在前板和后板之间的细丝。 夹紧螺丝另外保持一个可调整的格栅抵靠前板。

    SUBSTRATE PROCESSING APPARATUS
    28.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号：US20160189987A1

    公开(公告)日：2016-06-30

    申请号：US14971708

    申请日：2015-12-16

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Manabu AMIKURA ,  Toshiki HINATA

    IPC: H01L21/67

    CPC classification number: H01L21/67069 ,  C23C16/4404 ,  C23C16/4409 ,  C23C16/4412 ,  C23C16/45587 ,  H01J37/32449 ,  H01J2237/0268 ,  H01J2237/16 ,  H01L21/67017 ,  H01L21/6719

    Abstract: A substrate processing apparatus includes a processing container configured to air-tightly accommodate substrates, a plurality of mounting stands configured to mount the substrates, a process gas supply part configured to supply a process gas to the mounting stands, an exhaust mechanism configured to evacuate an interior of the processing container, a partition wall configured to independently surround the mounting stands with a gap left between the partition wall and each of the mounting stands, and cylindrical inner walls configured to independently surround the mounting stands with a gap left between each of the inner walls and each of the mounting stands. Slits are formed in the inner walls. The process gas in the processing spaces is exhausted via the slits. The inner walls include partition plates for bypassing the process gas so that the process gas does not directly flow into the slits.

    Abstract translation: 一种基板处理装置，包括：配置为气密地容纳基板的处理容器;被配置为安装基板的多个安装支架;配置成向所述安装台供给处理气体的处理气体供给部;排气机构， 处理容器的内部，分隔壁，被配置为独立地围绕安装台，间隔留在分隔壁和每个安装台之间，并且圆筒形内壁被构造成独立地围绕安装台，其间留有间隙 内壁和每个安装架。 狭缝形成在内壁上。 处理空间中的处理气体经由狭缝排出。 内壁包括用于旁路工艺气体的隔板，使得工艺气体不直接流入狭缝。

    BEAM LINE SYSTEM OF ION IMPLANTER
    30.
    发明申请
    BEAM LINE SYSTEM OF ION IMPLANTER 有权
    离子植入物的束线系统

    公开(公告)号：US20130009075A1

    公开(公告)日：2013-01-10

    申请号：US13177621

    申请日：2011-07-07

    Applicant: Boon-Chau TONG

    Inventor： Boon-Chau TONG

    IPC: G21K5/10

    CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/31703 ,  H01J2237/31705

    Abstract: A beam line system includes a hollow tube and a plurality of protruding structures. The hollow tube has an inlet and an outlet. An ion beam emitted by the ion implanter is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet. The protruding structures are formed on an inner wall of the hollow tube. Each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.

    Abstract translation: 束线系统包括中空管和多个突出结构。 中空管具有入口和出口。 由离子注入机发射的离子束通过入口引入中空管，并通过出口从中空管中排出。 突出结构形成在中空管的内壁上。 每个突出结构具有用于反射离子束的一部分的反射表面。

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