公开(公告)号：US08258483B1

公开(公告)日：2012-09-04

申请号：US13101741

申请日：2011-05-05

Applicant: Lynn A. Boatner ,  John T. Mihalczo

Inventor： Lynn A. Boatner ,  John T. Mihalczo

IPC: G01T3/06 ,  G01T1/20 ,  G01N23/09

CPC classification number: G01T1/201 ,  C23C14/48 ,  G01T3/06 ,  H01J2237/31706 ,  H01J2237/31708

Abstract: Disclosed below are representative embodiments of methods, apparatus, and systems for detecting particles, such as radiation or charged particles. One exemplary embodiment disclosed herein is particle detector comprising an optical fiber with a first end and second end opposite the first end. The optical fiber of this embodiment further comprises a doped region at the first end and a non-doped region adjacent to the doped region. The doped region of the optical fiber is configured to scintillate upon interaction with a target particle, thereby generating one or more photons that propagate through the optical fiber and to the second end. Embodiments of the disclosed technology can be used in a variety of applications, including associated particle imaging and cold neutron scattering.

Abstract translation: 以下公开了用于检测诸如辐射或带电粒子的颗粒的方法，装置和系统的代表性实施例。 本文公开的一个示例性实施例是粒子检测器，其包括具有与第一端相对的第一端和第二端的光纤。 该实施例的光纤还包括在第一端处的掺杂区域和与掺杂区域相邻的非掺杂区域。 光纤的掺杂区域被配置为在与目标颗粒相互作用时闪烁，从而产生一个或多个通过光纤传播的光子和第二端。 所公开技术的实施例可以用于各种应用，包括相关的粒子成像和冷中子散射。

公开(公告)号：US07611975B2

公开(公告)日：2009-11-03

申请号：US11527594

申请日：2006-09-27

Applicant: Adrian Murrell ,  Peter Michael Banks ,  Matthew Peter Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Peter Michael Banks ,  Matthew Peter Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/12 ,  H01L21/20 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/265 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764 ,  Y10S438/961

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract translation: 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US20090078890A1

公开(公告)日：2009-03-26

申请号：US12233151

申请日：2008-09-18

Applicant: Takatoshi Yamashita ,  Tadashi Ikejiri ,  Keiko Kuzawa ,  Hideyuki Fujiwara

Inventor： Takatoshi Yamashita ,  Tadashi Ikejiri ,  Keiko Kuzawa ,  Hideyuki Fujiwara

IPC: A61N5/00 ,  H01J27/02

CPC classification number: H01J27/14 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/083 ,  H01J2237/24542 ,  H01J2237/304 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/3171

Abstract: This ion source generates a ribbon-like ion beam whose dimension in the Y direction is larger than the dimension in the X direction. This ion source includes a plasma generating vessel having an ion extraction port extending in the Y direction, a plurality of cathodes arranged in a plurality of stages along the Y direction on one side in the X direction in the plasma generating vessel, a reflecting electrode arranged on the other side in the X direction in the plasma generating vessel opposite to the cathodes, and electromagnets for generating magnetic fields along the X direction in regions including the plurality of cathodes in the plasma generating vessel.

Abstract translation: 该离子源产生其Y方向的尺寸大于X方向的尺寸的带状离子束。 该离子源包括具有沿Y方向延伸的离子提取口的等离子体发生容器，在等离子体发生容器中沿着X方向的一侧沿着Y方向排列成多个的多个阴极，反射电极配置 在与阴极相反的等离子体发生容器中的X方向的另一侧，以及用于在等离子体发生容器中包括多个阴极的区域沿着X方向产生磁场的电磁体。

公开(公告)号：US20060197016A1

公开(公告)日：2006-09-07

申请号：US11417027

申请日：2006-05-04

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01J49/00

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US07049210B2

公开(公告)日：2006-05-23

申请号：US10754502

申请日：2004-01-12

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/26

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.