公开(公告)号：US20140110244A1

公开(公告)日：2014-04-24

申请号：US14049483

申请日：2013-10-09

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kota Iwasaki

IPC: C23C14/34

CPC classification number: C23C14/3442 ,  H01J27/026

Abstract: Provided is a supersonic beam apparatus including a nozzle for injecting a gas at a supersonic velocity into a vacuum; a skimmer arranged at a downstream of the nozzle; and an ionization part for ionizing a particle in a supersonic beam formed by the skimmer from the gas injected from the nozzle to form a cluster ion beam, wherein a set position of the skimmer is one of a maximum position where an amount of cluster generation in a relationship of the amount of cluster generation with respect to a distance between the nozzle and the skimmer is maximized and a position closer to the nozzle than the maximum position.

Abstract translation: 提供一种超声波束装置，其包括用于将超声速度的气体注入真空中的喷嘴; 设置在喷嘴下游的撇渣器; 以及离子化部，用于使由所述分离器形成的超声波束中的粒子从从所述喷嘴喷射的气体离子化，形成簇离子束，其中，所述撇渣器的设定位置为最大位置之一，其中， 聚簇产生量相对于喷嘴和撇渣器之间的距离的关系最大化，并且比最大位置更靠近喷嘴的位置。

公开(公告)号：US20130285552A1

公开(公告)日：2013-10-31

申请号：US13870166

申请日：2013-04-25

Applicant: BRUKER DALTONIK GMBH

Inventor： Michael Duerr ,  Christoph Gebhardt

IPC: H01J27/02

CPC classification number: H01J27/026 ,  H01J49/0481 ,  H01J49/142

Abstract: The invention relates to devices and methods in mass spectrometers for the generation of ions of heavy molecules, especially biomolecules, by bombarding them with uncharged clusters of molecules. The analyte ions which are generated or released by cluster bombardment of analyte substances on the surface of sample support plates show a broad distribution of their kinetic energies, which prevents good ion-optical focusing. In the invention, the kinetic energies are homogenized in a higher-density collision gas. The collision gas is preferably located in an RF ion guide, more preferably an RF ion funnel, which can transfer the ions to the mass analyzer. The collision gas may be introduced with temporal pulsing, coordinated or synchronized with the pulsed supersonic gas jet. The collision gas may be pumped off again before the next supersonic gas pulse. In an advantageous embodiment, the collision gas can originate from the supersonic gas jet itself.

Abstract translation: 本发明涉及用于通过用不带电荷的分子簇轰击它们来产生重分子，特别是生物分子的离子的质谱仪中的装置和方法。 通过在样品支撑板表面上的分析物质的聚集轰击产生或释放的分析物离子显示出其动能的广泛分布，这阻止了良好的离子 - 光学聚焦。 在本发明中，动能在较高密度的碰撞气体中均质化。 碰撞气体优选位于RF离子导向件中，更优选地位于可以将离子转移到质量分析器的RF离子漏斗中。 碰撞气体可以与脉冲超音速气体射流一起引入时间脉冲，协调或同步。 碰撞气体可能在下一个超音速气体脉冲之前被再次泵出。 在有利的实施例中，碰撞气体可以源于超音速气体射流本身。

公开(公告)号：US20110266466A1

公开(公告)日：2011-11-03

申请号：US13181910

申请日：2011-07-13

Applicant: John J. Hautala ,  Nathan E. Baxter

Inventor： John J. Hautala ,  Nathan E. Baxter

IPC: H01J37/317

CPC classification number: H01J37/317 ,  H01J27/026 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/3178 ,  H01J2237/0812 ,  H01J2237/316 ,  H01J2237/3165 ,  H01J2237/31701 ,  H01J2237/31732

Abstract: A method of modifying a material layer on a substrate is described. The method comprises forming the material layer on the substrate. Thereafter, the method comprises establishing a gas cluster ion beam (GCIB) having an energy per atom ratio ranging from about 0.25 eV per atom to about 100 eV per atom, and modifying the material layer by exposing the material layer to the GCIB.

Abstract translation: 描述了改变衬底上的材料层的方法。 该方法包括在基底上形成材料层。 此后，该方法包括建立具有每原子约0.25eV至约100eV /原子比的每原子比能量的气体簇离子束（GCIB），以及通过将材料层暴露于GCIB来修饰该材料层。

公开(公告)号：US20100319545A1

公开(公告)日：2010-12-23

申请号：US12818758

申请日：2010-06-18

Applicant: MASAKI NARUSHIMA ,  Koichi Mori ,  Isao Yamada ,  Noriaki Toyoda

Inventor： MASAKI NARUSHIMA ,  Koichi Mori ,  Isao Yamada ,  Noriaki Toyoda

IPC: B03C3/68 ,  B03C3/38

CPC classification number: H01J49/421 ,  H01J27/026 ,  H01J37/147 ,  H01J2237/3142 ,  H01J2237/3151 ,  H01J2237/31701

Abstract: A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes three or more electric field applying parts arranged in an incident direction of an ionized gas cluster, wherein each of the electric field applying parts includes a pair of electrodes; an electric power source configured to supply alternating-current electric voltages to the three or more electric field applying parts in such a manner that an alternating-current electric voltage applied across one pair of the electrodes of one of the three or more electric field applying parts is different in phase from an alternating-current voltage applied across another pair of the electrodes of an adjacent one of the three or more electric field applying parts; and a plate including an opening in an extension of the incident direction.

Abstract translation: 公开了一种分离离子化气体簇的带电粒子分离装置。 带电粒子分离装置包括沿电离气体簇的入射方向配置的三个以上的电场施加部，其中，各电场施加部包括一对电极; 电源，被配置为向三个或更多个电场施加部提供交流电压，使得施加在三个或更多个电场施加部中的一个的一对电极上的交流电压 与施加在三个或更多个电场施加部件中相邻一个的另一对电极上的交流电压的相位不同; 以及包括在入射方向的延伸部中的开口的板。

公开(公告)号：US07345856B2

公开(公告)日：2008-03-18

申请号：US11259549

申请日：2005-10-25

Applicant: Kenneth P. Regan

Inventor： Kenneth P. Regan

IPC: H02H3/00 ,  H02H7/00

CPC classification number: H01J37/3171 ,  H01J27/026 ,  H01J37/08 ,  H01J37/241 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/0812 ,  H02H7/003

Abstract: In an ion bean acceleration system, transient electrical arc suppression and ion beam accelerator biasing circuitry. Two-terminal circuitry, connectable in series, for suppressing arcs by automatically sensing arc conditions and switch from at least a first operating state providing a relatively low resistance electrical pathway for current between source and load terminals to at least a second, relatively high resistance electrical pathway. Selection of circuit component characteristics permits controlling the delay in returning from the second state to the first state after the arc has been suppressed.

Abstract translation: 在离子豆加速系统中，瞬态电弧抑制和离子束加速器偏置电路。 两端子电路，可串联连接，用于通过自动感测电弧条件并从至少第一工作状态切换来抑制电弧，从而提供用于源极和负载端子之间的电流的相对较低电阻的电路，至少第二相对高电阻的电 途径。 选择电路元件特性允许控制在电弧被抑制之后从第二状态返回到第一状态的延迟。

公开(公告)号：US20070170372A1

公开(公告)日：2007-07-26

申请号：US11648378

申请日：2006-12-29

Applicant: Thomas Horsky

Inventor： Thomas Horsky

IPC: H01J27/00

CPC classification number: C23C14/48 ,  H01J27/026 ,  H01J27/08 ,  H01J27/205 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0815 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31701 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/2658 ,  H01L21/823814

Abstract: An ion source is disclosed for providing a range of ion beams consisting of either ionized clusters, such as B2Hx+, B5Hx+, B10Hx+, B18Hx+, P4+ or As4+ or monomer ions, such as Ge+, In+, Sb+, B+, As+, and P+, to enable cluster implants and monomer implants into silicon substrates for the purpose of manufacturing CMOS devices, and to do so with high productivity. The range of ion beams is generated by a universal ion source in accordance with the present invention which is configured to operate in two discrete modes: an electron impact mode, which efficiently produces ionized clusters, and an arc discharge mode, which efficiently produces monomer ions.

Abstract translation: 公开了一种离子源，用于提供由离子簇组成的一系列离子束，例如B 2 H 2，H 2，SUP 2 +，/ B 2， > 5 + ，B 或B 1，B 3，B 3，...，...，...， 或者单体离子，例如Ge +，+， - ， - ， - ， 为了使集群植入物和单体植入物进入硅衬底中以便制造CMOS器件，以及为了制造CMOS器件，为了实现<！ - SIPO - > 以高生产率这样做。 离子束的范围由根据本发明的通用离子源产生，其被配置为以两种离散模式操作：电子冲击模式，其有效地产生离子簇，以及电弧放电模式，其有效地产生单体离子 。

公开(公告)号：US20060087244A1

公开(公告)日：2006-04-27

申请号：US11259549

申请日：2005-10-25

Applicant: Kenneth Regan

Inventor： Kenneth Regan

IPC: H01J7/24

CPC classification number: H01J37/3171 ,  H01J27/026 ,  H01J37/08 ,  H01J37/241 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/0812 ,  H02H7/003

Abstract: In an ion bean acceleration system, transient electrical arc suppression and ion beam accelerator biasing circuitry. Two-terminal circuitry, connectable in series, for suppressing arcs by automatically sensing arc conditions and switch from at least a first operating state providing a relatively low resistance electrical pathway for current between source and load terminals to at least a second, relatively high resistance electrical pathway. Selection of circuit component characteristics permits controlling the delay in returning from the second state to the first state after the arc has been suppressed.

Abstract translation: 在离子豆加速系统中，瞬态电弧抑制和离子束加速器偏置电路。 两端子电路，可串联连接，用于通过自动感测电弧条件并从至少第一工作状态切换来抑制电弧，从而提供用于源极和负载端子之间的电流的相对较低电阻的电路，至少第二相对高电阻的电 途径。 选择电路元件特性允许控制在电弧被抑制之后从第二状态返回到第一状态的延迟。

公开(公告)号：US06629508B2

公开(公告)日：2003-10-07

申请号：US09733211

申请日：2000-12-08

Applicant: Jerald P. Dykstra

Inventor： Jerald P. Dykstra

IPC: C23C1600

CPC classification number: H01J27/20 ,  H01J27/026 ,  H01J37/08 ,  H01J2237/0048 ,  H01J2237/0812

Abstract: A neutral beam ionizing apparatus for electron impact ionization of a substantially cylindrical neutral beam. The apparatus includes an electron source, and a circularly cylindrical ionizing region that is substantially free of magnetic fields. In one embodiment of the invention, the beam is a gas cluster beam, and the electron source includes a heated filament for emitting thermions, the filament including one or more direction reversals shaped to produce self-nulling magnetic fields so as to minimize the magnetic field due to filament heating current. In another embodiment of the invention, a neutral beam ionizing apparatus for electron impact ionization of a substantially cylindrical neutral beam includes at least one electron source, and an elliptically cylindrical ionizing region. In one embodiment, the elliptically cylindrical ionizing region includes a pair of co-focal elliptically cylindrical electrodes biased so as to cause electrons emitted from the at least one electron source to orbit repeatedly through the axis of the beam to be ionized.

公开(公告)号：US20020040966A1

公开(公告)日：2002-04-11

申请号：US09965900

申请日：2001-09-28

Applicant: Pfizer Inc.

Inventor： Raymond J. Bemish

IPC: H01J049/10

CPC classification number: H01J49/10 ,  H01J27/026

Abstract: A method and device for mass spectrometry analysis, wherein a mass spectrometer is adapted for use with helium droplets, as an ionization site medium, with a proton being initially captured by a large helium droplet (null10,000 helium atoms) and then cooled evaporatively to 0.4 Kelvin. The protonated helium droplet then picks up a neutral molecule of interest and the neutral molecule is protonated inside of the droplet with the liquid helium droplet acting as a heat bath to provide rapid cooling of the newly formed protonated molecule. As a result, there is essentially no energy available, at 0.4 Kelvin, for the protonated molecule to fragment. Remaining liquid helium is removed and the stably maintained protonated molecule is detected by a mass spectrometer. Since the molecules do not fragment when protonated (ionized), each compound in a mixture analyses gives one mass and the number of ions of a particular mass detected is directly proportional to the molar percentage of that mass in the sample. The device for effecting the method, comprises the elements of : (1) Helium cluster or droplet source; (2) Proton source for introduction of protons to the droplet (i.e., ionization); (3) atmospheric pressure (AP) Source for reduction of pressure to form a low pressure stream; (4) Cell pick-up elements where compound molecules are protonated or ionized at low temperature; (5) Desolvation area for removal of residual helium; and (6) Mass spectrometer and detector.

Abstract translation: 用于质谱分析的方法和装置，其中质谱仪适用于氦液滴，作为电离位点介质，质子最初被大氦液滴（〜10,000氦原子）捕获，然后蒸发冷却至0.4 开尔文 质子化的氦液滴然后拾取一个中性分子的兴趣，并且中性分子在液滴内被质子化，液体氦液滴作为热浴，以提供新形成的质子化分子的快速冷却。 因此，质子化分子片段基本上没有能量以0.4开尔文可用。 除去剩余的液氦，通过质谱仪检测稳定保持的质子化分子。 由于分子在质子化（离子化）时不会分裂，所以混合物分析中的每种化合物都会产生一个质量，并且检测到的特定质量的离子数与样品中该质量的摩尔百分比成正比。 用于实现该方法的装置包括以下元件：（1）氦簇或液滴源; （2）将质子引入液滴的质子源（即电离）; （3）大气压（AP）用于降低压力以形成低压流的源; （4）化合物分子在低温下质子化或离子化的细胞吸收元件; （5）去除残留氦的去溶剂区; 和（6）质谱仪和检测器。

公开(公告)号：US20160071734A1

公开(公告)日：2016-03-10

申请号：US14842416

申请日：2015-09-01

Applicant: TEL Epion Inc.

Inventor： Michael Graf ,  Noel Russell ,  Matthew C. Gwinn ,  Allen J. Leith

IPC: H01L21/3065 ,  H01J37/305 ,  H01L21/311 ,  H01J27/02

CPC classification number: H01L21/3065 ,  H01J27/026 ,  H01J37/317 ,  H01J2237/006 ,  H01J2237/0812 ,  H01J2237/16 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01L21/31116 ,  H01L21/32136

Abstract: A beam processing system and method of operating are described. In particular, the beam processing system includes a beam source having a nozzle assembly that is configured to introduce a primary gas through the nozzle assembly to a vacuum vessel in order to produce a gaseous beam, such as a gas cluster beam, and optionally, an ionizer positioned downstream from the nozzle assembly, and configured to ionize the gaseous beam to produce an ionized gaseous beam. The beam processing system further includes a process chamber within which a substrate is positioned for treatment by the gaseous beam, and a secondary gas source, wherein the secondary gas source includes a secondary gas supply system that delivers a secondary gas, and a secondary gas controller that operatively controls the flow of the secondary gas injected into the beam processing system downstream of the nozzle assembly.

Abstract translation: 描述了一种光束处理系统和操作方法。 特别地，光束处理系统包括具有喷嘴组件的光束源，喷嘴组件被配置为将初级气体通过喷嘴组件引入真空容器，以便产生诸如气体束束的气体束，并且可选地， 定位在喷嘴组件下游的离子发生器，并被配置为离子化气体束以产生离子化的气体束。 光束处理系统还包括处理室，其中定位用于由气体束进行处理的基板和二次气体源，其中二次气体源包括输送二次气体的二次气体供应系统和二次气体控制器 其可操作地控制注入喷嘴组件下游的光束处理系统中的二次气体的流动。