公开(公告)号：US09451686B2

公开(公告)日：2016-09-20

申请号：US13687067

申请日：2012-11-28

申请人： Dae-Kyu Choi

发明人： Dae-Kyu Choi

IPC分类号： H05H1/46

CPC分类号： H05H1/46 ,  H05H2001/4652 ,  H05H2001/4675 ,  H05H2001/4682

摘要： A hybrid plasma reactor includes a reactor body having a plasma discharge space, a gas inlet, and a gas outlet; a hybrid plasma source including a first hybrid electrode and a second hybrid electrode, which face each other while the reactor body is positioned therebetween and provide a current path having one or more turns, to be inductively and capacitively coupled to plasma formed in the plasma discharge space; and an alternating switching power supply for supplying plasma generation power to the first hybrid electrode and the second hybrid electrode. The hybrid plasma reactor can complexly generate capacitively coupled plasma and inductively coupled plasma, thereby achieving a wide operation area from a low-pressure area to a high-pressure area.

摘要翻译： 混合等离子体反应器包括具有等离子体放电空间的反应器主体，气体入口和气体出口; 包括第一混合电极和第二混合电极的混合等离子体源，其在反应器主体位于其间并且提供具有一个或多个匝的电流通路的情况下彼此面对，以与等离子体放电中形成的等离子体感应和电容耦合 空间; 以及用于向第一混合电极和第二混合电极提供等离子体发生电力的交替开关电源。 复合等离子体反应器可以复杂地产生电容耦合等离子体和电感耦合等离子体，从而实现从低压区域到高压区域的宽操作区域。

公开(公告)号：US09386680B2

公开(公告)日：2016-07-05

申请号：US14496093

申请日：2014-09-25

申请人： Applied Materials, Inc.

发明人： Jian J. Chen ,  Shilpa Sudhakaran ,  Mohamad A. Ayoub

IPC分类号： H01L21/306 ,  H05H1/46

CPC分类号： H05H1/46 ,  H01J37/32082 ,  H01J37/32944 ,  H05H2001/4652

摘要： Embodiments of the present disclosure generally relate to methods for detecting unstable plasma in a substrate processing chamber. In one embodiment, the method includes providing a forward power from a power source to the substrate processing chamber through a detection device, splitting the forward power passing through the detection device at a predetermined ratio to obtain a first value of the power to the substrate processing chamber, measuring a reflected power from the substrate processing chamber to obtain a second value of the power from the substrate processing chamber, and directing the power source to turn off the forward power if the second value of the power is different than the first value of the power.

摘要翻译： 本公开的实施例一般涉及用于检测衬底处理室中的不稳定等离子体的方法。 在一个实施例中，该方法包括通过检测装置从电源向基板处理室提供正向功率，以预定比率分离通过检测装置的正向功率，以获得基板处理功率的第一值 测量来自基板处理室的反射功率，以获得来自基板处理室的功率的第二值，并且如果功率的第二值不同于第一值，则引导电源关闭正向功率 动力。

公开(公告)号：US20160111241A1

公开(公告)日：2016-04-21

申请号：US14949468

申请日：2015-11-23

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Alexandre Likhanskii ,  Svetlana B. Radovanov ,  Bon-Woong Koo

IPC分类号： H01J27/02 ,  H01J27/16

CPC分类号： H01J27/024 ,  H01J27/16 ,  H01J37/08 ,  H01J2237/0815 ,  H05H2001/4652 ,  H05H2001/466

摘要： A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker.

摘要翻译： 公开了具有提取的带状离子束的离子密度的可控性的等离子体室。 多个RF偏置电极对设置在等离子体室中的提取孔的相对侧上。 在一些实施例中，每对RF偏置电极中的一个被偏置在提取电压，而每对中的另一个耦合到RF偏置电源，RF偏压电源提供具有DC分量和AC分量的RF电压。 在另一个实施例中，每对中的两个电极耦合到RF偏置电源。 阻挡剂可以设置在提取孔附近的等离子体室中。 在一些实施例中，RF偏置电极设置在阻挡器上。

公开(公告)号：US09305750B2

公开(公告)日：2016-04-05

申请号：US12728112

申请日：2010-03-19

申请人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani

发明人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani

IPC分类号： C23C16/00 ,  H01L21/306 ,  H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32174 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32137 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4652 ,  H05H2001/4667

摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system may include a first coil for conducting a first current for sustaining at least a first portion of the plasma. The plasma processing system may also include a second coil for conducting a second current for sustaining at least a second portion of the plasma. The plasma processing system may also include a power source for powering the first current and the second current. The plasma processing system may also include a parallel circuit for adjusting one of the amperage of the first current and the amperage of the second current. The parallel circuit may be electrically coupled between the power source and at least one of the first coil and the second coil. The parallel circuit may include an inductor and a variable capacitor electrically connected in parallel to each other.

摘要翻译： 一种用于产生等离子体以处理至少晶片的等离子体处理系统。 等离子体处理系统可以包括用于传导第一电流以维持等离子体的至少第一部分的第一线圈。 等离子体处理系统还可以包括用于传导第二电流以维持等离子体的至少第二部分的第二线圈。 等离子体处理系统还可以包括用于为第一电流和第二电流供电的电源。 等离子体处理系统还可以包括并联电路，用于调节第一电流的电流强度和第二电流的电流强度之一。 并联电路可以电耦合在电源和第一线圈和第二线圈中的至少一个之间。 并联电路可以包括彼此并联电连接的电感器和可变电容器。

公开(公告)号：US20160066405A1

公开(公告)日：2016-03-03

申请号：US14825325

申请日：2015-08-13

申请人： SHIMADZU CORPORATION

发明人： Toshiya HABU

IPC分类号： H05H1/46 ,  H01J37/244 ,  G01J3/02 ,  H01J37/32

CPC分类号： G01J3/10 ,  G01J3/027 ,  G01J3/443 ,  H01J37/244 ,  H01J37/321 ,  H01J37/32174 ,  H01J37/32183 ,  H05H1/0037 ,  H05H1/36 ,  H05H1/46 ,  H05H2001/4652 ,  H05H2001/4682

摘要： A high-frequency input voltage and a high-frequency input current to a series resonant circuit are detected by a voltage detection unit and a current detection unit, respectively, and plasma input power is detected by a plasma input power detection unit based on the detected high-frequency input voltage and high-frequency input current. By directly detecting the plasma input power in this manner, the plasma input power may be accurately controlled regardless of the state of a plasma-generating gas or an analysis sample. Also, use of a switching circuit including a semiconductor device allows an inexpensive configuration compared with a configuration where a vacuum tube or the like is used.

摘要翻译： 通过电压检测单元和电流检测单元分别检测到串联谐振电路的高频输入电压和高频输入电流，并且基于检测到的等离子体输入功率检测单元检测等离子体输入功率 高频输入电压和高频输入电流。 通过以这种方式直接检测等离子体输入功率，可以精确地控制等离子体输入功率，而与等离子体产生气体或分析样品的状态无关。 此外，与使用真空管等的构造相比，使用包括半导体器件的开关电路允许便宜的配置。

公开(公告)号：US09230773B1

公开(公告)日：2016-01-05

申请号：US14516032

申请日：2014-10-16

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Alexandre Likhanskii ,  Svetlana B. Radovanov ,  Bon-Woong Koo

IPC分类号： H01J37/00 ,  H01J27/02 ,  H01J27/16

CPC分类号： H01J27/024 ,  H01J27/16 ,  H01J37/08 ,  H01J2237/0815 ,  H05H2001/4652 ,  H05H2001/466

摘要： A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker.

公开(公告)号：US20150162657A1

公开(公告)日：2015-06-11

申请号：US14566133

申请日：2014-12-10

申请人： SEN Corporation

发明人： Shiro Ninomiya ,  Masateru Sato

IPC分类号： H01Q1/40 ,  H05H1/46

CPC分类号： H01Q1/40 ,  H01J37/321 ,  H01J37/3211 ,  H01Q1/42 ,  H01Q1/421 ,  H01Q7/00 ,  H05H1/46 ,  H05H2001/4652 ,  H05H2001/4667

摘要： An antenna cover that protects a surface of an antenna provided in a plasma chamber and exciting an electric field with a high frequency to an inner portion of the plasma chamber is provided. In the antenna cover, the thickness of the antenna cover in at least one direction among directions orthogonal to the surface of the antenna is different according to a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover decreases. In the antenna cover, the thickness of at least one direction may be changed along an extension direction of the antenna.

摘要翻译： 提供了一种天线罩，其保护设置在等离子体室中的天线的表面并激发高频电场到等离子体室的内部。 在天线罩中，根据天线的表面位置，与天线表面正交的方向中的至少一个方向的天线罩的厚度不同，使得天线的外表面上的电位的空间依赖性 覆盖减少。 在天线罩中，沿着天线的延伸方向可以改变至少一个方向的厚度。

公开(公告)号：US20150137682A1

公开(公告)日：2015-05-21

申请号：US14413820

申请日：2013-07-10

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS) ,  UNIVERSITE JOSEPH FOURIER-GRENOBLE 1

发明人： Ana Lacoste ,  Jacques Pelletier

IPC分类号： H05H1/46 ,  H05H1/50 ,  H05H1/48

CPC分类号： H05H1/46 ,  H01J61/327 ,  H01J61/54 ,  H01J61/78 ,  H05H1/48 ,  H05H1/50 ,  H05H2001/4607 ,  H05H2001/4652

摘要： The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp.

摘要翻译： 该公开内容包括：辉光放电灯，包括：对照射辐射透明并包含等离子体气体的细长壳体; 用于在壳体的所谓正柱区域中施加用于维持等离子体的电场的装置，该装置包括在其两端形成位于壳体中的阳极和阴极的两个电极; 以及相对于阴极形成电极布置在壳体中的射频或微波阴极等离子体源，以便产生位于电极表面上的高频放电以产生等离子体。 本公开还包括这种辉光放电灯的照明方法。

公开(公告)号：US08005548B2

公开(公告)日：2011-08-23

申请号：US12638161

申请日：2009-12-15

申请人： Gregory A. Watson

发明人： Gregory A. Watson

IPC分类号： A61F2/00

CPC分类号： H05H1/46 ,  A61L2/0011 ,  A61L2202/11 ,  A61N1/44 ,  H05H2001/4652 ,  H05H2001/466 ,  H05H2001/4697 ,  H05H2240/20 ,  H05H2277/10

摘要： A method for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The unit includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.

摘要翻译： 用于在手持单元内产生大气压冷等离子体的方法用同时不同的rf波长及其谐波放出冷等离子体。 该单元包括一个由连接到一系列高压线圈和电容器的低压电源供电的rf调谐网络。 rf能量信号被传送到主容纳室并通过各种尺寸和厚度的电极板网络分散以产生多个频率。 氦气被引入第一个初级容纳室，其中电子分离开始。 通电的气体流入二次磁压缩室，其中具有电容的平衡频率网格栅极产生最终的电子分离，其被电磁反转并通过具有喷嘴的孔口离开。 已经显示出由此产生的冷血浆能够加速动物实验室标本中肉体伤口的愈合过程。

公开(公告)号：US07969096B2

公开(公告)日：2011-06-28

申请号：US11639680

申请日：2006-12-15

申请人： Xing Chen

发明人： Xing Chen

IPC分类号： H05B31/26

CPC分类号： H05H1/46 ,  C03B19/143 ,  C03B37/0183 ,  C03B37/01861 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/3266 ,  H05H2001/4652

摘要： A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.

摘要翻译： 一种用于激发气体的方法和装置，其涉及通过限定间隙的磁芯单向产生交变磁场，跨越间隙并通过包括电介质材料的等离子体容器。 磁场在等离子体容器中产生产生等离子体的电场。