公开(公告)号：US11521683B2

公开(公告)日：2022-12-06

申请号：US17191392

申请日：2021-03-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stanley Hong ,  Anh Ly ,  Vipin Tiwari ,  Nhan Do

IPC: G11C16/04 ,  G06N3/08 ,  H01L27/11521 ,  H01L29/788 ,  G06N3/04

Abstract: Numerous embodiments are disclosed for a high voltage generation algorithm and system for generating high voltages necessary for a particular programming operation in analog neural memory used in a deep learning artificial neural network. Compensation measures can be utilized that compensate for changes in voltage or current as the number of cells being programmed changes.

公开(公告)号：US11521682B2

公开(公告)日：2022-12-06

申请号：US17095661

申请日：2020-11-11

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Steven Lemke ,  Nhan Do ,  Vipin Tiwari ,  Mark Reiten

IPC: G11C16/04 ,  G06F17/16 ,  G06N3/063 ,  G06N3/08 ,  G06N3/04 ,  G11C7/04

Abstract: Numerous embodiments are disclosed for providing temperature compensation in an analog memory array. A method and related system are disclosed for compensating for temperature changes in an array of memory cells by measuring an operating temperature within the array of memory cells and changing a threshold voltage of a selected memory cell in the array of memory cells to compensate for a change in the operating temperature.

公开(公告)号：US20220374161A1

公开(公告)日：2022-11-24

申请号：US17463063

申请日：2021-08-31

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Mark Reiten

IPC: G06F3/06 ,  G06N3/08

Abstract: Numerous embodiments are disclosed for an output circuit for an analog neural memory in a deep learning artificial neural network. In some embodiments, an output block receives current from a W+ bit line and current from an associated W− bit line, and the output block generates an output signal that is a differential signal in certain embodiments and is a single ended signal in other embodiments.

公开(公告)号：US11507816B2

公开(公告)日：2022-11-22

申请号：US16576533

申请日：2019-09-19

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Steven Lemke ,  Vipin Tiwari ,  Nhan Do ,  Mark Reiten

IPC: G06N3/063 ,  G06F17/16 ,  G11C11/54 ,  G11C11/56

Abstract: Numerous embodiments of a precision tuning algorithm and apparatus are disclosed for precisely and quickly depositing the correct amount of charge on the floating gate of a non-volatile memory cell within a vector-by-matrix multiplication (VMM) array in an artificial neural network. Selected cells thereby can be programmed with extreme precision to hold one of N different values.

公开(公告)号：US20220336020A1

公开(公告)日：2022-10-20

申请号：US17850447

申请日：2022-06-27

Applicant: Silicon Storage Technology, Inc.

Inventor： Steven Lemke ,  Hieu Van Tran ,  Yuri Tkachev ,  Louisa Schneider ,  Henry A. Om'mani ,  Thuan Vu ,  Nhan Do ,  Vipin Tiwari

IPC: G11C16/10 ,  G06N3/063 ,  G11C16/26 ,  G11C16/14

Abstract: Examples for ultra-precise tuning of a selected memory cell are disclosed. In one example, a method of programming a first memory cell in a neural memory to a target value is disclosed, the method comprising programming a second memory cell by applying programming voltages to terminals of the second memory cell; and determining if an output of the first memory cell has reached the target value.

公开(公告)号：US20220320125A1

公开(公告)日：2022-10-06

申请号：US17845782

申请日：2022-06-21

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Hung Quoc Nguyen ,  Nhan Do

IPC: H01L27/11526 ,  H01L27/11519 ,  H01L27/11521 ,  G11C16/04 ,  G11C16/14 ,  G11C16/26 ,  H01L29/423 ,  H01L29/788

Abstract: A memory device with memory cell pairs each having a single continuous channel region, first and second floating gates over first and second portions of the channel region, an erase gate over a third portion of the channel region between the first and second channel region portions, and first and second control gates over the first and second floating gates. For each of the pairs of memory cells, the first region is electrically connected to the second region of an adjacent pair of memory cells in the same active region, and the second region is electrically connected to the first region of an adjacent pair of the memory cells in the same active region.

公开(公告)号：US11444091B2

公开(公告)日：2022-09-13

申请号：US17129865

申请日：2020-12-21

Applicant: Silicon Storage Technology, Inc.

Inventor： Jack Sun ,  Chunming Wang ,  Xian Liu ,  Andy Yang ,  Guo Xiang Song ,  Leo Xing ,  Nhan Do

IPC: H01L21/00 ,  H01L27/11531 ,  H01L27/11524 ,  H01L29/66 ,  H01L29/423 ,  H01L27/11529

Abstract: A method of forming a semiconductor device by recessing the upper surface of a semiconductor substrate in first and second areas but not a third area, forming a first conductive layer in the first and second areas, forming a second conductive layer in all three areas, removing the first and second conductive layers from the second area and portions thereof from the first area resulting in pairs of stack structures each with a control gate over a floating gate, forming a third conductive layer in the first and second areas, forming a protective layer in the first and second areas and then removing the second conductive layer from the third area, then forming blocks of conductive material in the third area, then etching in the first and second areas to form select and HV gates, and replacing the blocks of conductive material with blocks of metal material.

公开(公告)号：US11443175B2

公开(公告)日：2022-09-13

申请号：US16150606

申请日：2018-10-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Vipin Tiwari ,  Nhan Do

IPC: G06N3/063 ,  G11C11/56 ,  G06N3/04 ,  G06F3/06 ,  G06F17/16 ,  G06N3/08 ,  G11C13/00 ,  G11C16/04 ,  G11C16/28

Abstract: Numerous embodiments are disclosed for compensating for differences in the slope of the current-voltage characteristic curve among reference transistors, reference memory cells, and flash memory cells during a read operation in an analog neural memory in a deep learning artificial neural network. The embodiments are able to compensate for slope differences during both sub-threshold and linear operation of reference transistors.

公开(公告)号：US11423979B2

公开(公告)日：2022-08-23

申请号：US16503355

申请日：2019-07-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stanley Hong ,  Stephen Trinh ,  Anh Ly ,  Han Tran ,  Kha Nguyen ,  Hien Pham

IPC: G11C11/56 ,  G11C11/16 ,  G06N3/06 ,  G11C11/4074 ,  G06F17/16

Abstract: Various embodiments of word line decoders, control gate decoders, bit line decoders, low voltage row decoders, and high voltage row decoders and various types of physical layout designs for non-volatile flash memory arrays in an analog neural system are disclosed. Shared and segmented embodiments of high voltage row decoders are disclosed.

公开(公告)号：US20220231037A1

公开(公告)日：2022-07-21

申请号：US17716950

申请日：2022-04-08

Applicant: Silicon Storage Technology, Inc.

Inventor： Serguei Jourba ,  CATHERINE DECOBERT ,  FENG ZHOU ,  JINHO KIM ,  XIAN LIU ,  NHAN DO

IPC: H01L27/11517 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788

Abstract: A method of forming a device on a substrate with recessed first/third areas relative to a second area by forming a fin in the second area, forming first source/drain regions (with first channel region therebetween) by first/second implantations, forming second source/drain regions in the third area (defining second channel region therebetween) by the second implantation, forming third source/drain regions in the fin (defining third channel region therebetween) by third implantation, forming a floating gate over a first portion of the first channel region by first polysilicon deposition, forming a control gate over the floating gate by second polysilicon deposition, forming an erase gate over the first source region and a device gate over the second channel region by third polysilicon deposition, and forming a word line gate over a second portion of the first channel region and a logic gate over the third channel region by metal deposition.