中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

105 records (took 0.017 seconds)

    Maskless exposure apparatus and multi-head alignment method thereof
    31.
    发明申请
    Maskless exposure apparatus and multi-head alignment method thereof 审中-公开
    无掩模曝光装置及其多头对准方法

    公开(公告)号：US20110149297A1

    公开(公告)日：2011-06-23

    申请号：US12926881

    申请日：2010-12-15

    Applicant: Sang Hyun Park ,  Hi Kuk Lee ,  Sang Don Jang ,  Oui Serg Kim ,  Dong Seok Baek

    Inventor： Sang Hyun Park ,  Hi Kuk Lee ,  Sang Don Jang ,  Oui Serg Kim ,  Dong Seok Baek

    IPC: G01B11/02

    CPC classification number: G01B11/002 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/7085

    Abstract: Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams.

    Abstract translation: 示例性实施例涉及一种无掩模曝光装置，其被配置为使用光调制装置及其多头对准方法来曝光基板上的图案。 根据示例性实施例，光束测量装置测量来自多个头发射的多个光束中的至少三个光束的位置和焦点，根据本发明，光束测量装置可以对距离基准位置的位置偏移和镜片角度进行对准 测量的至少三个光束的位置和焦点误差。

    Exposure apparatus and method to measure beam position and assign address using the same
    32.
    发明申请
    Exposure apparatus and method to measure beam position and assign address using the same 审中-公开
    测量光束位置的曝光设备和方法，并使用该位置分配地址

    公开(公告)号：US20100208222A1

    公开(公告)日：2010-08-19

    申请号：US12656093

    申请日：2010-01-15

    Applicant: Ul Tae Kim ,  Hi Kuk Lee ,  Sang Don Jang ,  Sang Hyun Park ,  Ho Seok Choi

    Inventor： Ul Tae Kim ,  Hi Kuk Lee ,  Sang Don Jang ,  Sang Hyun Park ,  Ho Seok Choi

    IPC: G03B27/42 ,  G01B11/14

    CPC classification number: G03B27/42 ,  G03F7/70291 ,  G03F7/7085

    Abstract: An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam onto an exposed surface, a measurement mask to measure positions of the DMD beams projected onto the exposed surface, a sensor to detect light intensities of the DMD beams measured by the measurement mask, and a controller to determine the positions of the DMD beams according to the detected light intensities.

    Abstract translation: 公开了一种曝光装置和测量光束位置的方法以及使用该装置分配地址。 曝光装置包括具有多个微镜的数字微镜装置（DMD），每个微反射镜调制从光源投影的光并将调制的DMD光束投射到曝光的表面上;测量掩模，用于测量投射到 暴露表面，用于检测由测量掩模测量的DMD光束的光强度的传感器，以及控制器，用于根据检测到的光强度确定DMD光束的位置。

    PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME
    38.
    发明申请
    PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME 有权
    光电组合物，使用该薄膜的薄膜的方法以及使用其制造液晶显示面板的方法

    公开(公告)号：US20070190454A1

    公开(公告)日：2007-08-16

    申请号：US11562714

    申请日：2006-11-22

    Applicant: Hi Kuk LEE ,  Byung Uk KIM ,  Hyoc Min YOUN ,  Joo Pyo YUN ,  Woo Seok JEON

    Inventor： Hi Kuk LEE ,  Byung Uk KIM ,  Hyoc Min YOUN ,  Joo Pyo YUN ,  Woo Seok JEON

    IPC: G03C1/00

    CPC classification number: G03F7/0392 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118

    Abstract: A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.

    Abstract translation: 能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂 为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中， 前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R“ R 1，R 2，R 3和R 3相同或不同，为氢或叔丁基乙烯基醚保护基。

    Exposure apparatus including the exposure head and control method thereof
    40.
    发明授权
    Exposure apparatus including the exposure head and control method thereof 有权
    包括曝光头的曝光装置及其控制方法

    公开(公告)号：US09013674B2

    公开(公告)日：2015-04-21

    申请号：US13185983

    申请日：2011-07-19

    Applicant: Sang Hyun Park ,  Sang Don Jang ,  Hi Kuk Lee

    Inventor： Sang Hyun Park ,  Sang Don Jang ,  Hi Kuk Lee

    IPC: G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70275

    Abstract: According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.

    Abstract translation: 根据示例性实施例，一种操作包括具有多个光束测量装置的平台的曝光装置的方法和具有第一组曝光头和第二组曝光头的曝光头单元包括测量第一曝光的位置 通过移动舞台使第一组曝光头的头部与多个光束测量装置的第一光束测量装置与第一曝光头重合，将第一曝光头的测量位置设置为基准位置，并且测量位置 相对于参考位置的第二组曝光头。

Patent Agency Ranking