Abstract:
A liquid precursor for forming a thin film of ferroelectric metal oxide in an integrated circuit contains metal oxides in excess of the stoichiometrically balanced amount. When the precursor comprises strontium, bismuth, tantalum and niobium for forming strontium bismuth tantalum niobate, the precursor contains excess amounts of at least one of tantalum and niobium. Capacitors containing thin films of layered superlattice material made from a precursor containing excess tantalum and niobium show good polarizability and low percentage imprint after 1010 negative polarization switching pulses at 75° C., and after 109 negative polarization switching pulses at 125° C.
Abstract:
A semiconductor device forming a capacitor through an interlayer insulating layer on a semiconductor substrate on which an integrated circuit is formed. This semiconductor device has an interlayer insulating layer with moisture content of 0.5 g/cm3 or less, which covers the capacitor in one aspect, and has a passivation layer with hydrogen content of 1021 atoms/cm3 or less, which covers the interconnections of the capacitor in other aspect. By thus constituting, deterioration of the capacitor dielectric can be prevented which brings about the electrical reliability of the ferroelectric layer or high dielectric layer.
Abstract translation:一种通过半导体衬底上的层间绝缘层形成电容器的半导体器件,其上形成集成电路。 该半导体装置具有含水量为0.5g / cm 3以下的层间绝缘层,其在一个方面覆盖电容器,并且具有氢含量为1021原子/ cm3以下的钝化层,其覆盖电容器的互连 在其他方面。 通过这样构成,可以防止导致铁电层或高介电层的电可靠性的电容器电介质的劣化。
Abstract:
A semi conductor device forming a capacitor through an interlayer insulating layer on a semiconductor substrate on which an integrated circuit is formed. This semiconductor device has an interlayer insulating layer with moisture content of 0.5 g/cm.sup.3 or less, which covers the capacitor in one aspect, and has a passivation layer with hydrogen content of 10.sup.21 atoms/cm.sup.3 or less, which covers the interconnections of the capacitor in other aspect. By thus constituting, deterioration of the capacitor dielectric can be prevented which brings about the electrical reliability of the ferroelectric layer or high dielectric layer.
Abstract translation:一种半导体器件,其在形成集成电路的半导体衬底上通过层间绝缘层形成电容器。 该半导体装置具有含水量为0.5g / cm 3以下的层间绝缘层,其在一个方面覆盖电容器,并且具有氢含量为1021原子/ cm3以下的钝化层,其覆盖电容器的互连 在其他方面。 通过这样构成,可以防止导致铁电层或高介电层的电可靠性的电容器电介质的劣化。
Abstract:
A temperature distribution measurement apparatus has an infrared array sensor that includes a pyroelectric substrate with infrared array receiving electrodes and electrodes for compensation formed on its front side and opposing electrodes formed on its backside. Also included is an infrared lens to focus incident infrared lights on the array sensor, a chopper to cut off the incident infrared rays intermittently and a rotating part carrying and rotating parts of the apparatus. The detector elements of the infrared array sensor are laid out vertically and parallel with one another. A horizontal temperature distribution is measured by a lateral scanning with the rotating part rotating horizontally while a vertical temperature distribution is measured by driving the chopper in front of the infrared sensor. Thus, a two dimensional temperature distribution of an empty space is measured. The number and the position of persons in the empty space attained from the temperature distribution measurement data is useful for controlling air conditioners.
Abstract:
A working fluid comprising tetrafluoroethane and at least two fluorinated hydrocarbons having a boiling point of not higher than -40.degree. C. under atmospheric pressure selected from the group consisting of methane derivatives and ethane derivatives which consist of one or two carbon atoms, hydrogen atoms and fluorine atoms, which has very small influence on the ozone layer in the stratosphere and is suitable as a substitute working fluid for chlorodifluoromethane.
Abstract:
A working fluid comprising trifluoromethane, chlorodifluoromethane and at least one halogenated ethane which consists of two carbon atoms, 1 or 2 hydrogen atoms, 0 to 2 chlorine atoms and balance of fluorine atoms and has a boiling point of not lower than -30.degree. C. under atmospheric pressure, which has very small influence on the ozone layer in the stratosphere and is suitable as a substitute working fluid for dichlorodifluoromethane.
Abstract:
Provided is a current steering element that can prevent write didturb even when an electrical pulse with different polarities is applied and that can cause a large current to flow through a variable resistance element. The current steering element includes a first electrode (32), a second electrode (31), and a current steering layer (33). The current steering layer (33) comprises SiNx (where 0
Abstract:
A current steering element which can prevent occurrence of write disturb even when electric pulses having different polarities are applied and can cause large current to flow through a variable resistance element, and with which data can be written without problem. In a storage element (3) including: a variable resistance element (1) whose electric resistance value changes in response to application of electric pulses having a positive polarity and a negative polarity and which maintains the changed electric resistance value; and the current steering element (2) that steers current flowing through the variable resistance element (1) when the electric pulses are applied, the current steering element (2) includes: a first electrode (32); a second electrode (31); and a current steering layer (33) interposed between the first electrode (32) and the second electrode (31). When the current steering layer (33) includes SiNx (0
Abstract:
In a current rectifying element (10), a barrier height φA of a center region (14) of a barrier layer (11) in a thickness direction thereof sandwiched between a first electrode layer (12) and a second electrode layer (13) is formed to be larger than a barrier height φB of a region in the vicinity of an interface (17) between the barrier layer (11) and the first electrode layer (12) and an interface (17) between the barrier layer (11) and the second electrode layer (13). The barrier layer (11) has, for example, a triple-layer structure of barrier layers (11a), (11b) and (11c). The barrier layers (11a), (11b) and (11c) are, for example, formed by SiN layers of SiNx2, SiNx1, and SiNx1 (X1
Abstract:
Disclosed is a memory device provided with a plurality of memory cells and a lead-out line (12) shared among the memory cells. Each memory cell is provided with a transistor (6) formed above a substrate (1) and a variable resistance element (10) having a lower electrode (7), an upper electrode (9) that comprises a noble metal, and a variable resistance layer (8) disposed between the lower electrode (7) and the upper electrode (9). The resistance value of the variable resistance layer (8) changes reversibly in response to electric pulses that go through the transistor (6) and are applied between the lower electrode (7) and the upper electrode (9). The lead-out line (12) is in direct contact with the upper electrodes (9) of the memory cells.