公开(公告)号：US5223719A

公开(公告)日：1993-06-29

申请号：US724338

申请日：1991-07-05

申请人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

发明人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31761 ,  H01J2237/31776

摘要： A charged particle beam mask and apparatus and method of using the same employing a mask that includes a substrate and a plurality of substantially rectangular beam passing sections arranged in parallel and to have a trapezoidal shape. In addition, the masks having a matrix of irradiation areas formed thereon where each irradiation area has a matrix of block patterns, are aligned and selectively irradiated to form a desired pattern on an object.

摘要翻译： 一种带电粒子束掩模及其采用掩模的装置及方法，该掩模包括基板和平行排列并具有梯形形状的多个大致矩形的光束通过部分。 此外，在其上形成有照射区域具有块图案的矩阵的照射区域的矩阵的掩模被对准并选择性地照射以在物体上形成期望的图案。

公开(公告)号：US5194741A

公开(公告)日：1993-03-16

申请号：US855108

申请日：1992-03-20

申请人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Junko Hatta ,  Yasushi Takahashi

发明人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Junko Hatta ,  Yasushi Takahashi

IPC分类号： H01J37/302

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31761

摘要： A method for writing a pattern on a surface of an object by a focused electron beam with a minimized distortion of the electron beam comprises the steps of dividing the surface of the object into a plurality of parallel bands, moving the object in a direction perpendicular to the bands with a predetermined speed, achieving an exposure of the device pattern on an individual, band by band basis while moving the object with the predetermined speed. The predetermine speed is optimized with respect to an exposure interval representing a time interval in which the exposure of the band is possible. In order to minimize the distortion of the electron beam, the timing of the exposure of each band in each exposure interval is adjusted by (a) detecting a critical timing pattern that determines the optimized moving speed, (b) shifting the corresponding timing of exposure for each band, starting from the band immediately before the critical timing pattern and proceeding in a direction to the first band, such that the timing of exposure is shifted toward the center of the exposure interval to the extent that the exposure of any given band does not overlap the exposure of the next preceding band, and (c) repeating the step (b) for each of the remaining bands of the plurality of bands until the respective timing of exposure of each band reaches the center of the corresponding exposure interval.

摘要翻译： 通过电子束失真最小化的聚焦电子束将图案写入物体的表面的方法包括以下步骤：将物体的表面划分为多个平行带，使物体沿垂直于 具有预定速度的频带，在以预定速度移动对象的同时，逐个地逐个地实现装置图案的曝光。 相对于表示可能的频带的曝光的时间间隔的曝光间隔优化预定速度。 为了最小化电子束的失真，通过（a）检测确定优化的移动速度的临界定时模式来调整每个曝光间隔中每个频带的曝光定时，（b）移动相应的曝光时间 对于每个频带，从紧临临时定时模式之前的频带开始，并且沿着朝向第一频带的方向前进，使得曝光定时朝向曝光间隔的中心移动到任何给定频带的曝光的程度 不与下一个前一个频带的曝光重叠，以及（c）对于多个频带中的每个剩余频带重复步骤（b），直到各频带的各个曝光时间到达相应的曝光间隔的中心。

公开(公告)号：US5130547A

公开(公告)日：1992-07-14

申请号：US616870

申请日：1990-11-21

申请人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Shunsuke Fueki ,  Akio Yamada ,  Hiroshi Yasuda

发明人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Shunsuke Fueki ,  Akio Yamada ,  Hiroshi Yasuda

IPC分类号： G05B19/408 ,  H01J37/302

CPC分类号： H01J37/3026 ,  G05B19/408 ,  G05B2219/35567

摘要： A charged-particle beam exposure method which has a stencil mask formed with a several mask patterns, deflects a beam of charged particles to a mask pattern selected from among the several mask patterns and shapes the beam, and performs wafer exposure by deflecting the shaped beam and illuminating the same onto a wafer. The improvement comprises the steps of (a) holding mask information data, which are information for deflecting the charged particle beam to the selected mask pattern and in which an index is provided every mask pattern of the stencil mask, in a mask memory, (b) holding pattern exposure data, which are information for designating a mask pattern by the use of the index of each mask pattern held in the mask memory and for deflecting the charged particle beam shaped with the designated mask pattern to a predetermined region on the wafer, in a data memory; and (c) deflecting the charged particle beam of the stencil mask and shaping the beam by the use of the mask information data outputted from the mask memory in response to the index designated in the pattern exposure data.

公开(公告)号：US08281794B2

公开(公告)日：2012-10-09

申请号：US12799675

申请日：2010-04-29

申请人： Yoshihisa Oae ,  Youichi Shimizu

发明人： Yoshihisa Oae ,  Youichi Shimizu

IPC分类号： B08B3/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70916 ,  H01J37/3174 ,  H01J37/32862 ,  H01L21/67028

摘要： A stage device for use in a vacuum includes a frame-shaped movable stage having a sample mounting surface, a fixed stage surrounded by the movable stage, an air bearing to float the movable stage by supplying gas to a gap between the stages, a pressure regulator to regulate a pressure of the gas, a differential pumping portion to prevent the gas from flowing outside the gap, and a controller. The controller moves the movable stage within a predetermined range under a pressure in the differential pumping portion set equal to that for movable stage in use when setting a floating height of the movable stage lower than that for movable stage in use, and under the pressure in the differential pumping portion set higher than that for movable stage in use when setting the floating height of the movable stage equal to that for movable stage in use.

摘要翻译： 用于真空的舞台装置包括：具有样品安装表面的框架式可移动台，由可动台环绕的固定台，通过向台架之间的间隙供应气体来浮动可移动台的空气轴承，压力 用于调节气体的压力的调节器，用于防止气体流过间隙的差动泵送部分和控制器。 当将可移动平台的浮动高度设定得比使用中的可移动平台的浮动高度低时，控制器将可移动平台移动到与使用中的可移动平台相同的差动泵送部分的压力下的预定范围内，并且在 当使可移动台的浮动高度等于在使用中的可移动台的浮动高度时，差分泵送部分设定得高于使用中的可动台的差动泵送部分。

公开(公告)号：US20120118325A1

公开(公告)日：2012-05-17

申请号：US13340251

申请日：2011-12-29

申请人： Yoshihisa Oae ,  Youichi Shimizu

发明人： Yoshihisa Oae ,  Youichi Shimizu

IPC分类号： B08B5/02 ,  B08B7/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70916 ,  H01J37/3174 ,  H01J37/32862 ,  H01L21/67028

摘要： A stage device for use in a vacuum includes a frame-shaped movable stage having a sample mounting surface, a fixed stage surrounded by the movable stage, an air bearing to float the movable stage by supplying gas to a gap between the stages, a pressure regulator to regulate a pressure of the gas, a differential pumping portion to prevent the gas from flowing outside the gap, and a controller. The controller moves the movable stage within a predetermined range under a pressure in the differential pumping portion set equal to that for movable stage in use when setting a floating height of the movable stage lower than that for movable stage in use, and under the pressure in the differential pumping portion set higher than that for movable stage in use when setting the floating height of the movable stage equal to that for movable stage in use.

摘要翻译： 用于真空的舞台装置包括：具有样品安装表面的框架式可移动台，由可动台环绕的固定台，通过向台架之间的间隙供应气体来浮动可移动台的空气轴承，压力 用于调节气体的压力的调节器，用于防止气体流过间隙的差动泵送部分和控制器。 当将可移动平台的浮动高度设定得比使用中的可移动平台的浮动高度低时，控制器将可移动平台移动到与使用中的可移动平台相同的差动泵送部分的压力下的预定范围内，并且在 当使可移动台的浮动高度等于在使用中的可移动台的浮动高度时，差分泵送部分设定得高于使用中的可动台的差动泵送部分。

公开(公告)号：US06646275B2

公开(公告)日：2003-11-11

申请号：US10238759

申请日：2002-09-11

申请人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

发明人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

IPC分类号： H01J3730

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/30416 ,  H01J2237/31762 ,  H01L2223/54466

摘要： A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

摘要翻译： 带电粒子束曝光方法包括以下步骤：创建指示要曝光的图案的点阵图形数据，将点图案数据存储在具有第一存取速度的第一存储装置中，将点图案数据从第一存储装置传送到 第二存储装置具有第二较高访问速度，从第二存储装置读出点阵图形数据，并且响应于通过消隐从第二存储装置读出的点图形数据产生多个带电粒子束 孔径阵列，其中消隐孔阵列包括多个孔，每个孔响应于点图案数据而导致与孔相关的改变的粒子束的导通和关断。

公开(公告)号：US6064807A

公开(公告)日：2000-05-16

申请号：US653121

申请日：1996-05-24

申请人： Soichiro Arai ,  Junichi Kai ,  Hiroshi Yasuda ,  Shunsuke Hueki ,  Yoshihisa Oae

发明人： Soichiro Arai ,  Junichi Kai ,  Hiroshi Yasuda ,  Shunsuke Hueki ,  Yoshihisa Oae

IPC分类号： G21K5/04 ,  G06F17/10 ,  G21C5/00 ,  H01L21/027

CPC分类号： H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/20221

摘要： The present invention relates to an exposure method of a multi-beam type in which a stage mounting a sample to be exposed is continuously moved in a first direction, and charged-particle beams are controlled so as to form a desired beam shape as a whole, and in which a pattern is formed on the sample by deflecting the charged-particle beams by a main deflector and a sub deflector. Patterns to be drawn are divided into pattern data on a cell stripe basis which corresponds to an area which can be exposed when the sub deflector scans the charged-particle beams one time. The pattern data on the cell stripe basis is stored into a memory. Then, position data indicative of cell stripes is stored, in an exposure sequence, together with address information concerning the memory in which the pattern data is stored. The deflection amount data relating to the main deflector and the sub deflector is calculated from the position data. Patterns are drawn on the wafer by using the pattern data and the deflection amount data.

摘要翻译： 本发明涉及一种多光束类型的曝光方法，其中安装要暴露的样品的载物台在第一方向上连续移动，并且带电粒子束被整体地形成期望的波束形状 ，并且其中通过由主偏转器和副偏转器偏转带电粒子束而在样品上形成图案。 要绘制的图案被划分为细胞条纹基础上的图形数据，其对应于当次偏转器一次扫描带电粒子束时可以暴露的区域。 基于单元条带的图案数据被存储到存储器中。 然后，指示单元条纹的位置数据与曝光图案数据的存储器的地址信息一起被存储在曝光序列中。 根据位置数据计算与主偏转器和副偏转器有关的偏转量数据。 通过使用图案数据和偏转量数据在晶片上绘制图案。

公开(公告)号：US5920077A

公开(公告)日：1999-07-06

申请号：US22881

申请日：1998-02-12

申请人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

发明人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

IPC分类号： H01J37/147 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/30416 ,  H01J2237/31762 ,  H01L2223/54466

摘要： A charged particle beam exposure method including the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device; and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

摘要翻译： 一种带电粒子束曝光方法，包括以下步骤：产生指示要曝光的图案的点阵图形数据，存储指示要曝光的图案的点，将点图案数据存储在具有第一存取速度的第一存储装置中，传送 从第一存储装置到具有第二较高访问速度的第二存储装置的点图形数据从第二存储装置读出点图案数据; 以及响应于通过消隐孔径阵列从第二存储装置读出的点图形数据产生多个带电粒子束。 消隐孔径阵列包括多个孔，每个孔响应于点图案数据而导致与孔相关的改变的粒子束的导通和关断。

公开(公告)号：US5841145A

公开(公告)日：1998-11-24

申请号：US610350

申请日：1996-03-04

申请人： Takamasa Satoh ,  Yoshihisa Oae ,  Soichiro Arai ,  Kenichi Miyazawa ,  Hiroshi Yasuda ,  Manabu Ohno ,  Hitoshi Watanabe ,  Junichi Kai ,  Tomohiko Abe ,  Akio Yamada ,  Yasushi Takahashi

发明人： Takamasa Satoh ,  Yoshihisa Oae ,  Soichiro Arai ,  Kenichi Miyazawa ,  Hiroshi Yasuda ,  Manabu Ohno ,  Hitoshi Watanabe ,  Junichi Kai ,  Tomohiko Abe ,  Akio Yamada ,  Yasushi Takahashi

IPC分类号： H01J37/302

CPC分类号： H01J37/3023 ,  H01J2237/3175

摘要： By using a blanking aperture array BAA, the density of the bit map data in the portions where adjacent areas are linked is decreased toward the outside. On the lower surface of the holder of the BAA chip, a ball grid array wired to blanking electrodes is formed, to be pressed in contact against pads on a wiring base board. The registered bit map data for an isosceles right triangle are read out from address A=A0+�RA.multidot.i! (A0 and i are integers, � ! is an operator for integerizing), masked, and then shifted by bits to be deformed. From registered bit map data for proximity effect correction, the area which corresponds to the size of the object of correction and the required degree of proximity affect correction is extracted, and logic operation with the bit map data of the object of correction is performed to achieve proximity affect correction. Before figures data are expanded into bit map, a checksum is determined in units of bit map data corresponding to the range of one session of scanning over which continuous exposure is possible. A sine wave voltage is provided to an electrostatic deflector and during a one-shot exposure period, an electron beam is caused to scan for an integer number of times on a block of a mask and the positional misalignment of the electron beam at the lower aperture stop is corrected.

摘要翻译： 通过使用消隐孔径阵列BAA，相邻区域连接的部分中的位图数据的密度朝向外部减小。 在BAA芯片的保持器的下表面上形成布线到消隐电极的球栅阵列，以与接线基板上的焊盘压接。 从地址A = A0 + [RAxi]（A0和i是整数，[]是整数化的运算符）读出等腰直角三角形的注册位图数据，被屏蔽，然后移位以变形。 从用于邻近效应校正的注册位图数据中，提取对应于校正对象的大小的区域和所需的邻近度影响校正程度，并且执行校正对象的位图数据的逻辑运算以实现 近距离影响校正。 在将图形数据扩展为位图之前，以对应于可能进行连续曝光的一次扫描会话的范围的位图数据为单位确定校验和。 向静电偏转器提供正弦波电压，并且在单次曝光期间，使电子束在掩模块上扫描整数次，并且使电子束在下孔处的位置偏移 停止更正。

公开(公告)号：US5719402A

公开(公告)日：1998-02-17

申请号：US626906

申请日：1996-04-04

申请人： Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

发明人： Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

IPC分类号： H01J37/153 ,  H01J37/302 ,  H01J37/317 ,  H01J37/12 ,  H01J37/141

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/1504

摘要： To improve the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector. A glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier is anticipated and is cancelled out with a correction waveform. After the output of the D/A converter has settled, this output is sample-held and the step change is interpolated with a smoothing circuit. The deflection area is increased by positioning an electrostatic deflector offset around the optical axis relative to another electrostatic deflector, and the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turns. The alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area. In order to correct the astigmatism of the electromagnetic lens, two stages of coils are provided and an electric current corresponding to the quantity of deflection is supplied to the coils.

摘要翻译： 为了提高曝光系统的吞吐量，通过放大器和偏转器之间的开关电阻来减小放大器的输出中的阶跃变化期间的设定时间。 预期在放大器的前级的D / A转换器的输出的阶跃变化期间产生的毛刺波形，并用校正波形抵消。 在D / A转换器的输出稳定之后，该输出被采样保持，并且用平滑电路内插阶跃变化。 通过相对于另一个静电偏转器定位围绕光轴的静电偏转器偏移来增加偏转区域，并且通过添加一匝或两匝的辅助偏转线圈来改善主偏转的响应速度。 通过组合晶片区域和芯片区域中的坐标转换来减少对准时间。 为了校正电磁透镜的散光，设置两级线圈，并将与偏转量相对应的电流供给到线圈。