-
公开(公告)号：US09429853B2
公开(公告)日：2016-08-30
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.
Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。
-
公开(公告)号：US20160011522A1
公开(公告)日：2016-01-14
申请号：US14858885
申请日：2015-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70733
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
-
公开(公告)号：US20140300883A1
公开(公告)日：2014-10-09
申请号：US14273335
申请日：2014-05-08
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
-
公开(公告)号：US12072635B2
公开(公告)日：2024-08-27
申请号：US17531953
申请日：2021-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michael Christiaan Van Der Wekken
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70733
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
-
公开(公告)号：US11143968B2
公开(公告)日：2021-10-12
申请号：US15196120
申请日：2016-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
-
Patent Agency Ranking
公开(公告)号：US10191396B2
公开(公告)日：2019-01-29
申请号：US15316526
申请日：2015-05-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Peter Paul Hempenius , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Frits Van Der Meulen
Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.
-
37.发明授权公开(公告)号：US09964865B2
公开(公告)日：2018-05-08
申请号：US15142671
申请日：2016-04-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
CPC classification number: G03F7/70775 , G03F7/70341 , G03F7/70725
Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
-
公开(公告)号：US09904185B2
公开(公告)日：2018-02-27
申请号：US15333044
申请日：2016-10-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
公开(公告)号：US09857695B2
公开(公告)日：2018-01-02
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
-
40.发明授权公开(公告)号：US09606429B2
公开(公告)日：2017-03-28
申请号：US14498883
申请日：2014-09-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
-
-
-
-
-
-
-
-
-
Search Results
42
records
(took 0.026 seconds)
