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31.发明授权Environmental system including vacuum scavenge for an immersion lithography apparatus 有权包括用于浸没式光刻设备的真空清除的环境系统公开(公告)号：US08089610B2
公开(公告)日：2012-01-03
申请号：US11701378
申请日：2007-02-02
申请人： Andrew J. Hazelton , Michael Sogard
发明人： Andrew J. Hazelton , Michael Sogard
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.
摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构，该空间的横截面积小于基板的面积。 液体限制结构包括：第一入口，用于将图案化的光束投射到该空间上的液体供给液体经过投影系统之前的第一出口以去除液体，形成在该结构的表面上的第二入口 相对于投影系统的光轴径向向外设置有供给气体的空间的面以及形成在该表面上并位于径向外侧的第二出口，该第二出口相对于基板的表面 到第二入口的投影系统的光轴，以除去气体。
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公开(公告)号：US07932989B2
公开(公告)日：2011-04-26
申请号：US11808850
申请日：2007-06-13
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译： 用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。 这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。 流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式 为了方便浸没光刻。
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公开(公告)号：US07821615B2
公开(公告)日：2010-10-26
申请号：US11808850
申请日：2007-06-13
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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公开(公告)号：US20080165450A1
公开(公告)日：2008-07-10
申请号：US12050669
申请日：2008-03-18
IPC分类号： G11B5/17
CPC分类号： H02K41/0356 , H02K2201/18
摘要： Methods and apparatus for increasing the efficiency of a voice coil motor (VCM) are disclosed. According to one aspect of the present invention, a cylindrical and radially symmetric VCM includes a plurality of sets of magnets, and a single coil. The plurality of sets of the magnets are each arranged in an array configuration, and cooperate to form a magnetic field. The coil receives current and has a plurality of windings. A first space is defined within the coil, and the plurality of sets of the magnets are arranged such that a first set of the magnets is positioned within the first space and a second set of the magnets is positioned external to the coil.
摘要翻译： 公开了提高音圈电机（VCM）效率的方法和装置。 根据本发明的一个方面，圆柱形和径向对称的VCM包括多组磁体和单个线圈。 多组磁体各配置成阵列构造，并配合形成磁场。 线圈接收电流并具有多个绕组。 第一空间被限定在线圈内，并且多组磁体被布置成使得第一组磁体位于第一空间内，而第二组磁体位于线圈的外部。
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公开(公告)号：US07355308B2
公开(公告)日：2008-04-08
申请号：US10646848
申请日：2003-08-21
申请人： Andrew J. Hazelton
发明人： Andrew J. Hazelton
IPC分类号： H02K41/00
CPC分类号： G03F7/70875 , G03F7/70758 , H02K9/005 , H02K9/19 , H02K41/03 , H02K2201/18
摘要： A circulation system (330) for a mover (328) includes a fluid source (360) that directs a first fluid (356) into a first inlet (364A) of the mover (328) and a second fluid (358) into a second inlet (366A) of the mover (328). In one embodiment, a temperature of the second fluid (358) at the second inlet (366A) is different than a temperature of the first fluid (356) at the first inlet (364A). For example, in one embodiment, the temperature of the second fluid (358) at the second inlet (366A) is approximately at the boiling temperature of the second fluid (358). In an alternative embodiment, the mover (428) includes a heat transferer (469) that transfers heat from a second passageway (466).
摘要翻译： 用于移动器（328）的循环系统（330）包括将第一流体（356）引导到移动器（328）的第一入口（364A）和第二流体（358）中的流体源（360） 动子（328）的第二入口（366A）。 在一个实施例中，第二入口（366A）处的第二流体（358）的温度不同于第一入口（364A）处的第一流体（356）的温度。 例如，在一个实施例中，第二入口（366A）处的第二流体（358）的温度大约处于第二流体（358）的沸腾温度。 在替代实施例中，动子（428）包括从第二通道（466）传递热量的热转运器（469）。
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公开(公告)号：US07288859B2
公开(公告)日：2007-10-30
申请号：US10769668
申请日：2004-01-30
申请人： Andrew J. Hazelton
发明人： Andrew J. Hazelton
IPC分类号： H02K41/00
CPC分类号： G03F7/70816 , G03F7/70716 , G03F7/70841 , H01J37/20
摘要： Methods and apparatus for enabling a stage apparatus to scan an object within a vacuum environment associated with an extreme ultraviolet lithography system are disclosed. According to one aspect of the present invention, a stage apparatus that is suitable for operation in a vacuum environment includes a coarse stage assembly that include a coarse stage and at least one air bearing that is vacuum-compatible. The stage apparatus also includes a fine stage assembly which has a fine stage that is arranged substantially adjacent to the coarse stage. The fine stage is arranged to be positioned relative to the coarse stage using electromagnetic energy.
摘要翻译： 公开了一种用于使舞台装置能够在与极紫外光刻系统相关联的真空环境内扫描物体的方法和装置。 根据本发明的一个方面，一种适于在真空环境中操作的平台装置包括粗级组件，其包括粗级和至少一个真空兼容的空气轴承。 舞台装置还包括精细舞台组件，其具有基本上邻近粗舞台布置的精细舞台。 精细级被布置为使用电磁能量相对于粗糙级定位。
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公开(公告)号：US07283210B2
公开(公告)日：2007-10-16
申请号：US11088210
申请日：2005-03-22
申请人： Andrew J. Hazelton
发明人： Andrew J. Hazelton
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308 , G03F7/70766 , G03F7/70833
摘要： An apparatus for adjusting image formation includes a first stage, a second stage, an optical element, a counterweight, and an actuator. The first stage is operable to project an original image. A final image corresponding to the original image is formed on the second stage. The optical element is movable with at least one degree of freedom operable to shift a position of the final image. The counterweight is movable with the at least one degree of freedom. The actuator is operable to actuate the optical element and the counterweight in opposite directions.
摘要翻译： 用于调整图像形成的装置包括第一级，第二级，光学元件，配重和致动器。 第一阶段可用于投影原始图像。 在第二阶段形成与原始图像对应的最终图像。 光学元件可移动至少一个自由度，以移动最终图像的位置。 配重可以至少一个自由度移动。 致动器可操作以相反方向致动光学元件和配重。
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公开(公告)号：US07095482B2
公开(公告)日：2006-08-22
申请号：US10186876
申请日：2002-06-28
CPC分类号： F16F15/0232 , F16F9/02
摘要： A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the first system (202) supports the majority of the first assembly (206) relative to the second assembly (208) and the second system (204) adjusts for a change in the location of the center of gravity of the first assembly (206). Further, the second system (204) can be used to compensate for fluctuations in the atmospheric pressure near the vibration isolator (200).
摘要翻译： 用于将第一组件（206）与来自第二组件（208）的振动隔离的隔振器（200）包括耦合到第一系统（202）的第一系统（202）和第二系统（204）。 在一个实施例中，第一系统（202）相对于第二组件（208）支撑大部分第一组件（206），并且第二系统（204）调节第一组件（206）的重心位置的变化 组件（206）。 此外，第二系统（204）可以用于补偿隔振器（200）附近的大气压力的波动。
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公开(公告)号：US06788385B2
公开(公告)日：2004-09-07
申请号：US10134607
申请日：2002-04-30
IPC分类号： G03B2742
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/70766 , G03F7/709
摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.
摘要翻译： 在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动 方向由第二X轴电机同时由第二引导杆一侧支撑。 第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。 在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部 与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。 第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。 舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。
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公开(公告)号：US06757053B1
公开(公告)日：2004-06-29
申请号：US09714747
申请日：2000-11-16
申请人： Andrew J. Hazelton , Mike Binnard
发明人： Andrew J. Hazelton , Mike Binnard
IPC分类号： G03B2758
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70725 , G03F7/70766
摘要： A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction mass assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction mass assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction mass assembly (18) reduces the reaction forces created by the stage mover assembly (16) in three degrees of freedom that are transferred to the stage base (12). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).
摘要翻译： 本文提供了用于移动和定位装置（26）的平台组件（10）。 舞台组件（10）包括舞台底座（12），舞台（14），舞台推动器组件（16）和反作用组件（18）。 台架动子组件（16）使台架（14）沿着X轴线并相对于舞台底座（12）沿着Y轴移动。 反应质量组件（18）联接到载物台移动器组件（16）。 独特地，反应物料组件（18）以三个自由度将由载物台移动器组件（16）产生的反作用力减小到传递到载物台基座（12）上。 通过这种设计，平台移动器组件（16）对舞台底座（12）的位置的影响较小。 这些特征允许通过平台组件（10）更准确地定位设备（26）并且使台架组件（10）具有更好的性能。
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