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    Ion extraction assembly having variable electrode thickness for beam uniformity control
    32.
    发明授权
    Ion extraction assembly having variable electrode thickness for beam uniformity control 有权

    公开(公告)号：US12125680B2

    公开(公告)日：2024-10-22

    申请号：US17512310

    申请日：2021-10-27

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Alan V. Hayes ,  Dmitry Lubomirsky

    IPC: H01J37/32

    CPC classification number: H01J37/32339 ,  H01J2237/083

    Abstract: An ion extraction assembly for an ion source is provided. The ion extraction assembly may include a plurality of electrodes, wherein the plurality of electrodes comprises: a plasma-facing electrode, arranged for coupling to a plasma chamber; and a substrate-facing electrode, disposed outside of the plasma-facing electrode. The at least one electrode of the plurality of electrodes may include a grid structure, defining a plurality of holes, wherein the at least one electrode has a non-uniform thickness, wherein a first grid thickness in a middle region of the at least one electrode is different than a second grid thickness, in an outer region of the at least one electrode.

    Device To Control Uniformity Of Extraction Ion Beam
    36.
    发明申请
    Device To Control Uniformity Of Extraction Ion Beam 有权

    公开(公告)号：US20230082224A1

    公开(公告)日：2023-03-16

    申请号：US17473101

    申请日：2021-09-13

    Applicant: Applied Materials, Inc.

    Inventor： Jay T. Scheuer ,  Graham Wright ,  Peter F. Kurunczi ,  Alexandre Likhanskii

    IPC: H01J37/08

    Abstract: An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves as a sink for free electrons and ions. This causes a reduction in plasma density near the protrusion, and may improve the uniformity of the ribbon ion beam that is extracted from the ion source by modifying the beam current near the protrusion. The shape of the protrusion may be modified to achieve the desired uniformity. The protrusion may also be utilized with a cylindrical ion source. In certain embodiments, the protrusion is created by a plurality of mechanically adjustable protrusion elements.

    Electrodynamic mass analysis with RF biased ion source
    37.
    发明授权
    Electrodynamic mass analysis with RF biased ion source 有权

    公开(公告)号：US11587778B2

    公开(公告)日：2023-02-21

    申请号：US17088443

    申请日：2020-11-03

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Joseph C. Olson ,  Frank Sinclair ,  Peter F. Kurunczi

    IPC: H01J49/36 ,  H01J49/06 ,  H01J37/317 ,  H01J49/10

    Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.

    ELECTRODYNAMIC MASS ANALYSIS WITH RF BIASED ION SOURCE
    38.
    发明申请
    ELECTRODYNAMIC MASS ANALYSIS WITH RF BIASED ION SOURCE 有权

    公开(公告)号：US20220139691A1

    公开(公告)日：2022-05-05

    申请号：US17088443

    申请日：2020-11-03

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Joseph C. Olson ,  Frank Sinclair ,  Peter F. Kurunczi

    IPC: H01J49/36 ,  H01J49/10 ,  H01J49/06

    Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.

    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
    39.
    发明申请
    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION 有权

    公开(公告)号：US20210183609A1

    公开(公告)日：2021-06-17

    申请号：US16714097

    申请日：2019-12-13

    Applicant: APPLIED Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Antonella Cucchetti ,  Eric D. Hermanson ,  Frank Sinclair ,  Jay T. Scheuer ,  Robert C. Lindberg

    IPC: H01J37/12 ,  H01J37/24 ,  H01J37/32 ,  H01J37/30 ,  H01L21/425

    Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.

    APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FILTER
    40.
    发明申请
    APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FILTER 有权

    公开(公告)号：US20210159043A1

    公开(公告)日：2021-05-27

    申请号：US17167791

    申请日：2021-02-04

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

    IPC: H01J37/08 ,  H01J37/12 ,  H01J37/147 ,  H01J37/317

    Abstract: An apparatus is provided. The apparatus may include a main chamber, an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber; an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween, and an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit tunnel. The electrode assembly may include an upper electrode, disposed on a first side of the beam path, and a plurality of lower electrodes, disposed on a second side of the beam path, the plurality of lower electrodes comprising at least three electrodes.

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