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    Mismatched Optics for Angular Control of Extracted Ion Beam
    1.
    发明申请
    Mismatched Optics for Angular Control of Extracted Ion Beam 有权

    公开(公告)号：US20230131410A1

    公开(公告)日：2023-04-27

    申请号：US17510996

    申请日：2021-10-26

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Jay T. Scheuer ,  Sudhakar Mahalingam ,  Nevin Clay

    IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05

    Abstract: An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.

    Device To Control Uniformity Of Extraction Ion Beam
    9.
    发明申请
    Device To Control Uniformity Of Extraction Ion Beam 有权

    公开(公告)号：US20230082224A1

    公开(公告)日：2023-03-16

    申请号：US17473101

    申请日：2021-09-13

    Applicant: Applied Materials, Inc.

    Inventor： Jay T. Scheuer ,  Graham Wright ,  Peter F. Kurunczi ,  Alexandre Likhanskii

    IPC: H01J37/08

    Abstract: An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves as a sink for free electrons and ions. This causes a reduction in plasma density near the protrusion, and may improve the uniformity of the ribbon ion beam that is extracted from the ion source by modifying the beam current near the protrusion. The shape of the protrusion may be modified to achieve the desired uniformity. The protrusion may also be utilized with a cylindrical ion source. In certain embodiments, the protrusion is created by a plurality of mechanically adjustable protrusion elements.

    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
    10.
    发明申请
    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION 有权

    公开(公告)号：US20210183609A1

    公开(公告)日：2021-06-17

    申请号：US16714097

    申请日：2019-12-13

    Applicant: APPLIED Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Antonella Cucchetti ,  Eric D. Hermanson ,  Frank Sinclair ,  Jay T. Scheuer ,  Robert C. Lindberg

    IPC: H01J37/12 ,  H01J37/24 ,  H01J37/32 ,  H01J37/30 ,  H01L21/425

    Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.

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