公开(公告)号：US20050041233A1

公开(公告)日：2005-02-24

申请号：US10880606

申请日：2004-07-01

Applicant: Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peeters

Inventor： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peeters

IPC: F16F15/02 ,  G03B27/42 ,  G03F7/20 ,  H01L21/027

CPC classification number: F16F7/1005 ,  G03F7/709

Abstract: A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

Abstract translation: 提出了一种光刻设备，其中消除了由设备内的加速度施加在基架BF上的反作用力引起的振动，而不需要复杂的定位系统和几个平衡块。 这是通过使用前馈控制来实现的，其基于对基板台和设备内的其它部件的运动和加速度的了解，将使用致动器的补偿力施加到基架上。

公开(公告)号：US09933707B2

公开(公告)日：2018-04-03

申请号：US13279368

申请日：2011-10-24

Applicant: Yim-Bun Patrick Kwan ,  Erik Loopstra

Inventor： Yim-Bun Patrick Kwan ,  Erik Loopstra

IPC: G02B7/02 ,  G03F7/20 ,  G02B5/00 ,  G02B13/14

CPC classification number: G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

Abstract: An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

公开(公告)号：US08072700B2

公开(公告)日：2011-12-06

申请号：US10595469

申请日：2003-12-18

Applicant: Yim-Bun Patrick Kwan ,  Erik Loopstra

Inventor： Yim-Bun Patrick Kwan ,  Erik Loopstra

IPC: G02B7/02

CPC classification number: G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

Abstract: An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

Abstract translation: 一种光学设备包括一个交换机构和一个照明系统或投影物镜的光学组件。 光学组件的多个光学元件中的至少一个选自可从交换机构中选择的多个光学组件中的至少一个，其有助于在光束路径中彼此交换。 为了减少振动从互换机构到光学组件的传播，互换机构安装在基本上与壳体动态分离的结构上，并且所选择的可选择的光学元件位于与该壳体分离的操作位置 交换机制。

公开(公告)号：US20070268471A1

公开(公告)日：2007-11-22

申请号：US11710408

申请日：2007-02-26

Applicant: Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20070188724A1

公开(公告)日：2007-08-16

申请号：US11353249

申请日：2006-02-14

Applicant: Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

Inventor： Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

IPC: G03B27/42

CPC classification number: G03F7/70716 ,  G03F7/70358 ,  G03F7/707

Abstract: A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Abstract translation: 光刻设备包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 该支撑件包括一个力促动器装置，以在支撑件的移动方向上向图案形成装置施加力。 力致动器装置包括可枢转地围绕枢转轴线并由此连接到支撑件的可移动部件。 可移动部分在支撑件的运动方向上相对于枢转轴线基本平衡。 力致动器装置还包括致动器，其经由可移动部件施加力到图案形成装置上，以至少部分地补偿信息或由于支撑件沿着移动方向的加速而导致的滑动的风险。

公开(公告)号：US20070178704A1

公开(公告)日：2007-08-02

申请号：US11343219

申请日：2006-01-31

Applicant: Erik Loopstra ,  Bernardus Luttikhuis ,  Herman Van Der Schoot ,  Fransicus Jacobs

Inventor： Erik Loopstra ,  Bernardus Luttikhuis ,  Herman Van Der Schoot ,  Fransicus Jacobs

IPC: H01L21/302

CPC classification number: G03F7/707

Abstract: The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.

Abstract translation: 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括 夹持装置，夹持装置构造成将图案形成装置夹在顶侧。

公开(公告)号：US20070146678A1

公开(公告)日：2007-06-28

申请号：US11316359

申请日：2005-12-23

Applicant: Erik Loopstra ,  Bernardus Antonius Luttikhuis

Inventor： Erik Loopstra ,  Bernardus Antonius Luttikhuis

IPC: G03B27/58

CPC classification number: G03F7/70741 ,  G03F7/70733

Abstract: A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.

Abstract translation: 光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影 图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。 交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。 保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间被保持在可更换物体支撑件中。 可交换对象支持与每个保持装置交换可交换对象。

公开(公告)号：US20070132979A1

公开(公告)日：2007-06-14

申请号：US11482122

申请日：2006-07-07

Applicant: Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

Inventor： Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC: G03B27/72

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20070132970A1

公开(公告)日：2007-06-14

申请号：US11448990

申请日：2006-06-08

Applicant: Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Roelof Ritsema ,  Frank Van Schaik ,  Thimotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20070013893A1

公开(公告)日：2007-01-18

申请号：US11179780

申请日：2005-07-13

Applicant: Erik Loopstra

Inventor： Erik Loopstra

IPC: G03B27/58

CPC classification number: G03B27/58 ,  G03F7/70425 ,  G03F7/70716

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

Abstract translation: 为了提高光刻设备的生产率，描述了用于保持两个图案形成装置的平台装置。 图案形成装置被布置成使得扫描方向上的图案之间的距离对应于图案在扫描方向上的长度。 通过这样做，可以通过用第一图案曝光第一模具，跳过与第一模具相邻的第二模具，以及使用第二图案露出与第二模具相邻的第三模具来执行改进的曝光顺序。