PROCESS FOR PRODUCING AN IMAGE FROM POROUS MARKING PARTICLES
    31.
    发明申请
    PROCESS FOR PRODUCING AN IMAGE FROM POROUS MARKING PARTICLES 审中-公开
    从多孔标记颗粒生产图像的方法

    公开(公告)号:US20120077000A1

    公开(公告)日:2012-03-29

    申请号:US12889716

    申请日:2010-09-24

    IPC分类号: G03G13/20 B32B5/16 B32B3/10

    CPC分类号: G03G13/20 Y10T428/24901

    摘要: A process of producing an image including transferring porous polymeric marking particles to a receiver, and fixing the marking particles to the receiver by applying heat and pressure by contacting the marking particles with a heated fuser member including a topcoat layer having a storage modulus of at least 10 MPa at 175° C. In particular embodiments, the invention is specifically directed towards fusing porous toner materials, and enables reducing the image relief, toner spread, and differential gloss of resulting fused toner images. Higher gloss and reduced differential gloss is obtained at similar or reduced toner spread, measured by toner particle area gain, allowing the use of reduced fusing conditions compared to solid toners.

    摘要翻译: 一种制造图像的方法,包括将多孔聚合物标记颗粒转移到接收器,并且通过施加热和压力将标记颗粒固定到接收器,通过使标记颗粒与包含至少具有至少的储能模量的顶涂层的加热定影器部件接触 在特定实施例中,本发明特别针对熔化多孔调色剂材料,并且能够减少图像浮雕,调色剂扩散以及所得到的熔融调色剂图像的差别光泽。 通过调色剂颗粒面积增益测量,在类似或减少的调色剂涂布量下获得更高的光泽度和降低的差别光泽度,与固体调色剂相比允许使用降低的熔合条件。

    COMBINATION MOUSE AND TOUCH INPUT DEVICE
    32.
    发明申请
    COMBINATION MOUSE AND TOUCH INPUT DEVICE 有权
    组合鼠标和触摸输入设备

    公开(公告)号:US20120050163A1

    公开(公告)日:2012-03-01

    申请号:US12871319

    申请日:2010-08-30

    IPC分类号: G06F3/033

    摘要: A computer input device, capable of operating in a mouse mode and in a touch mode, includes a body, a control unit and a switch. The body includes a first housing, a second housing and a hinge interconnecting the first and second housings. The body is movable between a flat position where the first and second housings are positioned side by side in a line, and an inverted-V position where the first and second housings co-define an included angle. The control unit provides a first input function which enables the input device to operate in the mouse mode and a second input function which enables the input device to operate in the touch mode. The switch is configured to have the control unit perform the first input function when the body is in the flat position and perform the second input function when the body is in the inverted-V position.

    摘要翻译: 能够以鼠标模式和触摸模式操作的计算机输入装置包括主体,控制单元和开关。 主体包括第一壳体,第二壳体和互连第一和第二壳体的铰链。 主体可以在第一和第二壳体以一条直线并排定位的平坦位置和第一和第二壳体共同限定夹角的倒V形位置之间移动。 控制单元提供第一输入功能,其使得输入设备能够以鼠标模式操作,以及使得输入设备能够在触摸模式下操作的第二输入功能。 该开关被配置为当身体处于平坦位置时使控制单元执行第一输入功能,并且当身体处于倒V位置时执行第二输入功能。

    COMPOSITIONS AND METHODS FOR LABELING OF NUCLEIC ACID MOLECULES
    33.
    发明申请
    COMPOSITIONS AND METHODS FOR LABELING OF NUCLEIC ACID MOLECULES 审中-公开
    用于标记核酸分子的组合物和方法

    公开(公告)号:US20080227107A1

    公开(公告)日:2008-09-18

    申请号:US12111834

    申请日:2008-04-29

    IPC分类号: C12Q1/68 C12P19/34

    摘要: The present invention is generally related to compositions, kits and methods for labeling nucleic acid molecules using reverse transcriptases, preferably multi-subunit reverse transcriptases such as ASLV reverse transcriptases. Specifically, the invention relates to methods, kits and compositions for fluorescently labeling nucleic acid molecules during nucleic acid synthesis. The labeled nucleic acid molecules produced in accordance with the invention are particularly suited as labeled probes for nucleic acid detection and diagnostics.

    摘要翻译: 本发明通常涉及使用逆转录酶,优选多亚基逆转录酶(例如ASLV逆转录酶)来标记核酸分子的组合物,试剂盒和方法。 具体地,本发明涉及在核酸合成期间荧光标记核酸分子的方法,试剂盒和组合物。 根据本发明产生的标记的核酸分子特别适用于用于核酸检测和诊断的标记探针。

    Fusing-station roller
    36.
    发明授权
    Fusing-station roller 失效
    定影辊

    公开(公告)号:US07001653B2

    公开(公告)日:2006-02-21

    申请号:US10668014

    申请日:2003-09-22

    摘要: A controlled modulus fusing-station member inclusive of a durable, tough, elastically deformable layer incorporating hollow flexible filler particles. The elastically deformable layer is preferably a single layer on a substrate, the substrate preferably a core member of a fuser roller or a pressure roller. The elastically deformable layer is made from a dry formulation inclusive of: a fluoro-thermoplastic polymer powder; microspheres in the form of unexpanded microspheres or expanded microballoons; and solid filler particles including strength-enhancing filler particles and thermal-conductivity-enhancing filler particles. The dry formulation can be thermally cured or electron-beam cured. Preferably, the dry formulation is thermally cured and further includes a curing catalyst, preferably a peroxide catalyst. Alternatively, the curing catalyst can be a bisphenol residue.

    摘要翻译: 一种受控模量定影站构件,包括耐用,坚韧,可弹性变形的层,其中包含中空柔性填料颗粒。 可弹性变形层优选地是在基底上的单层,该基底优选地是定影辊或加压辊的芯构件。 弹性变形层由干式制剂制成,包括:氟 - 热塑性聚合物粉末; 未膨胀微球或膨胀微球形式的微球; 以及固体填料颗粒,包括强度增强填料颗粒和导热性增强填料颗粒。 干燥制剂可以热固化或电子束固化。 优选地,干燥制剂被热固化,并且还包括固化催化剂,优选过氧化物催化剂。 或者,固化催化剂可以是双酚残基。

    Method for preventing tungsten contact/via plug loss after a backside pressure fault
    40.
    发明授权
    Method for preventing tungsten contact/via plug loss after a backside pressure fault 有权
    背面压力故障后防止钨接触/堵头损失的方法

    公开(公告)号:US06245654B1

    公开(公告)日:2001-06-12

    申请号:US09283063

    申请日:1999-03-31

    IPC分类号: H01L2144

    摘要: A method for preventing tungsten contact/via plug loss after a backside pressure fault defect in a deposition chamber is provided. In the method, first deposited by a silane soak step and a tungsten nucleation layer is subsequently deposited, a plasma treating step by a H2 plasma is carried out at a temperature of not higher than 480° C. for a time period of at least 15 seconds. The plasma treating step significantly improves the uniform distribution of the silicon prenucleation layer and substantially prevents the formation of any tungsten silicide layers such that during an etchback process, the dry etchant utilized does not remove a tungsten silicide layer at a much faster rate and leads to a plug loss defect.

    摘要翻译: 提供了一种用于在沉积室中的背面压力故障缺陷之后防止钨接触/经由插塞损失的方法。 在该方法中,首先通过硅烷浸渍步骤和钨成核层沉积,通过H 2等离子体的等离子体处理步骤在不高于480℃的温度下进行至少15 秒。 等离子体处理步骤显着地改善了硅预核层的均匀分布,并且基本上防止了任何硅化钨层的形成,使得在回蚀工艺期间,所用的干蚀刻剂不会以更快的速率除去硅化钨层,并导致 插头损失缺陷。