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    Patterned substrate with hydrophilic/hydrophobic contrast, and method of use
    31.
    发明授权
    Patterned substrate with hydrophilic/hydrophobic contrast, and method of use 有权
    具有亲水/疏水对比度的图案化基材和使用方法

    公开(公告)号：US07112617B2

    公开(公告)日：2006-09-26

    申请号：US10421394

    申请日：2003-04-22

    申请人： Ho-Cheol Kim ,  Robert Dennis Miller

    发明人： Ho-Cheol Kim ,  Robert Dennis Miller

    IPC分类号： C08F2/46 ,  C08J7/12 ,  C08J7/18

    CPC分类号： G03C1/731 ,  Y10T428/249961

    摘要： A gas phase species (such as ozone, H2O2, or N2O) is photodissociated with ultraviolet light into a reactive species that is patternwise directed (e.g., through a mask) onto a surface of a material, such as an organosilicate. The reactive species reacts with the material to form a polar oxidation product such as —OH, thereby resulting in discrete hydrophilic regions separated from each other by hydrophobic regions. The degree of hydrophilicity of the discrete regions may be tailored by controlling the concentration of the reactive species, the ultraviolet light intensity, the temperature to which the material is heated, and exposure time. End products made with the methods are suitable for use in a biomolecular array.

    摘要翻译： 气相物质（例如臭氧，H 2 O 2 O 2或N 2 O）与紫外光光分解成反应性物质，其中 以图案方式指向（例如，通过掩模）到诸如有机硅酸盐的材料的表面上。 反应性物质与物质反应形成极性氧化产物如-OH，从而导致离散的亲水区域彼此疏水区域分离。 离散区域的亲水性程度可以通过控制反应物种的浓度，紫外光强度，材料被加热的温度和曝光时间来调整。 用该方法制成的最终产品适用于生物分子阵列。

    Method of purifying nanoparticles in a colloid
    33.
    发明授权
    Method of purifying nanoparticles in a colloid 有权
    纯化胶体中纳米颗粒的方法

    公开(公告)号：US08491768B2

    公开(公告)日：2013-07-23

    申请号：US12821953

    申请日：2010-06-23

    申请人： Xin Ai ,  John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  John Campbell Scott ,  Qing Song

    发明人： Xin Ai ,  John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  John Campbell Scott ,  Qing Song

    IPC分类号： B01D57/02

    CPC分类号： B03C5/026

    摘要： Nanoparticles in a colloid are purified, with the colloid including a fluid, unwanted matter, and the nanoparticles to be purified. An electric field is applied that is substantially spatially uniform over a distance that is at least equal to a characteristic dimension of the nanoparticles, so that at least some of the nanoparticles move towards at least one collection surface as a result of the force arising between their electrical charge and the electric field, whereupon nanoparticles are collected on said at least one collection surface. The collection surface(s) may be one or more electrodes to which a voltage potential is applied. The collected nanoparticles are then removed from the collection surface, e.g., by dispersing them into another fluid.

    摘要翻译： 胶体中的纳米颗粒被纯化，胶体包括流体，不想要的物质和待纯化的纳米颗粒。 施加的电场在至少等于纳米颗粒的特征尺寸的距离上基本上在空间上均匀，使得至少一些纳米颗粒由于在它们之间产生的力而朝向至少一个收集表面移动 电荷和电场，由此将纳米颗粒收集在所述至少一个收集表面上。 收集表面可以是施加电压电位的一个或多个电极。 然后将收集的纳米颗粒从收集表面中除去，例如通过将其分散到另一种流体中。

    Patterned, high surface area substrate with hydrophilic/hydrophobic contrast, and method of use
    35.
    发明授权
    Patterned, high surface area substrate with hydrophilic/hydrophobic contrast, and method of use 失效
    具有亲水/疏水对比度的图案化，高表面积底物和使用方法

    公开(公告)号：US07282241B2

    公开(公告)日：2007-10-16

    申请号：US10421161

    申请日：2003-04-22

    申请人： Ho-Cheol Kim ,  Robert Dennis Miller

    发明人： Ho-Cheol Kim ,  Robert Dennis Miller

    IPC分类号： B05D3/00 ,  B05D3/04 ,  B05D3/06

    CPC分类号： B82Y5/00 ,  G01N33/54393 ,  Y10T428/249953 ,  Y10T428/249961 ,  Y10T428/249979

    摘要： Nanoporous structures are constructed that have hydrophilic regions separated by hydrophobic regions. The porous, hydrophilic regions have reaction sites suitable for use in a bioassay application and have a higher density of reaction sites than that of a non-porous (2-D) surface. The structure may be made by depositing a layer of a matrix material (e.g., an organosilicate) and a porogen, and then crosslinking the matrix material to form a nanohybrid composite structure. The porogen is decomposed to form pores within the matrix material, and a reactive gas phase species (e.g., ozone) is patternwise directed onto a surface of the matrix material. Ultraviolet light (directed through a mask) activates the gas phase species to form a reactive species that then reacts with the matrix material to make it hydrophilic. The porogen may be decomposed thermally or by exposing it to an oxidizing atmosphere in the presence of ultraviolet light.

    摘要翻译： 构建了具有疏水区域分离的亲水区域的纳米孔结构。 多孔亲水区域具有适用于生物测定应用的反应位点，并具有比无孔（2-D）表面更高的反应位点密度。 该结构可以通过沉积基质材料（例如有机硅酸盐）和致孔剂层，然后交联基质材料以形成纳米杂化复合结构来制备。 造孔剂在基质材料内分解形成孔隙，反应性气相物质（如臭氧）以图形方式导向基质材料的表面。 紫外线（通过掩模引导）激活气相物质以形成反应物质，然后与基质材料反应以使其亲水。 造孔剂可能会被热分解，或者在紫外光的存在下暴露于氧化气氛。

    Two-dimensional patterning employing self-assembled material
    38.
    发明授权
    Two-dimensional patterning employing self-assembled material 失效
    采用自组装材料的二维图案

    公开(公告)号：US08754400B2

    公开(公告)日：2014-06-17

    申请号：US13432036

    申请日：2012-03-28

    申请人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl J. Radens

    发明人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl J. Radens

    IPC分类号： H01L29/06 ,  H01L31/0328 ,  H01L31/0336 ,  H01L31/072 ,  H01L31/109

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/0338 ,  Y10T428/24612

    摘要： A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.

    摘要翻译： 具有亚光刻宽度和亚光刻距离并沿着第一方向延伸的第一纳米级自对准自组装嵌套线结构由第一层内的第一自组装嵌段共聚物形成。 第一层填充有填充材料，并且第二层沉积在包含第一纳米级嵌套线结构的第一层之上。 具有亚光刻宽度和亚光刻距离并沿第二方向运行的第二纳米级自对准自组装嵌套线结构由第二层内的第二自组装嵌段共聚物形成。 第一纳米级嵌套线结构和第二纳米级嵌套线结构的复合图案被转移到第一层下面的底层中以形成在两个方向上包含周期性的结构阵列。

    Methods of directed self-assembly, and layered structures formed therefrom
    39.
    发明授权
    Methods of directed self-assembly, and layered structures formed therefrom 有权
    定向自组装的方法和由其形成的分层结构

    公开(公告)号：US08623458B2

    公开(公告)日：2014-01-07

    申请号：US12642018

    申请日：2009-12-18

    申请人： Joy Cheng ,  Matthew E. Colburn ,  Stefan Harrer ,  William D. Hinsberg ,  Steven J. Holmes ,  Ho-Cheol Kim ,  Daniel Paul Sanders

    发明人： Joy Cheng ,  Matthew E. Colburn ,  Stefan Harrer ,  William D. Hinsberg ,  Steven J. Holmes ,  Ho-Cheol Kim ,  Daniel Paul Sanders

    IPC分类号： B81C1/00 ,  C08J5/18 ,  C08J5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A layered structure comprising a self-assembled material is formed by a method that includes forming a photochemically, thermally and/or chemically treated patterned photoresist layer disposed on a first surface of a substrate. The treated patterned photoresist layer comprises a non-crosslinked treated photoresist. An orientation control material is cast on the treated patterned photoresist layer, forming a layer containing orientation control material bound to a second surface of the substrate. The treated photoresist and, optionally, any non-bound orientation control material are removed by a development process, resulting in a pre-pattern for self-assembly. A material capable of self-assembly is cast on the pre-pattern. The casted material is allowed to self-assemble with optional heating and/or annealing to produce the layered structure.

    摘要翻译： 包括自组装材料的层状结构通过包括形成设置在衬底的第一表面上的光化学，热和/或化学处理的图案化光致抗蚀剂层的方法形成。 经处理的图案化光刻胶层包括非交联处理的光致抗蚀剂。 将取向控制材料浇铸在经处理的图案化的光致抗蚀剂层上，形成包含与基材的第二表面结合的取向控制材料的层。 经处理的光致抗蚀剂和任选的任何未结合的取向控制材料通过显影过程被去除，从而形成用于自组装的预图案。 能够自组装的材料在预制图案上铸造。 允许铸造材料通过任选的加热和/或退火自组装以产生分层结构。

    Methods for forming surface features using self-assembling masks
    40.
    发明授权
    Methods for forming surface features using self-assembling masks 有权
    使用自组装掩模形成表面特征的方法

    公开(公告)号：US08529779B2

    公开(公告)日：2013-09-10

    申请号：US12057565

    申请日：2008-03-28

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： B31D3/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/302

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.

    摘要翻译： 一种用于产生表面特征的方法和蚀刻掩模方法。 提供了一种嵌段共聚物和另外的材料的组合。 嵌段共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 膜由直接形成在第一层的表面上。 附加材料的纳米结构在第一聚合物嵌段内自组装。 蚀刻组合和第一层的膜。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 去除膜并且特征保留在第一层的表面上。 还包括蚀刻掩模法，其中纳米结构掩盖了来自所述蚀刻剂的第一层的部分。