Lithographic apparatus and device manufacturing method
    31.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US07027132B2

    公开(公告)日:2006-04-11

    申请号:US10980834

    申请日:2004-11-04

    IPC分类号: G03B27/62 G03B27/42 G03B27/58

    摘要: A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backfill gas feed is arranged in the support zone and provides a backfill gas that flows to a backside of the article when supported by the article support. The support zone is surrounded by a boundary zone that has a reduced height relative to the plane of support so that the backfill gas flow is permitted to exit the support zone. A tunable clamp clamps the article to the article support, and a flow measuring system measures the outflow of the backfill gas. The tunable clamp is operatively coupled to the flow measuring system to tune the clamping based on the measured outflow.

    摘要翻译: 光刻设备包括用于支撑待放置在辐射束的光束路径中的基本平坦的物品的物品支撑件。 物品支撑件包括限定用于提供支撑平面的支撑区域的多个支撑突起。 回填气体进料设置在支撑区域中,并且当由物品支撑件支撑时提供回流到物品的后侧的回填气体。 支撑区被边界区围绕,该边界区相对于支撑平面具有减小的高度,使得回填气体流被允许离开支撑区。 可调式夹具将制品夹紧到物品支撑件上,流量测量系统测量回填气体的流出。 可调式夹具可操作地连接到流量测量系统,以基于所测量的流出来调节夹紧。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    32.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:US20060097201A1

    公开(公告)日:2006-05-11

    申请号:US10970733

    申请日:2004-10-22

    IPC分类号: G01J3/10

    摘要: A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

    摘要翻译: 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统,被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具,其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路,使得可能避免由于在制品上的静电产生而出现的脊的发生。

    Displacement device, lithographic apparatus and positioning method
    34.
    发明授权
    Displacement device, lithographic apparatus and positioning method 有权
    位移装置,光刻设备和定位方法

    公开(公告)号:US09052613B2

    公开(公告)日:2015-06-09

    申请号:US13105748

    申请日:2011-05-11

    IPC分类号: G03B27/58 G03F7/20 H02K41/03

    CPC分类号: G03F7/70758 H02K41/03

    摘要: A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction, wherein the displacement device includes a controller configured to control the position of the second part relative to the first part, and wherein when the second part mainly moves in the second direction the controller is configured to levitate the second part from the first part in the third direction by using first coil block units only.

    摘要翻译: 一种具有第一和第二部分的位移装置,其相对于彼此可移动,所述第一部分设置有磁体系统,所述第二部分设置有一组线圈块单元,所述一组线圈块单元包括:至少三个第一线圈块单元, 电流导体平行于第二方向定向,至少两个第二线圈块单元,其具有平行于第一方向定向的电流导体,其中所述位移装置包括被配置为控制所述第二部分相对于所述第一部分的位置的控制器,并且其中 当第二部分主要在第二方向上移动时,控制器被配置为仅通过使用第一线圈块单元从第一部分沿第三方向悬浮第二部分。

    Temperature stabilization system to stabilize a temperature of an article
    35.
    发明授权
    Temperature stabilization system to stabilize a temperature of an article 有权
    温度稳定系统,以稳定物品的温度

    公开(公告)号:US08994917B2

    公开(公告)日:2015-03-31

    申请号:US12999512

    申请日:2009-07-22

    摘要: An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.

    摘要翻译: 文章支持被构造来支持文章。 物品支撑件包括构造成向物品支撑件提供热提取流体并从其提取热缓冲流体的后填充结构。 背部填充结构连接到提取管道,其被构造和布置成从后部填充结构提取至少一个热缓冲流体的气相。 后填充结构连接到供应管道,构造和布置成将热缓冲流体的液相供应到后填充结构。 背部填充结构被布置成使热缓冲流体进入组合的液体和气相以与制品热连接。