公开(公告)号：US10458777B2

公开(公告)日：2019-10-29

申请号：US14949444

申请日：2015-11-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran Amit ,  Barry Loevsky ,  Andrew Hill ,  Amnon Manassen ,  Nuriel Amir ,  Vladimir Levinski ,  Roie Volkovich

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/95 ,  G01N21/956 ,  G06F17/50 ,  H01L21/66 ,  G01N21/88

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US09903813B2

公开(公告)日：2018-02-27

申请号：US14734687

申请日：2015-06-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Nuriel Amir

IPC: G01N21/00 ,  B05D5/00 ,  G01N21/47 ,  B05D1/32 ,  G01N21/01 ,  G03F7/20

CPC classification number: G01N21/4785 ,  B05D1/32 ,  G01N21/01 ,  G03F7/70466 ,  G03F7/70633 ,  G03F7/70683

Abstract: Multiply patterned metrology targets and target design methods are provided to enable pitch walk measurements using overlay measurements. Multiply patterned structures having single features or spacers produced simultaneously and sharing a common pitch with the paired features or spacers are used to express pitch walk as a measurable overlay between the structures. For example, targets are provided which comprise a first multiply patterned structure having a single left-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers, and a second multiply patterned structure having a single right-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers.

公开(公告)号：US09885961B1

公开(公告)日：2018-02-06

申请号：US14289143

申请日：2014-05-28

Applicant: KLA-Tencor Corporation

Inventor： Nuriel Amir

IPC: G03F7/20 ,  H01L23/544 ,  G01B11/14

CPC classification number: G03F7/70633 ,  G01B11/14 ,  H01L23/544

Abstract: The present disclosure is directed to overlay metrology with targets including “disappearing” or sacrificial layers that leave no optical trace impacting OVL measurement when processed. In an embodiment, an overlay metrology target may include at least one overlay target structure inducing an optical characteristic and at least one secondary overlay target structure inducing a temporary optical characteristic. The at least one secondary overlay target structure being removable by a lithographic process and/or by etch or clean process, where removal of the at least one secondary overlay target structure removes the temporary optical characteristic. That is, the secondary target structure or “layer” leaves no optical trace impacting OVL measurement when removed, thereby allowing another target structure (e.g., a tertiary target structure or layer) to be printed in a region previously occupied by at least a portion of the secondary target structure.

公开(公告)号：US09841370B2

公开(公告)日：2017-12-12

申请号：US14620992

申请日：2015-02-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Nuriel Amir

IPC: G01J1/10 ,  G01N21/01 ,  G03F7/20 ,  G01N21/95 ,  G06F17/50

CPC classification number: G01N21/01 ,  G01N21/9501 ,  G01N2201/02 ,  G01N2201/12 ,  G03F7/70616 ,  G06F17/5072 ,  G06F17/5081 ,  Y10T428/2457

Abstract: Multi-layered targets, design files and design and production methods thereof are provided. The multi-layered targets comprise process layers arranged to have parallel segmentation features at specified regions, and target layer comprising target elements which are perpendicular to the parallel segmentation features of the process layers at the specified regions.

公开(公告)号：US20160290796A1

公开(公告)日：2016-10-06

申请号：US15090389

申请日：2016-04-04

Applicant: KLA-Tencor Corporation

Inventor： Ady Levy ,  Daniel Kandel ,  Michael E. Adel ,  Leonid Poslavsky ,  John Robinson ,  Tal Marciano ,  Barak Bringoltz ,  Tzahi Grunzweig ,  Dana Klein ,  Tal Itzkovich ,  Nadav Carmel ,  Nuriel Amir ,  Vidya Ramanathan ,  Janay Camp ,  Mark Wagner

IPC: G01B11/27 ,  G01N21/21

CPC classification number: G01B11/272 ,  G01N21/211 ,  G01N21/31 ,  G01N21/41 ,  G01N21/4738 ,  G01N21/4788 ,  G01N21/6489 ,  G01N21/9501 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70616

Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

Abstract translation: 计量性能分析系统包括包括一个或多个检测器的计量工具和通信地耦合到所述一个或多个检测器的控制器。 所述控制器被配置为从所述计量工具接收与度量目标相关联的一个或多个度量数据集，其中所述一个或多个测量数据集包括一个或多个测量的度量度量，并且所述一个或多个测量的度量度量指示与标称值的偏差 。 控制器还被配置为确定与标称值和一个或多个所选择的半导体工艺变化的偏差之间的关系，并且基于一个或多个测量值的值之间的关系确定偏离标称值的一个或多个根本原因 度量和一个或多个所选择的半导体工艺变化。

公开(公告)号：US20160254121A1

公开(公告)日：2016-09-01

申请号：US14861502

申请日：2015-09-22

Applicant: KLA-Tencor Corporation

Inventor： Nuriel Amir

IPC: H01J37/302 ,  G03F9/00 ,  H01J37/317

CPC classification number: H01J37/3026 ,  G03F9/7019 ,  H01J37/3045 ,  H01J37/3177

Abstract: Alignment of multi-beam pattern tools includes generating a test pattern having multiple features with a multi-beam patterning tool, acquiring an image standard associated with a test pattern standard, acquiring an image of a portion of the test pattern, comparing the portion of the image of the test pattern to the image standard to identify one or more irregularities between the portion of the image of the test pattern and the image standard, and adjusting one or more beams of the multi-beam patterning tool based on the one or more identified irregularities between the portion of the image of the test pattern and the image standard.

Abstract translation: 多光束图案工具的对准包括利用多光束图形工具生成具有多个特征的测试图案，获取与测试图案标准相关联的图像标准，获取测试图案的一部分的图像， 将测试图案的图像映射到图像标准，以识别测试图案的图像的部分与图像标准之间的一个或多个不规则性，以及基于一个或多个识别的图像标准来调整多光束图案形成工具的一个或多个光束 测试图案的图像部分与图像标准之间的不规则性。

公开(公告)号：US20150292877A1

公开(公告)日：2015-10-15

申请号：US14727038

申请日：2015-06-01

Applicant: KLA-Tencor Corporation

Inventor： Tal Marciano ,  Eran Amit ,  Barak Bringoltz ,  Nuriel Amir ,  Amit Shaked

IPC: G01B11/27 ,  G06F17/50

CPC classification number: G01B11/27 ,  G06F17/5081

Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

Abstract translation: 提供了计量方法和目标，用于通过从具有不同设计的不对准的至少三个目标单元的重叠测量推导出测量的不准确度对所设计的不对准的依赖性（每个设计的未对准在至少两个 各个靶细胞中重叠的周期性结构）。 与设计的不对准相关的不准确被减少，检测到过程变化源，并根据派生的依赖性优化目标和测量算法。

公开(公告)号：US20140139815A1

公开(公告)日：2014-05-22

申请号：US14162110

申请日：2014-01-23

Applicant: KLA-Tencor Corporation

Inventor： Nuriel Amir

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/47

CPC classification number: G03F7/70633 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70141 ,  G03F7/70616

Abstract: Metrology methods and systems are provided, which measure metrology targets during the exposure stage using reflected or diffracted exposure illumination or additional simultaneous illumination having longer wavelengths than the exposure illumination, The metrology measurements are used to correct the lithographic process in a short loop, enabling realtime and even predictive error correction, The metrology methods, tools and systems also include defect detection during the exposure stage.

Abstract translation: 提供了测量方法和系统，其在曝光阶段使用反射或衍射曝光照明或具有比曝光照明更长波长的附加同时照明测量测量目标。测量测量用于在短循环中校正光刻过程，从而实时 甚至预测误差校正，计量方法，工具和系统也包括在曝光阶段的缺陷检测。

公开(公告)号：US20140060148A1

公开(公告)日：2014-03-06

申请号：US13834915

申请日：2013-03-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran Amit ,  Dana Klein ,  Guy Cohen ,  Amir Widmann ,  Nimrod Shuall ,  Amnon Manassen ,  Nuriel Amir

IPC: G01B21/04

CPC classification number: G01B21/042 ,  G03F7/70625 ,  G03F7/70633

Abstract: Aspects of the present disclosure describe systems and methods for calibrating a metrology tool by using proportionality factors. The proportionality factors may be obtained by measuring a substrate under different measurement conditions. Then calculating the measured metrology value and one or more quality merits. From this information, proportionality factors may be determined. Thereafter the proportionality factors may be used to quantify the inaccuracy in a metrology measurement. The proportionality factors may also be used to determine an optimize measurement recipe. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 本公开的方面描述了通过使用比例因子来校准度量工具的系统和方法。 可以通过在不同测量条件下测量衬底来获得比例因子。 然后计算测量的度量值和一个或多个质量优点。 根据该信息，可以确定比例因子。 此后，可以使用比例因子来量化度量测量中的不精确度。 比例因子也可用于确定优化测量配方。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。