公开(公告)号：US20160056606A1

公开(公告)日：2016-02-25

申请号：US14210355

申请日：2014-03-13

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/23 ,  G01N21/95 ,  H01S3/06 ,  G01N21/88 ,  H01S3/00 ,  H01S3/067

CPC classification number: H01S3/2308 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G02F1/353 ,  G02F2001/3507 ,  G02F2001/354 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/06708 ,  H01S3/06758 ,  H01S3/09415 ,  H01S3/1618 ,  H01S3/2375 ,  H01S3/302

Abstract: An improved laser uses a pump laser with a wavelength near 1109 nm and a fundamental wavelength near 1171 nm to generate light at a wavelength between approximately 189 nm and approximately 200 nm, e.g. 193 nm. The laser mixes the 1109 nm pump wavelength with the 5th harmonic of the 1171 nm fundamental, which is at a wavelength of approximately 234.2 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract translation: 改进的激光器使用波长接近1109nm和基本波长接近1171nm的泵浦激光器来产生在约189nm至约200nm之间的波长的光，例如， 193nm。 激光器将1109nm泵浦波长与1171nm基波的5次谐波混合，其波长约为234.2nm。 通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率，良好的稳定性和高可靠性。

公开(公告)号：US20150299893A1

公开(公告)日：2015-10-22

申请号：US14753275

申请日：2015-06-29

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Dribinski ,  Yung-Ho Alex Chuang ,  J. Joseph Armstrong

IPC: C30B1/02 ,  C30B29/14 ,  C30B29/30 ,  G02F1/355 ,  C30B29/22

CPC classification number: H01S5/0092 ,  C03B33/02 ,  C30B1/02 ,  C30B29/10 ,  C30B29/14 ,  C30B29/22 ,  C30B29/30 ,  C30B33/02 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N2201/06113 ,  G01N2201/0637 ,  G01N2201/068 ,  G02F1/353 ,  G02F1/3551 ,  G02F1/3553 ,  G02F1/37 ,  G02F2001/3505 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2202/20 ,  H01S3/0092 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/11

Abstract: A frequency-conversion crystal annealing process includes a first ramp-up period (e.g., increasing the crystal's temperature to a first set point in the range of 100° C. to 150° C. over about 2 hours), a first fixed temperature period (e.g., maintaining at the first set point for 10 to 20 hours), a second ramp-up period (e.g., increasing from the first set point to a second set point above 150° C. over about 1 hour or more), a second fixed period (e.g., maintaining at the second set point for 48 to 300 hours), and then a temperature ramp-down period (e.g., decreasing from the second set point to room temperature over about 3 hours). Transitions from the first and second fixed temperature periods are optionally determined by —OH bonds absorption levels that are measured using Fourier transform infrared spectroscopy, e.g., by monitoring the absorption of —OH bonds (including H2O) near 3580 cm−1 in the infra-red spectrum.

Abstract translation: 频率转换晶体退火处理包括第一斜坡上升​​周期（例如，在约2小时内将晶体的温度提高到在100℃至150℃的范围内的第一设定点），第一固定温度周期 （例如，在第一设定点保持10至20小时），第二加速时间段（例如，在大约1小时或更长时间内从第一设定点增加到高于150℃的第二设定点），a 第二固定时间（例如，在第二设定点保持48至300小时），然后温度降低时间（例如，从大约3小时的第二设定点降低到室温）。 从第一和第二固定温度周期的转变可任选地由使用傅立叶变换红外光谱法测量的-OH键吸收水平确定，例如通过监测基底内的3580cm-1附近的-OH键（包括H 2 O）的吸收， 红色光谱。

公开(公告)号：US20150222079A1

公开(公告)日：2015-08-06

申请号：US14688975

申请日：2015-04-16

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Dribinski ,  Yung-Ho Alex Chuang

IPC: H01S3/10

CPC classification number: H01S3/10 ,  G02F1/3525 ,  H01S3/005 ,  H01S3/091

Abstract: Laser-induced damage in an optical material can be mitigated by creating conditions at which light absorption is minimized. Specifically, electrons populating defect energy levels of a band gap in an optical material can be promoted to the conduction band—a process commonly referred to as bleaching. Such bleaching can be accomplished using a predetermined wavelength that ensures minimum energy deposition into the material, ideally promoting electron to just inside the conduction band. In some cases phonon (i.e. thermal) excitation can also be used to achieve higher depopulation rates. In one embodiment, a bleaching light beam having a wavelength longer than that of the laser beam can be combined with the laser beam to depopulate the defect energy levels in the band gap. The bleaching light beam can be propagated in the same direction or intersect the laser beam.

Abstract translation: 可以通过产生光吸收最小化的条件来减轻光学材料中的激光诱导的损伤。 具体地说，填充光学材料中的带隙的缺陷能级的电子能够促进通常被称为漂白的传导带。 这样的漂白可以使用确保最小能量沉积到材料中的预定波长来实现，理想地促进电子刚好在导带内部。 在某些情况下，也可以使用声子（即热）激发来实现更高的人口流动率。 在一个实施例中，具有比激光束长的波长的波长的漂白光束可以与激光束组合以对带隙中的缺陷能级进行衰减。 漂白光束可以沿相同方向传播或与激光束相交。

公开(公告)号：US09097683B2

公开(公告)日：2015-08-04

申请号：US14507758

申请日：2014-10-06

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Dribinski ,  Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  John Fielden

IPC: H01S3/13 ,  G01N21/88 ,  H01S3/11 ,  H01S3/10 ,  H01S5/00 ,  G02F1/37 ,  H01S3/00 ,  C30B29/10 ,  C03B33/02 ,  G01N21/94 ,  G01N21/95 ,  G02F1/35 ,  G02F1/355

CPC classification number: H01S5/0092 ,  C03B33/02 ,  C30B1/02 ,  C30B29/10 ,  C30B29/14 ,  C30B29/22 ,  C30B29/30 ,  C30B33/02 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N2201/06113 ,  G01N2201/0637 ,  G01N2201/068 ,  G02F1/353 ,  G02F1/3551 ,  G02F1/3553 ,  G02F1/37 ,  G02F2001/3505 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2202/20 ,  H01S3/0092 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/11

Abstract: An optical system for detecting contaminants and defects on a test surface includes an improved laser system for generating a laser beam and optics directing the laser beam along a path onto the test surface, and producing an illuminated spot thereon. A detector and ellipsoidal mirrored surface are also provided with an axis of symmetry about a line perpendicular to the test surface. In one embodiment, an optical system for detecting anomalies of a sample includes the improved laser system for generating first and second beams, first optics for directing the first beam of radiation onto a first spot on the sample, second optics for directing the second beam onto a second spot on the sample, with the first and second paths at different angles of incidence to the sample surface. In another embodiment, a surface inspection apparatus includes an illumination system configured to focus beams at non-normal incidence angles.

Abstract translation: 用于检测测试表面上的污染物和缺陷的光学系统包括用于产生激光束的改进的激光系统和将激光束沿着路径引导到测试表面上并在其上产生照明点的光学系统。 检测器和椭圆形镜面也具有围绕垂直于测试表面的线的对称轴。 在一个实施例中，用于检测样本异常的光学系统包括用于产生第一和第二光束的改进的激光系统，用于将第一辐射束引导到样品上的第一光点上的第一光学器件，用于将第二光束引导到 样品上的第二个点，第一和第二个路径与样品表面的入射角不同。 在另一个实施例中，表面检查装置包括被配置为以非正常入射角聚焦光束的照明系统。

公开(公告)号：US20140204963A1

公开(公告)日：2014-07-24

申请号：US14158615

申请日：2014-01-17

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

IPC: H01S3/00 ,  G01N21/84

CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

公开(公告)号：US11180866B2

公开(公告)日：2021-11-23

申请号：US14248045

申请日：2014-04-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Vladimir Dribinski

IPC: C30B33/02 ,  C30B7/00 ,  C30B9/00 ,  G01N21/956 ,  C30B29/10 ,  C30B29/22 ,  G01N21/95 ,  G01N21/84 ,  G01N21/87

Abstract: The passivation of a nonlinear optical crystal for use in an inspection tool includes growing a nonlinear optical crystal in the presence of at least one of fluorine, a fluoride ion and a fluoride-containing compound, mechanically preparing the nonlinear optical crystal, performing an annealing process on the nonlinear optical crystal and exposing the nonlinear optical crystal to a hydrogen-containing or deuterium-containing passivating gas.

公开(公告)号：US10439355B2

公开(公告)日：2019-10-08

申请号：US15901388

申请日：2018-02-21

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: G01N21/95 ,  G02B17/08 ,  H01S3/23 ,  H01S3/00 ,  H01S3/30 ,  H01S3/10 ,  H01S3/067 ,  H01S3/16 ,  H01S3/11 ,  G02F1/35 ,  G02F1/39

Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.

公开(公告)号：US20190198330A1

公开(公告)日：2019-06-27

申请号：US16287237

申请日：2019-02-27

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Vladimir Dribinski

IPC: H01L21/30 ,  G01N21/88 ,  C30B29/10 ,  H01S3/109 ,  H01L21/322 ,  H01S3/02 ,  H01S3/094 ,  H01S3/16 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/95

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  G02F1/3501 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666

Abstract: A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

公开(公告)号：US10283366B2

公开(公告)日：2019-05-07

申请号：US15284231

申请日：2016-10-03

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: H01L21/30 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/95 ,  G01N21/88 ,  H01L21/322 ,  H01S3/02 ,  H01S3/094 ,  H01S3/109 ,  H01S3/16 ,  G01N21/35 ,  G01N21/84

Abstract: A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

公开(公告)号：US10175555B2

公开(公告)日：2019-01-08

申请号：US15806953

申请日：2017-11-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Baigang Zhang ,  John Fielden ,  Vladimir Dribinski

IPC: G02F1/35 ,  G02F1/355

Abstract: A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.