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    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
    32.
    发明授权
    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology 有权

    公开(公告)号：US10126238B2

    公开(公告)日：2018-11-13

    申请号：US15841219

    申请日：2017-12-13

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

    IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

    Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

    System and Method for Spectral Tuning of Broadband Light Sources
    34.
    发明申请
    System and Method for Spectral Tuning of Broadband Light Sources 审中-公开

    公开(公告)号：US20170350575A1

    公开(公告)日：2017-12-07

    申请号：US15339312

    申请日：2016-10-31

    Applicant: KLA-Tencor Corporation

    Inventor： Andrew V. Hill ,  Amnon Manassen ,  Ohad Bachar

    IPC: F21V9/10 ,  G02B5/26 ,  G02F1/33 ,  G02B5/18 ,  G02B26/08 ,  G02B5/22

    Abstract: A tunable spectral filter includes a first tunable dispersive element, a first optical element, a spatial filtering element located at the focal plane, a second optical element, and a second dispersive element. The first tunable dispersive element introduces spectral dispersion to an illumination beam with an adjustable dispersion. The first optical element focuses the illumination beam at a focal plane in which a distribution of a spectrum of the spectrally-dispersed illumination beam at the focal plane is controllable by adjusting the dispersion of the first tunable dispersive element. The spatial filtering element filters the spectrum of the illumination beam based on the distribution of the spectrum of the illumination beam at the focal plane. The second optical element collects the spectrally-dispersed illumination beam transmitted from the spatial filtering element. The second tunable dispersive element removes the dispersion introduced by the first tunable dispersive element from the illumination beam.

    Optical near-field metrology
    37.
    发明授权
    Optical near-field metrology 有权

    公开(公告)号：US11815347B2

    公开(公告)日：2023-11-14

    申请号：US15599881

    申请日：2017-05-19

    Applicant: KLA-Tencor Corporation

    Inventor： Yuri Paskover ,  Amnon Manassen ,  Vladimir Levinski

    IPC: G03F7/20 ,  G01N21/64 ,  G01N21/95 ,  G01B11/27 ,  G03F7/00 ,  G01B11/30

    CPC classification number: G01B11/272 ,  G01B11/303 ,  G01N21/6489 ,  G01N21/9501 ,  G03F7/70633 ,  G01B2210/56

    Abstract: Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.

    DEVICE-LIKE METROLOGY TARGETS
    38.
    发明申请
    DEVICE-LIKE METROLOGY TARGETS 有权

    公开(公告)号：US20220197152A1

    公开(公告)日：2022-06-23

    申请号：US17689934

    申请日：2022-03-08

    Applicant: KLA-Tencor Corporation

    Inventor： Vladimir Levinski ,  Amnon Manassen ,  Eran Amit ,  Nuriel Amir ,  Liran Yerushalmi ,  Amit Shaked

    IPC: G03F7/20

    Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

    High-brightness illumination source for optical metrology
    40.
    发明授权
    High-brightness illumination source for optical metrology 有权

    公开(公告)号：US11156846B2

    公开(公告)日：2021-10-26

    申请号：US16430861

    申请日：2019-06-04

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov

    IPC: G02B27/09 ,  G02B27/48 ,  G01N21/47

    Abstract: An illumination source may include two or more input light sources, a collector, and any combination of a beam uniformizer, a speckle reducer, or any number of output fibers to provide a selected illumination etendue. The collector may include one or more lenses to combine illumination from the two or more input light sources into an illumination beam, where the illumination from the two or more input light sources occupy different portions of an input aperture of the collector. The beam uniformizer may include a first noncircular-core fiber to receive the illumination beam, a second noncircular-core fiber, and one or more coupling lenses to relay a far-field distribution of the illumination beam from the first noncircular-core fiber to an input face of the second noncircular-core fiber to provide output light with uniform near-field and far-field distributions.

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