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公开(公告)号:US20230282465A1
公开(公告)日:2023-09-07
申请号:US18011445
申请日:2021-08-31
Applicant: Lam Research Corporation
Inventor: John C. Valcore, JR. , Travis Joseph Wong , Ying Wu , Sandeep Mudunuri , Bostjan Pust , Shreeram Jyoti Dash
IPC: H01J37/32
CPC classification number: H01J37/3299 , H01J37/32146 , H01J2237/24564
Abstract: A method for controlling a plasma tool is described. The method includes receiving, by a processor, a first set of metric data from a plasma tool. The method further includes analyzing the first set of metric data to determine a first location and a first time window for capturing of a second set of metric data. The method includes providing, by the processor, the first location and the first time window to a data processing system of the plasma tool. The method also includes receiving the second set of metric data captured at the first location and for the first time window. The method includes analyzing the second set of metric data to generate variable data and controlling the plasma tool according to the variable data.
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公开(公告)号:US20230274913A1
公开(公告)日:2023-08-31
申请号:US18012212
申请日:2021-09-24
Applicant: Lam Research Corporation
Inventor: Ying Wu , John Stephen Drewery , Alexander Miller Paterson , Xiang Zhou , Zhuoxian Wang , Yoshie Kimura
IPC: H01J37/32
CPC classification number: H01J37/32146 , H01J2237/334 , H01J37/32091 , H01J37/321
Abstract: Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.
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公开(公告)号:US20230230805A1
公开(公告)日:2023-07-20
申请号:US18009978
申请日:2021-10-15
Applicant: Lam Research Corporation
Inventor: John Stephen Drewery , Ying Wu , Alexander Miller Paterson , Luc Albarede
IPC: H01J37/32
CPC classification number: H01J37/32174 , H01J37/32146
Abstract: Systems and methods for synchronization of radio frequency (RF) pulsing schemes and of sensor data collection are described. One of the methods includes receiving, by an RF generator, a first set of one or more variable levels and one or more duty cycles of an RF signal. The method further includes receiving, by the RF generator from a pulse controller, a synchronization signal having a plurality of pulses. The method also includes generating, during a clock cycle of a clock signal, multiple instances of a first plurality of states of the RF signal in synchronization with the plurality of pulses of the synchronization signal. Each of the first plurality of states of the RF signal has a corresponding one of the one or more variable levels of the first set and a corresponding one of the one or more duty cycles of the first set.
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公开(公告)号:US20230124201A1
公开(公告)日:2023-04-20
申请号:US18084684
申请日:2022-12-20
Applicant: Lam Research Corporation
Inventor: Juline Shoeb , Ying Wu , Alex Paterson
IPC: H01J37/32 , H01L21/683
Abstract: Systems and methods for increasing peak ion energy with a low angular spread of ions are described. In one of the systems, multiple radio frequency (RF) generators that are coupled to an upper electrode associated with a plasma chamber are operated in two different states, such as two different frequency levels, for pulsing of the RF generators. The pulsing of the RF generators facilitates a transfer of ion energy during one of the states to another one of the states for increasing ion energy during the other state to further increase a rate of processing a substrate.
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公开(公告)号:US11569067B2
公开(公告)日:2023-01-31
申请号:US17347504
申请日:2021-06-14
Applicant: Lam Research Corporation
Inventor: Juline Shoeb , Ying Wu , Alex Paterson
IPC: H01J37/32 , H01L21/683 , H01L21/3065 , H01L21/67
Abstract: Systems and methods for increasing peak ion energy with a low angular spread of ions are described. In one of the systems, multiple radio frequency (RF) generators that are coupled to an upper electrode associated with a plasma chamber are operated in two different states, such as two different frequency levels, for pulsing of the RF generators. The pulsing of the RF generators facilitates a transfer of ion energy during one of the states to another one of the states for increasing ion energy during the other state to further increase a rate of processing a substrate.
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公开(公告)号:US11437219B2
公开(公告)日:2022-09-06
申请号:US16885083
申请日:2020-05-27
Applicant: Lam Research Corporation
Inventor: Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC: H01J37/32
Abstract: Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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公开(公告)号:US20220254608A1
公开(公告)日:2022-08-11
申请号:US17729451
申请日:2022-04-26
Applicant: Lam Research Corporation
Inventor: Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
Abstract: A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on-off pulses. The method further includes applying a multi-level pulse waveform that adjusts a magnitude of each of the on-off pulses to generate an RF waveform. The method includes sending the RF waveform to an electrode.
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公开(公告)号:US20210193474A1
公开(公告)日:2021-06-24
申请号:US17196778
申请日:2021-03-09
Applicant: Lam Research Corporation
Inventor: Zhongkui Tan , Qian Fu , Ying Wu , Qing Xu , John Drewery
IPC: H01L21/3065 , H01L21/311 , H01L21/308 , H01J37/32 , H01L21/3213 , H01L21/67
Abstract: A substrate is disposed on a substrate holder within a process module. The substrate includes a mask material overlying a target material with at least one portion of the target material exposed through an opening in the mask material. A plasma is generated in exposure to the substrate. For a first duration, a bias voltage is applied at the substrate holder at a first bias voltage setting corresponding to a high bias voltage level. For a second duration, after completion of the first duration, a bias voltage is applied at the substrate holder at a second bias voltage setting corresponding to a low bias voltage level. The second bias voltage setting is greater than 0 V. The first and second durations are repeated in an alternating and successive manner for an overall period of time necessary to remove a required amount of the target material exposed on the substrate.
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公开(公告)号:US11011351B2
公开(公告)日:2021-05-18
申请号:US16035423
申请日:2018-07-13
Applicant: Lam Research Corporation
Inventor: Juline Shoeb , Alexander Miller Paterson , Ying Wu
IPC: H01L21/3065 , H01J37/32 , H01L21/67
Abstract: Systems and methods for generating monoenergetic ions are described. A duty cycle of a high parameter level of a multistate parameter signal is maintained and a difference between the high parameter level and a low parameter level of the multistate parameter signal is maintained to generate monoenergetic ions. The monoenergetic ions are used to etch a top material layer of a substrate at a rate that is self-limiting without substantially etching a bottom material layer of the substrate.
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公开(公告)号:US10679825B2
公开(公告)日:2020-06-09
申请号:US15814325
申请日:2017-11-15
Applicant: Lam Research Corporation
Inventor: Ying Wu , Alex Paterson , John Drewery , Arthur Sato
IPC: H01J37/32 , H03H11/28 , H01L21/67 , H01L21/687
Abstract: Systems and methods for applying frequency and match tuning in a non-overlapping manner are described. For example, a radio frequency (RF) generator is tuned for a time interval and an impedance match is not tuned for the time interval. The impedance match is tuned before or after the RF generator is tuned. Such a non-overlap in the tuning of the RF generator and the impedance match facilitates a reduction in reflected power during a pulse without the tuning of the RF generator interfering with the tuning of the impedance match.
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