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    Calibration method and apparatus
    31.
    发明授权
    Calibration method and apparatus 有权
    校准方法和仪器

    公开(公告)号：US08553218B2

    公开(公告)日：2013-10-08

    申请号：US12973248

    申请日：2010-12-20

    申请人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    发明人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    IPC分类号： G01N21/00

    CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

    摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

    摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

    Lithographic apparatus and device manufacturing method
    37.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20080252866A1

    公开(公告)日：2008-10-16

    申请号：US12213149

    申请日：2008-06-16

    申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341

    摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.

    摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。

    Lithographic apparatus and device manufacturing method
    38.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07403261B2

    公开(公告)日：2008-07-22

    申请号：US11012061

    申请日：2004-12-15

    申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70341

    摘要： The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

    摘要翻译： 本发明涉及当封闭表面用于将液体限制在液体供应系统中时，减少光刻设备中浸没液的污染的方法。 为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持离开液体供应系统一定距离，使得闭合表面和液体供应系统之间没有碰撞，但是 液体仍然受到限制。