公开(公告)号：US20080079921A1

公开(公告)日：2008-04-03

申请号：US11839863

申请日：2007-08-16

申请人： Yoshitada Oshida ,  Kazuo Kobayashi

发明人： Yoshitada Oshida ,  Kazuo Kobayashi

IPC分类号： G03B27/52

CPC分类号： G03F7/70291 ,  G03F7/70066 ,  G03F7/70075

摘要： An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.

摘要翻译： 即使二维光学空间调制器的光学调制平面的横向尺寸Hx与纵向尺寸Hy之间的比率Hx / Hy为 例如提供1.5或以上。 将从积分器发射的光引导到二维光学空间调制器的第二光学系统的沿x方向的焦距fx和y方向的焦距fy被制成不同的fx / fy = 1.6，例如。 以这种方式，积分器中的棒状透镜的数量可以在横向和纵向方向上相等，并且通过将棒透镜的纵横比dx：dy设置为1.6:1，可以使得Hx / Hy的值为2.5 1。

公开(公告)号：US07309568B2

公开(公告)日：2007-12-18

申请号：US10229204

申请日：2002-08-26

申请人： Yoshitada Oshida ,  Satoshi Takahashi ,  Kenji Yasuda ,  Taisaku Seino

发明人： Yoshitada Oshida ,  Satoshi Takahashi ,  Kenji Yasuda ,  Taisaku Seino

IPC分类号： C12Q1/68 ,  C12M1/00 ,  B32B5/02 ,  G01N21/00

CPC分类号： G01N21/6428 ,  G01J3/4406 ,  G01N21/6452

摘要： A method and apparatus of stably obtaining fluorescent images of two or more fluorescent samples includes disposing the samples onto compartments defined on a substrate. The compartments are sequentially irradiated with an exciting light where the intensity varies. A value of fluorescence as generated from each of the samples is determined, and a fluorescent image is obtained based on the value of fluorescence.

摘要翻译： 稳定地获得两个或多个荧光样品的荧光图像的方法和装置包括将样品设置在限定在基底上的隔室上。 这些隔室用强度变化的激发光依次照射。 确定从每个样品产生的荧光值，并且基于荧光值获得荧光图像。

公开(公告)号：US20070058149A1

公开(公告)日：2007-03-15

申请号：US11503976

申请日：2006-08-15

申请人： Yoshitada Oshida ,  Kazuo Kobayashi

发明人： Yoshitada Oshida ,  Kazuo Kobayashi

IPC分类号： G03B27/54

CPC分类号： G02B19/0057 ,  G02B19/0014 ,  G03F7/7005 ,  G03F7/70058

摘要： A lighting system and an exposure apparatus in which even if the outgoing optical axes of outgoing beams emitted from a plurality of LDs disposed on a flat plane are shifted, the efficiency of use of the beams can be improved, and the directivity of lighting can be enhanced. Diffused beams output from a plurality of LDs arrayed two-dimensionally are converted into high-directivity beams with spread angles equalized circumferentially by two kinds of cylindrical lenses. In this event, the optical axis of the beam emitted from each LD may tilt due to misalignment of the center of the beam with the optical axes of the corresponding cylindrical lenses. This tilt is corrected by a wedged glass. Thus, the optical axis of the beam output from each LD meets the optical axis in the entrance plane of an integrator.

摘要翻译： 一种照明系统和曝光装置，其中即使从布置在平面上的多个LD发射的出射光束的出射光轴偏移，也可以提高光束的使用效率，并且照明的方向性可以是 增强。 从二维排列的多个LD输出的扩散光束被转换成具有两个柱面透镜周向平行扩展角度的高指向性光束。 在这种情况下，从每个LD发射的光束的光轴可能由于光束的中心与对应的柱面透镜的光轴的不对准而倾斜。 这种倾斜由楔形玻璃校正。 因此，从每个LD输出的光束的光轴与积分器的入射面中的光轴相遇。

公开(公告)号：US20060215139A1

公开(公告)日：2006-09-28

申请号：US11353017

申请日：2006-02-14

申请人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Tsuyoshi Yamaguchi ,  Shigenobu Maruyama

发明人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Tsuyoshi Yamaguchi ,  Shigenobu Maruyama

IPC分类号： G03B27/52

CPC分类号： G02B26/12 ,  G02B26/123 ,  G03F7/70383 ,  G03F7/70466 ,  G03F7/70575 ,  G03F7/70791

摘要： A maskless exposure method and a maskless exposure apparatus in which maskless exposure can be performed efficiently with high-directivity illumination light, while the exposure efficiency of solder resist can be improved. Blue-violet semiconductor lasers 12A emitting laser beams 1a with a wavelength of 405 nm and ultraviolet semiconductor lasers 12B emitting laser beams 1b with a wavelength of 375 nm are provided to irradiate a substrate 8 with the laser beams 1a and 1b whose optical axes are made coaxial. In this event, one and the same place on the substrate 8 is irradiated with the laser beams 1a and 1b a plurality of times. Thus, the variation in intensity of the laser beams 1a and 1b is averaged.

摘要翻译： 可以通过高方向性照明光有效地进行无掩模曝光的无掩模曝光方法和无掩模曝光装置，同时可以提高阻焊剂的曝光效率。 提供波长为405nm的蓝紫色半导体激光器12A和发射波长为375nm的激光束1b的紫外半导体激光器12B以激光束1a和1照射基板8 b的光轴是同轴的。 在这种情况下，多次地用激光束1a和1b照射基板8上的同一个位置。 因此，激光束1a和1b的强度变化是平均的。

公开(公告)号：US5677755A

公开(公告)日：1997-10-14

申请号：US330726

申请日：1994-10-28

申请人： Yoshitada Oshida ,  Yasuhiko Nakayama ,  Masahiro Watanabe ,  Minoru Yoshida ,  Kenichirou Fukuda

发明人： Yoshitada Oshida ,  Yasuhiko Nakayama ,  Masahiro Watanabe ,  Minoru Yoshida ,  Kenichirou Fukuda

IPC分类号： G03F7/20 ,  H01L21/30

CPC分类号： G03F7/70566 ,  G03F7/70125 ,  G03F7/70241

摘要： A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exposed through a projection optical system, wherein a pattern-dependent polarizing mask for giving polarization characteristics in compliance with the direction of the pattern on the mask to the illuminating light transmitted through the pattern; and a pattern exposure apparatus including a illuminating light for exposure, a mask or a reticle, an illumination optical system for irradiating the mask with light emitted from the light source, and a projection optical system for projecting the transmitted or reflected light from the mask onto the object to be exposed, further including polarizing unit for polarizing the illuminating light on the pupil of the projection optical system so as to be nearly rotationally symmetric with respect to the center of the pupil when the mask is not used; and a mask, used with said pattern exposure apparatus, for giving pattern-dependent polarization characteristics; and a semiconductor integrated circuit including fine patterns at least in two directions formed by the pattern exposure method using the pattern-dependent polarizing mask.

摘要翻译： 一种图案曝光方法，包括以下步骤：从用于曝光的照明光源照射具有期望的原始图案的具有期望的方向性的光的掩模或掩模版，并将来自所述掩模的透射或反射的光投射到待曝光的物体 通过投影光学系统，其中用于根据掩模上的图案的方向对透射通过图案的照明光提供偏振特性的图案相关偏光掩模; 以及包括用于曝光的照明光，掩模或掩模版，用于从光源发射的光照射掩模的照明光学系统的图案曝光装置，以及用于将来自掩模的透射或反射的光投射到 要曝光的物体，还包括偏振单元，用于使投影光学系统的光瞳上的照明光偏振，以便当不使用掩模时相对于瞳孔的中心几乎旋转对称; 以及与所述图案曝光装置一起使用的用于赋予图案相关偏振特性的掩模; 以及半导体集成电路，其包括通过使用图案相关偏光掩模的图案曝光方法形成的至少两个方向的精细图案。

公开(公告)号：US5392115A

公开(公告)日：1995-02-21

申请号：US936661

申请日：1992-08-28

申请人： Yoshitada Oshida ,  Taku Ninomiya ,  Toshiei Kurosaki

发明人： Yoshitada Oshida ,  Taku Ninomiya ,  Toshiei Kurosaki

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7026 ,  G03F9/7049

摘要： A method for detecting a period of a periodically varying signal and/or an inclination of a specimen utilizing an exposure apparatus wherein a coherent light is divided into first and second lights and the first light is irradiated onto the specimen at a predetermined angle, and a reflected light thereof and a reference light as the second light interfere with each other so as to form interference fringes, the interference fringes are detected, and the inclination of the specimen is detected from a pitch representing a period of the interference fringes. The method includes detecting a spectrum of a signal intensity obtained from the detected interference fringes or the periodically varying signal, subjecting the detected spectrum data to a fast complex Fourier transformation, calculating a true spectrum peak position j.sub.R in accordance with a relationship j.sub.R =j.sub.0 +.DELTA., where j.sub.0 is a detected spectrum peak position and .DELTA. is a correcting value estimated from the Fourier transformed spectrum data adjacent to j.sub.0, and calculating the pitch P of the period of the signal intensity information in accordance with a relationship P=N/j.sub.R, where N is the number of sample data points for the complex Fourier transformation. Further, the method includes calculating the inclination of the specimen from the pitch P.

摘要翻译： 一种用于检测周期性变化信号的周期和/或利用曝光装置的样本的倾斜的方法，其中相干光被分成第一和第二光，并且第一光以预定角度照射到样本上，并且 其反射光和作为第二光的参考光彼此干涉以形成干涉条纹，则检测干涉条纹，并且从表示干涉条纹周期的间距检测样本的倾斜度。 该方法包括检测从检测到的干涉条纹或周期性变化信号获得的信号强度的频谱，对所检测的频谱数据进行快速复数傅立叶变换，根据关系jR = j0 + DELTA计算真正的频谱峰值位置jR ，其中j0是检测到的频谱峰值位置，并且DELTA是从与j0相邻的傅立叶变换频谱数据估计的校正值，并且根据关系P = N / jR计算信号强度信息的周期的间距P， 其中N是复数傅里叶变换的采样数据点的数量。 此外，该方法包括从间距P计算样本的倾斜度。

公开(公告)号：US5247329A

公开(公告)日：1993-09-21

申请号：US813002

申请日：1991-12-24

申请人： Yoshitada Oshida ,  Toshiei Kurosaki ,  Akira Inagaki ,  Yoshihiko Aiba

发明人： Yoshitada Oshida ,  Toshiei Kurosaki ,  Akira Inagaki ,  Yoshihiko Aiba

IPC分类号： G03F1/44 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7023 ,  G03F7/70241

摘要： A projection type exposure apparatus and method comprising an exposure illumination light source, an exposure illumination system, a mask or reticle on which an original pattern to be projected on the exposed matter is drawn, an optical projection system, a stage for retaining the exposed matter and a mechanism for finely moving the stage along the exposure optical axis. The apparatus is provided with an exposure detection pattern area on the mask, detection illumination means for projecting on the exposure detection pattern area a light ray which is the same or almost the same in wavelength as exposure light having a desired directivity, exposure detection means for detecting the transmitted or reflected light diffracted by 1 degree after the light carrying the image formed on the exposed matter by the light passed through the above-noted optical projection system after projection by the detection illumination means onto the exposure pattern and then diffracted goes in reverse through the above-noted optical projection system and forms an image again on the exposure pattern on the above-noted mask and a control circuit for driving and controlling the above-noted fine movement mechanism by using the signal obtained by the exposure detection means.

摘要翻译： 一种投影式曝光装置和方法，包括曝光照明光源，曝光照明系统，掩模或掩模版，其上将要投射在暴露物体上的原始图案被拉出，光学投影系统，用于保持暴露物质的台 以及用于沿着曝光光轴精细地移动台的机构。 该设备在掩模上设置曝光检测图案区域，检测照明装置用于在曝光检测图案区域上投射与具有所需方向性的曝光光相同或几乎相同的波长的光线，曝光检测装置 在通过检测照明装置投影到曝光图案上之后，在通过上述光学投影系统的光在携带在曝光物体上形成的图像的光之后，将被发射或反射的光衍射1度，然后衍射反向 通过上述光学投影系统并在上述掩模上的曝光图案上再次形成图像，以及通过使用由曝光检测装置获得的信号来驱动和控制上述微动机构的控制电路。

公开(公告)号：US5016149A

公开(公告)日：1991-05-14

申请号：US439436

申请日：1989-11-20

申请人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

发明人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70058 ,  G03F7/70566 ,  G03F7/70583

摘要： An illuminating method and an illuminating apparatus for use in combination, for example, with an exposure apparatus. The illuminating apparatus comprises amplitude distribution control means for converting the intensity distribution of a light beam emitted by a highly directional light source into a substantially linear intensity distribution, beam splitting means for splitting the light beam into a plurality of component beams, and superposing means for superposing the component beams in a desired area on an object, such as a reticle, in an uniform illuminance distribution.

摘要翻译： 照明方法和照明装置，例如用曝光装置组合使用。 该照明装置包括用于将由高度定向的光源发射的光束的强度分布转换为基本线性强度分布的幅度分布控制装置，用于将光束分成多个分量光束的分束装置，以及用于 在均匀的照度分布中将分量光束叠加在物体（例如光罩）上的期望区域中。

公开(公告)号：US4553844A

公开(公告)日：1985-11-19

申请号：US432799

申请日：1982-10-05

申请人： Yasuo Nakagawa ,  Yoshitada Oshida ,  Kanji Ishige

发明人： Yasuo Nakagawa ,  Yoshitada Oshida ,  Kanji Ishige

IPC分类号： H05K3/00 ,  G01B11/00 ,  G01B11/24 ,  G01B11/25 ,  G01N21/88 ,  G01N21/956 ,  H05K3/34

CPC分类号： G01B11/2518

摘要： Method and system of detecting a configuration of a three-dimensional object, in which use is made of a spot beam to be directed to the object. The spot beam is caused to scan the object in a horizontal direction and the resulting spot image is detected through observation in a direction transverse to the horizontal direction. The system includes a laser light source, two Fourier transformation lenses having their Fourier transformation planes intersecting each other on the optical axes of the lenses on a light deflector, a photoelectric converter provided on the object plane of one of the lenses, the laser light source being disposed on the same meridian as the converter, and at least one reflecting mirror provided for forming a real image of the spot of the beam on the object.

摘要翻译： 检测三维物体的构造的方法和系统，其中使用要指向物体的点光束。 使点光束在水平方向上扫描物体，并且通过沿横向于水平方向的方向观察来检测所得到的光斑图像。 该系统包括激光光源，两个傅立叶变换透镜，其傅立叶变换平面在光偏转器上的透镜的光轴上彼此相交，设置在其中一个透镜的物平面上的光电转换器，激光光源 设置在与转换器相同的子午线上，以及至少一个反射镜，用于在物体上形成光束点的实际图像。

公开(公告)号：US4473750A

公开(公告)日：1984-09-25

申请号：US236512

申请日：1981-07-24

申请人： Yoshitada Oshida ,  Yoichi Kawata ,  Shinobu Watanabe ,  Noboru Umehara ,  Kenichi Isoda

发明人： Yoshitada Oshida ,  Yoichi Kawata ,  Shinobu Watanabe ,  Noboru Umehara ,  Kenichi Isoda

IPC分类号： G01B11/24 ,  G01N21/86

CPC分类号： G01B11/24

摘要： A three-dimensional shape measuring device comprises a light beam condensing and irradiating system for irradiating a light beam to an object at a fixed angle .theta. and converging the light beam to a desired minimum diameter at a point A on an optical axis of the light beam, an imaging optical system having an optical axis having an angle .phi. different from the angle .theta. and including the point A on the optical axis thereof, for focusing the point A on an effectively constant aperture of a detecting light screen or on a small area, aperture-transmitted light detecting means or photo-electric converter means for detecting light transmitted through the aperture or the small area, detecting position changing means for changing a relative position between the object and the point A, maximum value detecting means for detecting a maximum value of the signal detected by the aperture-transmitted light detecting means or the photo-electric converter means and detection means for detecting a change in the detecting position caused by the detecting position changing means at a time when the maximum value detecting means detects the maximum value. The change in the detecting position is sequentially detected by the detecting means for each of a plurality of points on the surface of the object to measure the three-dimensional shape of the object.

摘要翻译： 三维形状测量装置包括光束聚光和照射系统，用于以固定角度θ将光束照射到物体，并将光束会聚在光束的光轴上的点A处的期望的最小直径 成像光学系统，其光轴具有与角度θ不同的角度，并且包括其光轴上的点A，用于将点A聚焦在检测光屏的有效恒定的孔上或小区域上， 孔径透过光检测装置或光电转换装置，用于检测透过孔径或小区域的光;检测位置改变装置，用于改变物体与点A之间的相对位置;最大值检测装置，用于检测最大值 由光圈透射光检测装置或光电转换装置检测的信号和检测ac的检测装置 在最大值检测装置检测到最大值时，由检测位置改变装置引起的检测位置的变化。 通过检测装置对物体表面上的多个点中的每个点依次检测检测位置的变化，以测量物体的三维形状。