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62 条记录 (耗时 0.032 秒)

    Apparatus for the production of xanthan gum
    31.
    发明授权
    Apparatus for the production of xanthan gum 失效
    用于生产黄原胶的设备

    公开(公告)号：US06110731A

    公开(公告)日：2000-08-29

    申请号：US206414

    申请日：1998-12-07

    申请人： Kanji Murofushi ,  Shigehiro Nagura ,  Taira Homma

    发明人： Kanji Murofushi ,  Shigehiro Nagura ,  Taira Homma

    IPC分类号： B01F7/00 ,  C12M1/02 ,  C12M1/06 ,  C12P19/06

    CPC分类号： C12M27/08 ,  B01F7/00241 ,  B01F7/00283 ,  B01F7/00341 ,  B01F7/00633 ,  B01F7/00641 ,  B01F7/00691 ,  C12P19/06 ,  C12P19/10

    摘要： A fermenter for the production of xanthan gum is provided with an upper helical impeller and a lower turbine impeller which are positioned therewithin, and an agitator shaft for driving these helical impeller and turbine impeller. The helical impeller consists of a pair of vertically spaced arms extending from the agitator shaft in opposite directions and arranged in twisted relationship, and at least one shearing paddle bridging these arms, and the turbine impeller consists of a rotating disc having at least one turbine blade attached thereto.

    摘要翻译： 用于生产黄原胶的发酵罐设置有定位在其中的上螺旋叶轮和下涡轮叶轮，以及用于驱动这些螺旋叶轮和涡轮叶轮的搅拌轴。 螺旋叶轮包括一对垂直间隔开的臂，其从相反方向从搅拌器轴延伸并且以扭曲关系布置，并且至少一个桥接这些臂的剪切桨，涡轮叶轮由具有至少一个涡轮叶片 附在其上。

    Chemically amplified positive resist composition
    32.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5876900A

    公开(公告)日：1999-03-02

    申请号：US831300

    申请日：1997-04-01

    申请人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Shigehiro Nagura ,  Tsuguo Yamaoka

    发明人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Shigehiro Nagura ,  Tsuguo Yamaoka

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/029 ,  G03F7/033

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.

    摘要翻译： 化学放大型正性抗蚀剂组合物含有（A）有机溶剂，（B）具有酚羟基的聚羟基苯乙烯形式的基础树脂，其中一些被羟基烷基保护，并且其重均分子量为3,000-300,000 分散度为1.0〜1.5，（C）光致酸产生剂，（D）含乙烯基醚基的化合物。 该组合物对光化辐射敏感，特别是KrF准分子激光束，具有高灵敏度和分辨率，并且形成具有改善的等离子体耐蚀刻性和耐热性的抗蚀剂图案。

    Process for production of saline-solution soluble xanthan gum
    33.
    发明授权
    Process for production of saline-solution soluble xanthan gum 失效
    生产盐溶液可溶性黄原胶的方法

    公开(公告)号：US5864034A

    公开(公告)日：1999-01-26

    申请号：US598645

    申请日：1996-02-06

    申请人： Kanji Murofushi ,  Shigehiro Nagura

    发明人： Kanji Murofushi ,  Shigehiro Nagura

    IPC分类号： C08B37/00 ,  C07H1/00

    CPC分类号： C08B37/0033

    摘要： A process for saline-solution soluble xanthan gum which comprises the steps of precipitating xanthan gum by mixing, with stirring, an aqueous solution of xanthan gum with an organic solvent which is a non-solvent to xanthan gum but is hydrophilic, removing liquid from the precipitated xanthan gum to a liquid content of at most 50%, disintegrating the cake of xanthan gum after the liquid removal to an average grain size of from 0.3 to 2 cm in diameter, and drying the disintegrated xanthan gum by fluidizing the same at a temperature not exceeding 80.degree. C.

    摘要翻译： 一种盐溶液可溶性黄原胶的方法，其包括以下步骤：通过在搅拌下将黄原胶水溶液与黄原胶的非溶剂的有机溶剂搅拌混合，但是是亲水的，从而将黄原胶从 沉淀的黄原胶至液体含量至多为50％，在去除液体后将黄原胶的饼块分解成直径为0.3至2厘米的平均粒径，并通过在分解温度 不超过80℃

    Chemically amplified positive resist composition
    35.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5750309A

    公开(公告)日：1998-05-12

    申请号：US684481

    申请日：1996-07-19

    申请人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    发明人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： In a chemical amplification positive resist composition comprising an organic solvent, a resin and a photoacid generator, at least two polymers having different molecular weights selected from polyhydroxystyrenes having some hydroxyl groups protected with acid labile groups are used. Among the polymers, a high molecular weight polymer has a molecular weight dispersity (Mw1/Mn1) of up to 1.5, and a low molecular weight polymer has a dispersity (Mw2/Mn2) of up to 5.0. The weight average molecular weight ratio Mw1/Mw2 is between 1.5/1 and 10.0/1. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

    摘要翻译： 在包含有机溶剂，树脂和光致酸发生剂的化学放大正性抗蚀剂组合物中，使用至少两种具有不同分子量的聚合物，其选自具有用酸不稳定基保护的一些羟基的多羟基苯乙烯。 在聚合物中，高分子量聚合物的分子量分散性（Mw1 / Mn1）高达1.5，低分子量聚合物的分散性（Mw2 / Mn2）高达5.0。 重均分子量Mw1 / Mw2在1.5 / 1和10.0 / 1之间。 抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。

    Method for fermentation production of xanthan gum
    37.
    发明授权
    Method for fermentation production of xanthan gum 失效
    黄原胶发酵生产方法

    公开(公告)号：US5580763A

    公开(公告)日：1996-12-03

    申请号：US296115

    申请日：1994-08-25

    申请人： Taira Honma ,  Shigehiro Nagura ,  Kanji Murofushi

    发明人： Taira Honma ,  Shigehiro Nagura ,  Kanji Murofushi

    IPC分类号： C08B37/00 ,  C12P19/06 ,  C12R1/64

    CPC分类号： C12P19/06

    摘要： A method for the fermentation production of xanthan gum which comprises the step of carrying out culture by using a water-soluble inorganic nitrogen component alone as the nitrogen source of a production medium, and by mixing and using the water-soluble inorganic nitrogen component and a water-insoluble organic nitrogen component as the nitrogen sources of a seed fermentation medium.

    摘要翻译： 一种发酵生产黄原胶的方法，包括通过使用单独的水溶性无机氮组分作为生产介质的氮源进行培养的步骤，并通过混合和使用水溶性无机氮组分和 水不溶性有机氮组分作为种子发酵培养基的氮源。

    Resist compositions and patterning process
    40.
    发明授权
    Resist compositions and patterning process 有权
    抗蚀剂组合物和图案化工艺

    公开(公告)号：US06338931B1

    公开(公告)日：2002-01-15

    申请号：US09637595

    申请日：2000-08-15

    申请人： Kazunori Maeda ,  Takeshi Nagata ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Jun Watanabe ,  Shigehiro Nagura

    发明人： Kazunori Maeda ,  Takeshi Nagata ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Jun Watanabe ,  Shigehiro Nagura

    IPC分类号： G03F7039

    CPC分类号： G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

    摘要： A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of the formula (1): wherein R1 is C1-10 alkyl or C6-14 aryl, R2 is C1-6 alkyl, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is an integer of 0 to 4, q is an integer of 1 to 5, 1≦p+q≦5, n is 1 or 2, m is 0 or 1, and n+m=2. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.

    摘要翻译： 化学放大型抗蚀剂组合物含有式（1）的磺酰基二氮甲烷化合物作为光酸产生剂：其中R1是C1-10烷基或C6-14芳基，R2是C1-6烷基，G是SO2或CO，R3是C1 -10烷基或C6-14芳基，p为0〜4的整数，q为1〜5的整数，1 <= p + q <= 5，n为1或2，m为0或1， n + m = 2。 该组合物特别适用于微细加工，因为包括改进的分辨率，最小化的线宽变化或形状退化的许多优点，即使在长期PED，涂布后的最小化碎片，显影和剥离以及显影后的改进的图案轮廓方面也是如此。