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    Methods of controlling molecular weight distribution of polymers and compositions thereof
    31.
    发明授权
    Methods of controlling molecular weight distribution of polymers and compositions thereof 有权
    控制聚合物分子量分布的方法及其组合物

    公开(公告)号：US07858729B2

    公开(公告)日：2010-12-28

    申请号：US12129106

    申请日：2008-05-29

    申请人： Scott D. Allen

    发明人： Scott D. Allen

    IPC分类号： C08G64/00 ,  C08G63/02

    CPC分类号： C08G64/34

    摘要： A catalyst, co-catalyst, and/or chain transfer agent is added at a time after initiation of an addition polymerization reaction to produce a polymer product with a widened molecular weight distribution relative to having all of the components in the original reaction mixture. The catalyst, co-catalyst, or chain transfer agent may be added discretely or continuously to the reaction to produce a product with a bimodal, trimodal, or other broadened molecular weight distribution.

    摘要翻译： 在开始加成聚合反应后，加入催化剂，助催化剂和/或链转移剂，以产生相对于在原始反应混合物中具有所有组分的扩大的分子量分布的聚合物产物。 催化剂，助催化剂或链转移剂可以离散地或连续地加入到反应中，以产生具有双峰，三峰或其它更宽分子量分布的产物。

    Method for post lithographic critical dimension shrinking using thermal reflow process
    32.
    发明授权
    Method for post lithographic critical dimension shrinking using thermal reflow process 失效
    使用热回流工艺的后平版印刷临界尺寸收缩的方法

    公开(公告)号：US07494919B2

    公开(公告)日：2009-02-24

    申请号：US10905579

    申请日：2005-01-12

    申请人： Colin J. Brodsky ,  Scott D. Allen

    发明人： Colin J. Brodsky ,  Scott D. Allen

    IPC分类号： H01L21/4763

    CPC分类号： H01L21/0273 ,  G03F7/091 ,  G03F7/40 ,  H01L21/0276

    摘要： A method for reducing the size of a patterned semiconductor feature includes forming a first layer over a substrate to be patterned, and forming a photoresist layer over the first layer. The photoresist layer is patterned so as to expose portions of the first layer, and the exposed portions of the first layer are removed in a manner so as to create an undercut region beneath the patterned photoresist layer. The patterned photoresist layer is reflowed so as to cause reflowed portions of the patterned photoresist layer to occupy at least a portion of the undercut region.

    摘要翻译： 用于减小图案化半导体特征的尺寸的方法包括在待图案化的衬底上形成第一层，以及在第一层上形成光致抗蚀剂层。 图案化光致抗蚀剂层以暴露第一层的部分，并且以使得在图案化的光致抗蚀剂层下面形成底切区域的方式去除第一层的暴露部分。 图案化的光致抗蚀剂层被回流以使图案化的光致抗蚀剂层的回流部分占据底切区域的至少一部分。

    POLYCARBONATE POLYOL COMPOSITIONS
    36.
    发明申请
    POLYCARBONATE POLYOL COMPOSITIONS 有权
    聚碳酸酯多元醇组合物

    公开(公告)号：US20130303724A1

    公开(公告)日：2013-11-14

    申请号：US13988804

    申请日：2011-11-23

    申请人： Scott D. Allen ,  Armin Michel

    发明人： Scott D. Allen ,  Armin Michel

    IPC分类号： C08G64/02

    CPC分类号： C08G64/0208 ,  C08G18/44 ,  C08G18/73 ,  C08G64/183 ,  C09D175/04 ,  Y10T428/2951

    摘要： The present invention provides polycarbonate polyol compositions with improved characteristics. Such polycarbonate polyol compositions are useful in thermosetting applications for the production of coatings for consumer products. The present invention provides compositions having such improved characteristics, in particular, polycarbonate polyol compositions having a glass transition temperature (Tg) from about −20° C. to about 60° C., from about −20° C. to about 50° C., or from about 0° C. to about 30° C., are particularl useful in thermosetting applications. In some embodiments, polycarbonate polyol compositions have a Tg from about −20° C. to about 3° C. In some embodiments, polycarbonate polyol compositions have a Tg from about 0° C. to about 50° C., from about 0° C. to about 50° C., or from about 10 “C. to about 40° C.

    摘要翻译： 本发明提供具有改进特性的聚碳酸酯多元醇组合物。 这种聚碳酸酯多元醇组合物可用于生产用于消费品的涂料的热固性应用中。 本发明提供具有这种改进特性的组合物，特别是具有约-20℃至约60℃，约-20℃至约50℃的玻璃化转变温度（Tg）的聚碳酸酯多元醇组合物 ，或约0℃至约30℃，特别适用于热固性应用。 在一些实施方案中，聚碳酸酯多元醇组合物的Tg为约-20℃至约3℃。在一些实施方案中，聚碳酸酯多元醇组合物的Tg为约0℃至约50℃，约0℃ 约50℃，或约10℃至约40℃。