公开(公告)号：US20130017343A1

公开(公告)日：2013-01-17

申请号：US13431880

申请日：2012-03-27

申请人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Seung-Yong Song

发明人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Seung-Yong Song

IPC分类号： H05B33/10 ,  H05H1/24 ,  C23C16/04 ,  C23C16/50

CPC分类号： C23C16/45542 ,  C23C16/45551 ,  C23C16/4587

摘要： A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.

摘要翻译： 一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法，以及制造有机发光显示装置的方法。 该蒸镀装置具备包括排气口的室， 设置在所述室中的台，并且包括将要设置所述基板的安装表面; 注射部分，其包括至少一个注射开口，气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器，其与衬底分离设置以面对衬底。

公开(公告)号：US08940368B2

公开(公告)日：2015-01-27

申请号：US13530924

申请日：2012-06-22

申请人： Choel-Min Jang ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim

发明人： Choel-Min Jang ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim

IPC分类号： C23C16/458 ,  C23C16/455

CPC分类号： C23C16/46 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/4583

摘要： A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.

摘要翻译： 蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置 相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。

公开(公告)号：US20130266728A1

公开(公告)日：2013-10-10

申请号：US13613804

申请日：2012-09-13

申请人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

发明人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

IPC分类号： C23C16/455

CPC分类号： C23C16/45551

摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.

摘要翻译： 在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到 衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上， 并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。 当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

公开(公告)号：US20130251902A1

公开(公告)日：2013-09-26

申请号：US13572420

申请日：2012-08-10

申请人： Sung-Yong Lee ,  Myung-Soo Huh ,  Choel-Min Jang ,  Cheol-Rae Jo ,  In-Kyo Kim ,  Yong-Suk Lee ,  Mi-Ra An ,  Sang-Joon Seo

发明人： Sung-Yong Lee ,  Myung-Soo Huh ,  Choel-Min Jang ,  Cheol-Rae Jo ,  In-Kyo Kim ,  Yong-Suk Lee ,  Mi-Ra An ,  Sang-Joon Seo

IPC分类号： C23C16/44 ,  C23C16/00

CPC分类号： C23C16/45551 ,  C23C16/4583

摘要： A thin film depositing apparatus and a thin film depositing method used by the thin film depositing apparatus. The thin film depositing apparatus includes a deposition chamber through which a process gas outlet of a deposition source is arranged; a transfer shuttle disposed in the deposition chamber, the transfer shuttle comprising a mounting plate for loading a substrate, the transfer shuttle being reciprocal with respect to the process gas outlet; and at least one bendable auxiliary plate installed at one side of the transfer shuttle, the bendable auxiliary plate closing the process gas outlet when opposite the process gas outlet, the bendable auxiliary plate comprising a folding member for placing the bendable auxiliary plate in each of an unbent state and bent state dependent upon the position of the transfer shuttle.

摘要翻译： 薄膜沉积设备使用的薄膜沉积设备和薄膜沉积方法。 薄膜沉积设备包括沉积室，沉积源的处理气体出口通过其沉积; 设置在所述沉积室中的传送梭，所述传送梭包括用于装载基底的安装板，所述传送梭相对于所述处理气体出口是往复的; 以及安装在所述传送梭的一侧的至少一个可弯曲辅助板，所述可弯曲辅助板在与所述工艺气体出口相对的位置处关闭所述工艺气体出口，所述可弯曲辅助板包括折叠构件，用于将所述可弯曲辅助板放置在 取决于转移梭的位置的弯曲状态和弯曲状态。

公开(公告)号：US20130108778A1

公开(公告)日：2013-05-02

申请号：US13607534

申请日：2012-09-07

申请人： Sang-Joon Seo ,  Jae-Eung Oh

发明人： Sang-Joon Seo ,  Jae-Eung Oh

IPC分类号： H05B33/10

CPC分类号： C23C16/50 ,  C23C16/042 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/45542 ,  C23C16/45548 ,  C23C16/45574 ,  C23C16/4583 ,  C23C16/54 ,  H01J37/321 ,  H01J37/32834 ,  H01L51/56

摘要： A vapor deposition apparatus efficiently performs a deposition process to form a thin film with improved characteristics on a substrate, and a method manufactures an organic light-emitting display apparatus by using such vapor deposition apparatus. The vapor deposition apparatus includes a body including an upper member and a lateral member coupled to the upper member; a receiving portion disposed to face one side of the lateral member; a stage disposed in the receiving portion and supporting the substrate; a plurality of first injection portions disposed in the lateral member and injecting at least one gas into a space between the lateral member and the upper member; a second injection portion disposed in the upper member and injecting at least one gas into the space between the lateral member and the upper member; and a plasma generating portion including a coil and a power source connected to the coil.

公开(公告)号：US20130017318A1

公开(公告)日：2013-01-17

申请号：US13352191

申请日：2012-01-17

申请人： Sang-Joon Seo ,  Seung-Yong Song ,  Seung-Hun Kim ,  Jin-Kwang Kim

发明人： Sang-Joon Seo ,  Seung-Yong Song ,  Seung-Hun Kim ,  Jin-Kwang Kim

IPC分类号： H01J9/00 ,  C23C16/458 ,  C23C16/04 ,  C23C16/455

CPC分类号： C23C16/042 ,  C23C16/45551 ,  C23C16/45589 ,  C23C16/4587 ,  H01L27/3244 ,  H01L51/001 ,  H05B33/10

摘要： A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes: a chamber having an exhaust opening; a stage disposed in the chamber, and comprising a mounting surface on which the substrate may be mounted; an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with a surface of the substrate, on which the thin film is to be formed; a guide member facing the substrate to provide a set or predetermined space between the substrate and the guide member; and a driving unit conveying the stage and the guide member.

摘要翻译： 能够进行薄膜沉积工艺和改善所形成的薄膜特性的气相沉积设备包括：具有排气口的室; 设置在所述室中的台，并且包括其上可以安装所述基板的安装表面; 注射单元，其具有至少一个注射开口，用于在平行于要形成所述薄膜的所述基底的表面的方向上将气体注入所述腔室; 面向所述基板的引导构件，以在所述基板和所述引导构件之间提供设定的或预定的空间; 以及传送台和引导构件的驱动单元。

公开(公告)号：US20120312232A1

公开(公告)日：2012-12-13

申请号：US13313978

申请日：2011-12-07

申请人： Seung-Hun Kim ,  Sang-Joon Seo ,  Jin-Kwang Kim ,  Jun-Hyuk Cheon

发明人： Seung-Hun Kim ,  Sang-Joon Seo ,  Jin-Kwang Kim ,  Jun-Hyuk Cheon

IPC分类号： C23C16/455

CPC分类号： C23C16/45551

摘要： An inline deposition apparatus includes a chamber; a loading unit inside the chamber and loaded with an object to be processed to be moved in a first direction; a plurality of first deposition modules in the chamber for depositing a first layer to the object to be processed; and a plurality of second deposition modules in the chamber for depositing a second layer to the object to be processed, wherein at least one of the plurality of second deposition modules is positioned between neighboring first deposition modules, and wherein the first layer is different from the second layer.

摘要翻译： 在线沉积设备包括：室; 所述加载单元在所述腔室内并且被加载待处理物体沿第一方向移动; 在所述室中的多个第一沉积模块，用于将第一层沉积到待处理物体; 以及在所述腔室中的多个第二沉积模块，用于将第二层沉积到待处理物体上，其中所述多个第二沉积模块中的至少一个位于相邻的第一沉积模块之间，并且其中所述第一层不同于 第二层。

公开(公告)号：US08211725B2

公开(公告)日：2012-07-03

申请号：US13040906

申请日：2011-03-04

申请人： Yong-Hwan Park ,  Jae-Seob Lee ,  Moo-Jin Kim ,  Young-Shin Pyo ,  Sang-Joon Seo ,  Hoon-Kee Min ,  Dong-Un Jin

发明人： Yong-Hwan Park ,  Jae-Seob Lee ,  Moo-Jin Kim ,  Young-Shin Pyo ,  Sang-Joon Seo ,  Hoon-Kee Min ,  Dong-Un Jin

IPC分类号： H01L21/00

CPC分类号： H01L27/1266 ,  H01L27/1218 ,  H01L27/1292 ,  H01L2251/566

摘要： A method of manufacturing a flexible display device is disclosed. The method includes arranging a first substrate having a plurality of depression units, forming a first plastic film in each of the plurality of depression units, forming a thin film transistor (TFT) on the first plastic film, forming a display device on the TFT, where the display device is configured to be electrically connected to the TFT, encapsulating an upper portion of the display device, cutting the first substrate, and separating the first substrate from the first plastic film.

摘要翻译： 公开了制造柔性显示装置的方法。 该方法包括布置具有多个凹陷单元的第一基板，在多个凹陷单元中的每一个中形成第一塑料膜，在第一塑料膜上形成薄膜晶体管（TFT），在TFT上形成显示装置， 其中所述显示装置被配置为电连接到所述TFT，封装所述显示装置的上部，切割所述第一基板，以及将所述第一基板与所述第一塑料膜分离。

公开(公告)号：US09012257B2

公开(公告)日：2015-04-21

申请号：US13356301

申请日：2012-01-23

申请人： Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Seung-Yong Song

发明人： Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Seung-Yong Song

IPC分类号： C23C16/455 ,  C23C16/458 ,  C23C16/54 ,  H01L51/56 ,  C23C16/04 ,  H01L51/00

CPC分类号： C23C16/042 ,  C23C16/45544 ,  C23C16/45563 ,  C23C16/4587 ,  H01L51/001

摘要： A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes a chamber having an exhaust opening; a stage located in the chamber, and including a plurality of mounting surfaces on which the plurality of substrates may be mounted; and an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with surfaces of the plurality of substrates.

摘要翻译： 能够进行薄膜沉积工艺并改善所形成的薄膜特性的气相沉积设备包括具有排气口的室; 位于所述室中的台，并且包括多个安装表面，所述多个基板可以安装在所述多个安装表面上; 以及具有至少一个注射开口的注射单元，所述注射开口用于沿着与所述多个基底的表面平行的方向将气体注入所述腔室。

公开(公告)号：US08975660B2

公开(公告)日：2015-03-10

申请号：US13438574

申请日：2012-04-03

申请人： Jin-Kwang Kim ,  Sang-Joon Seo ,  Seung-Hun Kim

发明人： Jin-Kwang Kim ,  Sang-Joon Seo ,  Seung-Hun Kim

IPC分类号： H01L33/00 ,  H01L51/52 ,  H01L27/32

CPC分类号： H01L51/5256 ,  H01L27/3246

摘要： An organic light emitting diode (OLED) display includes: a substrate; an organic light emitting diode formed on the substrate; a first inorganic layer formed on the substrate and covering the organic light emitting diode; an intermediate layer formed on the first inorganic layer and covering an area relatively smaller than the first inorganic layer; and a second inorganic layer formed on the first inorganic layer and the intermediate layer, and contacting the first inorganic layer at an edge thereof while covering a relatively larger area than the intermediate layer. A third inorganic layer may be formed on the second inorganic layer so as to contact the second inorganic layer at an edge thereof. At least one of the first, second and third inorganic layers is formed by an atomic layer deposition (ALD) method.

摘要翻译： 有机发光二极管（OLED）显示器包括：基板; 形成在所述基板上的有机发光二极管; 形成在所述基板上并覆盖所述有机发光二极管的第一无机层; 形成在所述第一无机层上并覆盖比所述第一无机层相对小的区域的中间层; 以及形成在所述第一无机层和所述中间层上的第二无机层，并且在覆盖比所述中间层相对较大的区域的边缘处与所述第一无机层接触。 可以在第二无机层上形成第三无机层，以便在其边缘与第二无机层接触。 第一，第二和第三无机层中的至少一个由原子层沉积（ALD）方法形成。