公开(公告)号：US20210269642A1

公开(公告)日：2021-09-02

申请号：US17174480

申请日：2021-02-12

Applicant: DuPont Toray Specialty Materials Kabushiki Kaisha ,  Rohm and Haas Electronic Materials LLC ,  Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Shunya Takeuchi ,  Anna Ya Ching Feng ,  Yutaka Oka ,  Jung Hye Chae

IPC: C08L83/04 ,  C08G77/20 ,  C08G77/28 ,  C08G77/00 ,  C08K5/132 ,  C08K5/18 ,  C08K5/5397

Abstract: A UV curable silicone composition has exceptional curability by ultraviolet irradiation.
The UV curable silicone composition includes (A) an organopolysiloxane composition selected from the following: (A-1) an organopolysiloxane composition comprising a linear organopolysiloxane in which both ends of the molecular chain are capped with alkenyl groups and/or a branched organopolysiloxane containing at least 2 alkenyl groups at the ends of the molecular chain, and an organopolysiloxane containing at least 2 thiol groups in side-chains of the molecular chain, wherein the thiol group content is 1% by mass or more per molecule, (A-2) an organopolysiloxane composition comprising a linear organopolysiloxane in which both ends of the molecular chain are capped with thiol groups, wherein the thiol group content is 1% by mass or more per molecule, and an organopolysiloxane containing at least 2 alkenyl groups in side-chains of the molecular chain and/or a resinous organopolysiloxane containing at least 2 alkenyl groups at the ends of the molecular chain, or (A-3) an organopolysiloxane composition comprising an alkenyl group- and aryl group-containing organopolysiloxane and a multifunctional thiol compound, but furthermore comprising an alkenyl group-containing resinous organopolysiloxane when the multifunctional thiol compound contains only a bifunctional thiol compound, and (B) a silicone-compatible photo-initiator comprising a compound selected from the following: (B-1) an alpha-hydroxyacetophenone, (B-2) a combination of an alpha-hydroxyacetophenone and an alpha-aminoalkylphenone, or (B-3) a combination of an alpha-hydroxyacetophenone and a mono-acylphosphine oxide, wherein the ratio between the thiol groups and alkenyl groups (SH/Vi ratio) included in the organopolysiloxane composition is 0.6 or more.

公开(公告)号：US20210247695A1

公开(公告)日：2021-08-12

申请号：US17245326

申请日：2021-04-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Sheng Liu ,  James F. Cameron ,  Shintaro Yamada ,  Iou-Sheng Ke ,  Keren Zhang ,  Daniel Greene ,  Paul J. LaBeaume ,  Li Cui ,  Suzanne M. Coley

IPC: G03F7/11 ,  C09D5/00 ,  G03F7/075

Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

公开(公告)号：US20210200084A1

公开(公告)日：2021-07-01

申请号：US16731666

申请日：2019-12-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Jong Keun Park ,  Emad Aqad ,  Yang Song ,  Chunyi Wu ,  Colin Liu ,  Mingqi Li

IPC: G03F7/038 ,  C08F212/14 ,  G03F7/039

Abstract: A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other.

公开(公告)号：US20210198389A1

公开(公告)日：2021-07-01

申请号：US17106261

申请日：2020-11-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Colin Hayes ,  Colin Calabrese ,  Michael K. Gallagher ,  Kevin Y. Wang ,  Robert K. Barr

IPC: C08F2/50 ,  G03F7/028 ,  C08F222/40 ,  C08G73/10 ,  G03F7/20 ,  C08F212/08 ,  C08F220/18 ,  C08F2/38 ,  C08F236/04

Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.

公开(公告)号：US20210020837A1

公开(公告)日：2021-01-21

申请号：US16320273

申请日：2017-08-11

Applicant: Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

Inventor： Laura HAVENS ,  Sukrit Mukhopadhyay ,  David S. Laitar ,  David D. Devore ,  Aaron A. Rachford ,  Erich J. Moiitor

IPC: H01L51/00 ,  C07F7/10 ,  C07D471/04

Abstract: Provided is a composition comprising a compound having structure (I) wherein each of A1, A2, A3, A4, A5, A6, A7, and A8 is independently CR12 or N; wherein one to four of A1, A2, A3, A4, A5, A6, A7, and A8 are N; wherein J1 is C or Si; wherein J2 is C(R13)n, O, (C(R13)n)2, S, NR13, or Se; wherein n is 1 or 2; wherein each of R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, and R13 is independently H, deuterium, or an organic group. Also provided is a method of making the composition, a method of making an organic light-emitting diode using the composition, and an organic light-emitting diode made by that method.

公开(公告)号：US20210017308A1

公开(公告)日：2021-01-21

申请号：US16909067

申请日：2020-06-23

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Yixuan Song ,  Lujia Bu ,  Neelima Chandrayan ,  Deyan Wang ,  Anton Li ,  Jieqian Zhang

IPC: C08F20/34 ,  G06F1/16 ,  G09G3/00 ,  C08F20/18 ,  C08F22/10 ,  C08F2/50

Abstract: Compositions for forming polymer layers useful in the manufacture of display devices, particularly flexible display, and methods of forming such devices are provided.

公开(公告)号：US10892802B2

公开(公告)日：2021-01-12

申请号：US16603319

申请日：2019-10-07

Applicant: Dow Global technologies LLC ,  Rohm and Haas Electronic Materials LLC

Inventor： Lingli Duan ,  Chen Chen ,  Shaoguang Feng ,  Zukhra I. Niazimbetova ,  Maria Anna Rzeznik

IPC: H04B7/0408 ,  H04B7/06 ,  C07D241/04 ,  C07D265/33 ,  C07D413/06 ,  C07D413/10 ,  C07D413/12 ,  C08G73/02 ,  C08G73/10 ,  C09D179/02 ,  C09D179/08 ,  C25D3/30 ,  C25D3/32 ,  C25D3/38 ,  C25D3/58 ,  C25D3/60 ,  H04J4/00 ,  H04J13/00 ,  H04L1/00 ,  H04W72/04 ,  H04W36/00

Abstract: A method of providing spatial diversity for critical data delivery in a beamformed mmWave small cell is proposed. The proposed spatial diversity scheme offers duplicate or incremental data/signal transmission and reception by using multiple different beams for the same source and destination. The proposed spatial diversity scheme can be combined with other diversity schemes in time, frequency, and code, etc. for the same purpose. In addition, the proposed spatial diversity scheme combines the physical-layer resources associated with the beams with other resources of the same or different protocol layers. By spatial signaling repetition to avoid Radio Link Failure (RLF) and Handover Failure (HOF), mobility robustness can be enhanced. Mission-critical and/or time-critical data delivery can also be achieved without relying on retransmission.

公开(公告)号：US10889905B2

公开(公告)日：2021-01-12

申请号：US16593397

申请日：2019-10-04

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Andreas Scheybal ,  Katharina Weitershaus ,  Krishna Balantrapu

IPC: C25C1/10 ,  C08J7/14

Abstract: Manganese-(III) species is generated and regenerated in a mixed aqueous acid solution containing manganese-(II) species by injecting ozone gas in the mixed aqueous acid solution such that ozone oxidizes at least some of the manganese-(II) species to the manganese-(III) species with at least 60% Mn(III) generation efficiency. The acids include sulfuric acid and an alkane sulfonic acid. The aqueous acid solution containing manganese-(III) and manganese-(II) species is used to etch polymer materials. The etch is a chrome-free etch method.

公开(公告)号：US10889675B2

公开(公告)日：2021-01-12

申请号：US16078878

申请日：2017-05-12

Applicant: Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

Inventor： Zhifeng Bai ,  Jake Joo ,  James C. Taylor ,  Liang Chen ,  Valeriy V. Ginzburg ,  Jessica Ye Huang ,  Christopher J. Tucker

IPC: B82Y20/00 ,  B82Y40/00 ,  C08F287/00 ,  C08F292/00 ,  C09K11/02 ,  C08K5/10 ,  C08K3/08 ,  B82Y30/00

Abstract: A polymer resin comprising: (a) quantum dots, (b) a compound of formula (I) (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent, and (c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm3)1/2.

公开(公告)号：US10886119B2

公开(公告)日：2021-01-05

申请号：US16502062

申请日：2019-07-03

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Sheng Liu ,  James F. Cameron ,  Shintaro Yamada

IPC: H01L29/08 ,  H01L35/24 ,  H01L51/00 ,  H01L23/62 ,  H01L21/02 ,  C08L61/30 ,  C08L65/00 ,  H01L21/3213

Abstract: Curable homopolymers formed from monomers having two 2-naphthol moieties are useful as underlayers in semiconductor manufacturing processes.