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    Coating composition for photoresist underlayer
    1.
    发明授权
    Coating composition for photoresist underlayer 有权

    公开(公告)号：US11762294B2

    公开(公告)日：2023-09-19

    申请号：US17007877

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC: G03F7/11 ,  G03F7/09

    CPC classification number: G03F7/11 ,  G03F7/091 ,  G03F7/094

    Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1):




    wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER
    2.
    发明申请
    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER 有权

    公开(公告)号：US20220066320A1

    公开(公告)日：2022-03-03

    申请号：US17007877

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC: G03F7/11 ,  G03F7/09

    Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C1-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
    3.
    发明申请
    COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES 有权

    公开(公告)号：US20210341840A1

    公开(公告)日：2021-11-04

    申请号：US17231417

    申请日：2021-04-15

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Sheng Liu ,  James F. Cameron ,  Shintaro YAMADA ,  Iou-Sheng KE ,  Keren ZHANG ,  Suzanne M. Coley ,  Li Cui ,  Paul J. LaBeaume ,  Deyan Wang

    IPC: G03F7/11 ,  G03F7/09 ,  G03F7/075 ,  G03F7/20 ,  G03F7/16 ,  C09D7/47 ,  C09D7/63 ,  C09D4/06

    Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Ar1 is chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, and a C4-30 fused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(═O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(═O)—R1, and S(═O)2—R1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar1; and * denotes the point of attachment to the core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
    8.
    发明申请
    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS 有权

    公开(公告)号：US20220066321A1

    公开(公告)日：2022-03-03

    申请号：US17007903

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  James F. Cameron ,  Emad Aqad ,  Iou-Sheng Ke ,  Suzanne M. Coley

    IPC: G03F7/11 ,  C08G8/04 ,  C09D161/06

    Abstract: An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.

    CURABLE RESIN COMPOSITIONS WITH ENHANCED SHELF LIFE
    9.
    发明申请
    CURABLE RESIN COMPOSITIONS WITH ENHANCED SHELF LIFE 有权

    公开(公告)号：US20210340329A1

    公开(公告)日：2021-11-04

    申请号：US17195706

    申请日：2021-03-09

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Michael MULZER ,  Sheng Liu ,  Dung Quach

    IPC: C08G77/04 ,  C09D183/04 ,  C09D7/20 ,  C09D7/61 ,  C09D7/65 ,  C09D7/40 ,  C09D7/63

    Abstract: Disclosed is a curable resin composition comprising: (a) a liquid siloxane oligomer comprising polymerized units of formula R1mR2nSi(OR3)4-m-n, wherein R1 is a C5-C20 aliphatic group comprising an oxirane ring fused to an alicyclic ring, R2 is a C1-C20 alkyl, C6-C30 aryl group, or a C5-C20 aliphatic group having one or more heteroatoms, R3 is a C1-C4 alkyl group or a C1-C4 acyl group, m is 0.1 to 2.0 and n is 0 to 2.0; (b) non-hollow nanoparticles of silica, a metal oxide, or a mixture thereof, the non-hollow nanoparticles having an average particle diameter from 5 to 50 nm; (c) a volatile monoprotic alcohol cosolvent; (d) a surfactant; and (e) a photoacid generator. Further disclosed are associated methods and manufactured articles.

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