公开(公告)号：US10962890B2

公开(公告)日：2021-03-30

申请号：US16959738

申请日：2018-11-29

Applicant: ASML Netherlands B.V.

Inventor： Wilhelmus Franciscus Johannes Simons ,  Dave Braaksma ,  Hans Butler ,  Hendrikus Herman Marie Cox ,  René Wilhelmus Antonius Hubertus Leenaars ,  Stephan Christiaan Quintus Libourel ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

公开(公告)号：US20210088917A1

公开(公告)日：2021-03-25

申请号：US16772022

申请日：2018-12-07

Applicant: ASML Netherlands B.V.

Inventor： Cyrus Emil TABERY ,  Simon Hendrik Celine VAN GORP ,  Simon Philip Spencer HASTINGS ,  Brennan PETERSON

IPC: G03F7/20 ,  H01L21/66 ,  H01L23/544

Abstract: A measurement mark is disclosed. According to certain embodiments, the measurement mark includes a set of first test structures developed in a first layer on a substrate, each of the set of first test structures comprising a plurality of first features made of first conducting material. The measurement mark also includes a set of second test structures developed in a second layer adjacent to the first layer, each of the set of second test structures comprising a plurality of second features made of second conducting material. The measurement mark is configured to indicate connectivity between the set of first test structures and associated second test structures in the set of second test structures when imaged using a voltage-contrast imaging method.

公开(公告)号：US10955595B2

公开(公告)日：2021-03-23

申请号：US16072399

申请日：2017-02-17

Applicant: ASML Netherlands B.V.

Inventor： Koos Van Berkel ,  Adrianus Hendrik Koevoets

IPC: G02B7/18 ,  G02B5/08 ,  G03F1/24 ,  G03F7/20

Abstract: A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

公开(公告)号：US20210080836A1

公开(公告)日：2021-03-18

申请号：US17102850

申请日：2020-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Weitian KOU ,  Alexander YPMA ,  Marc HAUPTMANN ,  Michiel KUPERS ,  Lydia Marianna VERGAIJ-HUIZER ,  Erik Johannes Maria WALLERBOS ,  Erik Henri Adriaan DELVIGNE ,  Willem Seine Christian ROELOFS ,  Hakki Ergün CEKLI ,  Stefan Cornelis Theodorus VAN DER SANDEN ,  Cédric Désiré GROUWSTRA ,  David Frans Simon DECKERS ,  Manuel GIOLLO ,  Iryna DOVBUSH

IPC: G03F7/20

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

公开(公告)号：US20210072647A1

公开(公告)日：2021-03-11

申请号：US16623647

申请日：2018-05-14

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Patricius Aloysius Jacobus TINNEMANS ,  Haico Victor KOK ,  William Peter VAN DRENT ,  Sebastianus Adrianus GOORDEN

IPC: G03F7/20

Abstract: The invention relates to a sensor (SE) comprising: —a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and —a polarizing beam splitter (PBS) to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.

公开(公告)号：US20210072088A1

公开(公告)日：2021-03-11

申请号：US16965753

申请日：2019-01-15

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Maarten Jozef JANSEN ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Koen Govert Olivier VAN DE MEERAKKER ,  Ivo WIDDERSHOVEN

IPC: G01J9/02 ,  G01B11/00 ,  G03F7/00 ,  G03F7/20

Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.

公开(公告)号：US20210066877A1

公开(公告)日：2021-03-04

申请号：US16969071

申请日：2019-01-24

Applicant: ASML Netherlands B.V.

Inventor： Szymon Dominik SMOLAREK

IPC: H01S3/00 ,  G01B7/004 ,  G03F7/20 ,  H05G2/00 ,  G01K7/16 ,  H01S3/223

Abstract: A system, comprising an optical component that, in operational use of the optical component, optically interacts with a laser beam, an electrically conductive element disposed on or within the optical component that, in operational use of the optical component, is exposed to the laser beam, and a monitoring system operative to monitor a physical quantity representative of an electrical resistance of the electrically conductive element and to determine based on the physical quantity, a position of the laser beam relative to the optical component.

公开(公告)号：US20210063900A1

公开(公告)日：2021-03-04

申请号：US16995993

申请日：2020-08-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Yongfeng NI ,  Ronald Franciscus Herman HUGERS ,  Andreas Johannes Antonius BROUNS

IPC: G03F9/00 ,  G03F7/20

Abstract: An assembly for collimating broadband radiation, the assembly including: a convex refractive singlet lens having a first spherical surface for coupling the broadband radiation into the lens and a second spherical surface for coupling the broadband radiation out of the lens, wherein the first and second spherical surfaces have a common center; and a mount for holding the convex refractive singlet lens at a plurality of contact points having a centroid coinciding with the common center.

公开(公告)号：US20210063899A1

公开(公告)日：2021-03-04

申请号：US16961747

申请日：2019-02-12

Applicant: ASML Netherlands B.V.

Inventor： Chunguang Xia ,  Jonghoon Baek ,  John Tom Stewart, IV ,  Andrew David LaForge ,  Deniz Van Heijnsbergen ,  David Robert Evans ,  Nina Vladimirovna Dziomkina ,  Yue MA

IPC: G03F7/20 ,  H01J37/32 ,  H05G2/00 ,  H05H1/46

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.